Abstract: A circulating system (10) for circulating a fluid (22) from a fluid source (28) around a voice coil actuator (12) that includes a pair of spaced apart magnet arrays (32) and a conductor (36). The circulating system (10) includes a circulation housing (26) and a fluid inlet (86). The circulation housing (26) is sized and shaped to encircle at least a portion of the conductor (36) and provide a fluid passageway (54) around the conductor (36). The fluid inlet (86) extends into the fluid passageway (54) and is in fluid communication with the fluid source (28). Fluid (22) from the fluid source (28) is directed through the fluid inlet (86) into the fluid passageway (54). Preferably, the flow rate of the fluid (22) is controlled to maintain an outer surface of the actuator (12) at a set temperature to control the influence of the actuator (12) on the surrounding environment and the surrounding components.

Abstract: In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices.

Abstract: A stage assembly (10) for moving and positioning a device (24) includes a stage base (12), a first stage frame (40), and a second stage frame (66). The stage assembly (10) also includes a pair of X movers (82) (84), and a first stage Y mover (86) that precisely move the first stage frame (40) relative to the stage base (12). Uniquely, the first stage frame (40) is guideless along the X axis, along the Y axis and about the Z axis. With this design, movers (82) (84) (86) can precisely control the position of the first stage frame (40) along the X axis, along the Y axis and about the Z axis. Further, current to the X movers (82) (84) is varied according to the position of the second stage frame (66) relative to the first stage frame (40). These features allow for more accurate positioning of the device (24) by the stage assembly (10) and better performance of the stage assembly (10).

Abstract: An electric motor comprising an upper coil array, a lower coil array and a magnet array movable relative to the coil arrays and interposed therebetween. The magnet array has an upper surface and a lower surface and comprises a plurality of wedge magnets disposed in a plane. Each wedge magnet has a magnetic polarity oriented at an angle relative to the plane. The magnets are arranged in groups, each group forming an upper resultant magnetic flux extending substantially perpendicular to the plane from said upper surface of the magnet array and a lower resultant magnetic flux extending substantially perpendicular to said plane from said lower surface of the magnet array. The upper coil array is operable to interact with the upper resultant magnetic flux and the lower coil array is operable to interact with the lower resultant magnetic flux to move the magnet array.

Abstract: A stage assembly (10) for independently moving and positioning a first device (26A) and a second device (26A) in an operation area (25) is provided herein. The stage assembly (10) includes a stage base (12), a first stage (14), a first mover assembly (15), a second stage (16), and a second mover assembly (18). The first mover assembly (15) moves the first stage (14) and the first device (26A) into the operational area (25) and the second mover assembly (18) moves the second stage (16) and the second device (26B) into the operational area (25). The present stage assembly (10) reduces and minimizes the amount of reaction forces and disturbances that are transferred between the stages (14), (16). This improves the positioning performance of the stage assembly (10). Further, for an exposure apparatus (30), this allows for more accurate positioning of two semiconductor wafers (28) relative to a reticle (32) or some other reference.

Abstract: A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

Abstract: A wafer stage assembly is provided to be used in combination with a projection lens assembly, such as in a semiconductor wafer manufacturing process. The wafer stage assembly includes a wafer table supported and positioned by a wafer stage and a wafer stage base for carrying a semiconductor wafer. The wafer stage assembly also includes a plurality of sets of sensors to determine a position and a rotation of the wafer table in six degrees of freedom relative to the projection lens assembly. A first set of sensors determines a position and a rotation of the wafer table relative to the projection lens assembly in at least one of the six degrees of freedom, while a second set of sensors determines a position and a rotation of the wafer table relative to the wafer stage base in the remaining of the six degrees of freedom.

Abstract: A low mass electric linear motor having a magnet assembly with a plurality of magnets fixed to a base member. Each magnet has two opposing magnetic surfaces with opposite magnetic poles. The plurality of magnets are attached to the base member such that all of the opposing magnetic surfaces are aligned and are alternating in magnetic polarity along the base member. A coil assembly is disposed around at least a portion of the magnet assembly. The coil assembly has two walls joined to a header. Each of the walls has a plurality of juxtaposed flat coils and further has a plurality of bent coils. The bent coils overlap with the flat coils such that a vertical side of each bent coil is positioned within an aperture of a flat coil. In another aspect of the invention, each wall of the coil assembly is enclosed in a cooling canister. Chilled coolant is pumped through the canister thereby removing heat generated by the coil assembly during operation.

Abstract: A stage assembly (10) for moving and positioning one or more objects (24) for an exposure apparatus (28) is provided herein. The stage assembly (10) includes a mounting frame (14) and a stage frame (16). The stage frame (16) includes a holder (50) that retains the object (24). The stage assembly (10) also includes X movers (58A) (58B), Y movers (60A) (60B) and Z movers (62A) (62B) that precisely move the stage frame (16) relative to the mounting frame (16). Uniquely, the stage frame (16) is monolithic. With this design, the resulting stage frame (16) is rigid and has a relatively high servo bandwidth. Further, the movers (58A) (58B) (60A) (60B) (62A) (62B) are positioned to act through a center of gravity (51) of the stage frame (16).

Abstract: A wafer stage chamber assembly is provided to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber for sealing a wafer stage device from the atmosphere outside the wafer stage chamber, and at least one loader port for loading and unloading substrates into the wafer stage chamber. The wafer stage chamber is constructed of a chamber frame to enclose the wafer stage device, and a plurality of chamber walls including a front panel having the at least one loader port for loading and unloading a plurality of semiconductor substrates into the wafer stage chamber. The wafer stage chamber assembly also includes a top wall and a base frame.

Abstract: The exposure apparatus of the present invention for forming a specified image on a substrate mounted on a substrate stage, has a linear motor as a part of a driving source for driving said substrate stage. The linear motor comprises: a magnet track; and a motor coil operating in cooperation with said magnet track and having a plurality of coil units, each of said coil units having an electrical conductor configured into a geometric polygonal shape defining a substantially planar conducting band surrounding a void, and wherein said plurality of coil units are arranged linearly.

Abstract: The embodiments describe linear motor configurations having a polygonal shaped motor coil. The motor coil is e.g. hexagonal, diamond shaped, or double diamond shaped. Coil units are formed in a closed electrically conductive band surrounding a void. Coil units are formed e.g. from flex circuit material or by winding in a racetrack or folded tip fashion. Coil units are arranged in an overlapped shingle like manner to form a motor coil with substantially uniform thickness and high conductor density, providing high efficiency. Due to its substantially uniform thickness, the motor coil has a substantially flat cross section that allows the motor coil to be easily installed and removed from its associated linear magnetic track. The embodiments enable both moving coil and moving magnet linear motor configurations.

Abstract: A circulating system (10) for cooling a shaft-type linear motor (12) is provided herein. The motor (12) includes a magnet array (22) and a coil assembly (16). The circulating system (10) includes coil housing (36) that encircles the coil assembly (16) and defines a fluid passageway (46) between the coil housing (36) and the coil assembly (16). Fluid (44) from a fluid source (42) is forced through an inlet (38) into the fluid passageway (46). The flow rate of the fluid (44) is controlled to maintain an outer surface (111) of the coil housing (36) at a set temperature to control the effect of the motor (12) on the surrounding environment and the surrounding components.

Abstract: A coil assembly (14) used with a magnet assembly (12) for a linear or planar electric motor (10) is provided herein. The coil assembly (14) includes a plurality of coils (18) attached to a coil base (16) with a plurality of coil supports (22). The coil supports (22) secure the coils (18) to the coil base (16) with the coils (18) spaced apart from a first surface (23) of the coil base (16). As a result thereof, both sides (32), (34) of each coil (18) are exposed for cooling. Further, the coil supports (22) allow the coils (18) to expand laterally with minimal stress and thermal deformation. The coil assembly (14) can also include a plurality of spaced apart covers (62). Each cover (62) fits over one of the coils (18) and is secured to the coil base (16). A fluid (24) can be directed into a fluid passageway (58) around each coil (18) to cool each coil (18).

Abstract: A magnet array (20) for a shaft type linear motor (10) is provided herein. In one embodiment, the magnet array (20) includes a plurality of magnetic, axial sections (40) and a plurality of magnetic, transverse sections (42) positioned along an array axis (34) of the magnet array (20). Each axial section (40) has an axial polarization (52) relative to the array axis (34) and each transverse section (42) has transverse polarization (54) relative to the array axis (34). The resulting magnet array (20) has improved flux density for a given mass. In another embodiment, each magnetic section (36) of the magnet array (20) includes a first channel (60) and a second channel (62) that extends inward from the sides (44,46) of each section (36). The resulting magnet array (20) has a reduced mass for a given flux density. Importantly, for each embodiment, the magnet array (20) has an improved ratio of flux density to magnet mass. This allows the magnet array (20) and the motor (10) to be more efficient.

Abstract: The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.

Abstract: An exposure apparatus comprising an optical system for imaging a pattern formed in a reticle onto an article and a reticle stage for supporting the article. A motor is provided for positioning the reticle stage and reticle relative to the optical system and includes a first motor portion and a second motor portion. The first motor portion is connected to the reticle stage and movable relative to the second motor portion. The apparatus further comprises a vibration isolation device configured to isolate vibration resulting from reaction forces created between the first and second motor portions. A method of directing reaction forces created between the first and second motor portions is also disclosed.

Abstract: A positioning method in which a system performs operations relative to areas on a substrate by a series of relative movements between the system and substrate scanning exposures. The method includes the steps of disposing a first area relative to a system performing an operation relative to the first area, and moving the substrate from a first position where the first operation relative to the first area has finished to a second position where a second operation relative to a second area is to start, and synchronously moving the system from a third position where the first operation relative to the first area has finished to a fourth position where the second operation relative to the second area is to start. An acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero.

Abstract: A magnet array having a plurality of alternating polarity (N and S) magnets as well as transverse magnets disposed in a plane is disclosed. The N and S magnets have opposing polarities and are arranged in a checkerboard pattern in the magnet array. The transverse magnets are disposed between immediate adjacent N and S magnets. The transverse magnets facilitate the forming of a continuous magnetic flux path through the transverse magnet and immediate adjacent N and S magnets. The magnet array of the present invention may be utilized in an electric motor or a positioning device comprising a coil array positioned adjacent to a magnet array where the coil array is operable to interact with the magnetic fields of the magnet array to provide a force therebetween. The magnet array may also be utilized in an exposure apparatus such as a photolithography system to position and support a wafer for photolithography processing in the manufacturing of semiconductor devices.

Abstract: Apparatus and associated method for cooling a linear motor coil includes a motor coil having side walls, and at least one enclosure member which encloses each linear side wall and extends generally co-extensively with a width and a length of the side walls and juxtaposed to the side walls. Coolant passages are formed between and around an exterior of the side walls and the interior walls of at least one enclosure member for enclosing a coolant fluid flowable against the side walls. An inlet plenum is in flow connection to the coolant passages for flowing the coolant fluid through the coolant passages to cool the side walls and an outlet plenum is in flow connection to the coolant passages for removal of coolant fluid heated by operation of the motor coil.