Abstract: Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.

Abstract: A positioning method in which a system performs operations relative to areas on a substrate by a series of relative movements between the system and substrate scanning exposures. The method includes the steps of disposing a first area relative to a system performing an operation relative to the first area, and moving the substrate from a first position where the first operation relative to the first area has finished to a second position where a second operation relative to a second area is to start, and synchronously moving the system from a third position where the first operation relative to the first area has finished to a fourth position where the second operation relative to the second area is to start. An acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero.

Abstract: A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly.

Abstract: A support device for a stage provides flexibility in at least two degrees of freedom. The support device uses a mounting device with stiffness in at least a first degree of freedom and rotational flexibility in a second degree of freedom, capable of receiving the stage device. An extension device configured to extend from a base and affix to the mounting device has flexibility in at least the first degree of freedom and rotational stiffness in the second degree of freedom. This support device can be used in precision manufacturing including lithographic processing. Rotational flexibility in the mounting device is facilitated using at least two flexures arranged at angles to each other and capable of providing rotational flexibility in the second degree of freedom and stiffness in at least the first degree of freedom. Materials in the flexures include metallic, non-metallic and composite materials.

Abstract: A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the first system (202) supports the majority of the first assembly (206) relative to the second assembly (208) and the second system (204) adjusts for a change in the location of the center of gravity of the first assembly (206). Further, the second system (204) can be used to compensate for fluctuations in the atmospheric pressure near the vibration isolator (200).

Abstract: A metrology source and sensor arrangement are placed off-axis adjacent to and preferably coplanar with a reticle and target, respectively in a catoptic optical system suitable for EUV imaging. On-axis aberrations are derived by modelling of the optical system from off-axis metrology output. Adaptive optical elements are employed to minimize aberrations at acceptable levels for high precision and resolution exposures such as lithographic patterning.

Abstract: A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction assembly (18) counteracts and reduces the reaction forces created by the stage mover assembly (16) in two degrees of freedom that are transferred to a reaction base (102). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).

Abstract: A reaction frame having a first reaction frame portion and a second reaction frame portion receives reaction forces from a stage. First reaction frame portion is coupled to ground by a ground rod aligned along the longitudinal side of the first reaction frame portion; second reaction frame portion of the reaction frame is coupled to an interconnect rod passing parallel to the plane defined by the first reaction frame portion and second reaction frame portion. Ends of interconnect rod have a damper therebetweeen. One end is coupled to the first reaction frame portion while the other end is coupled to the second reaction frame portion. Reaction forces in received by the second reaction frame portion are transferred to ground through the interconnect rod and the first reaction frame portion. Alternately, the interconnect rod does not use the damper when alligned with the ground rod.

Abstract: Methods and apparatus for reducing the transmission of vibrations within a caster system that supports a stage apparatus with a reaction frame are disclosed. According to one aspect of the present invention, a caster system that support portions of a stage apparatus which has a reaction frame and a stage assembly includes a first caster component and at least a second caster component. The first caster component supports the stage assembly, while the second caster component supports the reaction frame and is vibrationally separated from the first caster component. The second caster component may be physically coupled to the first caster component to enable the first caster component, the second caster component, the reaction frame, and the stage assembly to be moved as a substantially single unit.

Abstract: A stage assembly (10) for moving and positioning a device (30) includes a stage (14), a stage mover assembly (16), a device table (18), a table mover assembly (20) and a damping assembly (22). The table mover assembly (20) moves the device table (18) along a Z axis, about an X axis and about a Y axis relative to the stage (14) and generates reaction forces. The damping assembly (22) is coupled to the table mover assembly (20). Uniquely, the damping assembly (22) reduces the reaction forces created by the table mover assembly (20) that are transferred to the stage (14).

Abstract: A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are supported by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuator devices which are preferably voice coil motors extending between the coarse stage and the high accuracy stage. Additionally, dead weight supports are provided between the coarse stage and the high accuracy stage for vertically supporting the dead weight of the high accuracy stage. The dead weight supports are preferably air bellows.

Abstract: Methods and apparatus for isolating vibrations associated induced by reaction forces and ground vibration are disclosed. According to one aspect of the present invention, a scanning stage apparatus includes a stage base, a stage, a driver, and a reaction frame. The stage moves over the stage base in a first translational direction, a second translational direction, and a first rotational direction. The driver causes the stage to move, and also causes at least one reaction force to be created when the stage moves. The reaction frame at least partially supports the driver, and along with the driver, is substantially decoupled from the stage base. The reaction force is arranged to be transmitted to the reaction frame. The electromagnetic coupling electromagnetically couples the reaction frame to a ground, and provides a stiffness and a damping between the reaction frame and the ground.

Abstract: A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction assembly (18) counteracts and reduces the reaction forces created by the stage mover assembly (16) in two degrees of freedom that are transferred to a reaction base (102). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: A low mass electric linear motor having a magnet assembly with a plurality of magnets fixed to a base member. Each magnet has two opposing magnetic surfaces with opposite magnetic poles. The plurality of magnets are attached to the base member such that all of the opposing magnetic surfaces are aligned and are alternating in magnetic polarity along the base member. A coil assembly is disposed around at least a portion of the magnet assembly. The coil assembly has two walls joined to a header. Each of the walls has a plurality of juxtaposed flat coils and further has a plurality of bent coils. The bent coils overlap with the flat coils such that a vertical side of each bent coil is positioned within an aperture of a flat coil. In another aspect of the invention, each wall of the coil assembly is enclosed in a cooling canister. Chilled coolant is pumped through the canister thereby removing heat generated by the coil assembly during operation.

Abstract: Sheet coils and linear motors including same are disclosed. Also disclosed are stage units, exposure devices, and microelectronic-device manufacturing methods employing the linear motors. The linear motors exhibit reduced viscous resistance. The sheet coil includes at least one coil formed as a conductive wiring trace on an insulative film substrate. The coil includes at least one slit extending in the coil-winding direction. The slit usually separates the coil into multiple partial coils that are connected to AC current having the same phase.

Abstract: A wafer stage chamber assembly is provided to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber for sealing a wafer stage device from the atmosphere outside the wafer stage chamber, and at least one loader port for loading and unloading substrates into the wafer stage chamber. The wafer stage chamber is constructed of a chamber frame to enclose the wafer stage device, and a plurality of chamber walls including a front panel having the at least one loader port for loading and unloading a plurality of semiconductor substrates into the wafer stage chamber. The wafer stage chamber assembly also includes a top wall and a base frame.

Abstract: A reaction frame structure for isolating the vibrations induced by reaction forces from stage motions, such as for a guideless stage. The reaction frame supports the driving motors in a manner whereby the reaction frame is structurally decoupled from the stage (e.g., by a slidable coupling) at least with respect to reaction forces in one direction of motion. In one embodiment, the fixed portion of the drive devices for effecting stage motion in a first direction is coupled to the reaction frame by a slidable coupling. The reaction frame is coupled to ground. The rest of the system including the stage is isolated from ground by deploying a vibration isolation system. A spring damper absorbs the reaction forces of the drive devices in the first direction. In another embodiment, the reaction frame is slidably supported on the same base as the stage. Dampers may be provided to the reaction frame along the first direction and/or a second orthogonal direction.

Abstract: A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are controlled by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuators disposed between the coarse stage and the high accuracy stage and aided by a supplemental vertical support disposed adjacent to the actuators. Preferably, the high accuracy stage is suspended from a bar supported by the supplemental vertical support, which is preferably air bellows.

Abstract: A stage assembly (10) for moving a device (26) along an X axis and a Y axis includes a stage base (12), a device table (16), a stage mover assembly (18), a measurement system (21), and a control system (22). The stage mover assembly (18) includes a pair X guide movers (82) (84) and a Y table mover (87). The measurement system (21) includes a first X system (100) and a second X system (102). The control system (22) receives the position signals from the measurement system (21) and directs current to the X movers (82) (84) to move the device table along the X axis. The control system (22) can be designed to not skip any servo cycles during switching of position signals.