Patents by Inventor Andrew Nguyen
Andrew Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240363315Abstract: Aspects of the present disclosure generally relate to apparatus and methods for an adjustable de-chucking voltage associated with an electrostatically charged substrate in a processing chamber. An example method of de-chucking a substrate disposed in a process chamber includes processing a substrate in a chamber body, the substrate being coupled to a substrate support comprising a chucking electrode. The method further includes monitoring a property associated with a lift pin assembly movable relative to the chucking electrode via an actuator. The method further includes adjusting a first voltage level applied to the chucking electrode in response to the property associated with the lift pin assembly satisfying one or more criteria.Type: ApplicationFiled: April 27, 2023Publication date: October 31, 2024Inventors: Andrew NGUYEN, Lu LIU, Toan Q. TRAN, Daniel NGUYEN
-
Publication number: 20240349752Abstract: Provided herein are compositions with enhanced protein content, protein compositions with improved functionality, and methods for the preparation thereof.Type: ApplicationFiled: June 22, 2024Publication date: October 24, 2024Applicant: Clara Foods Co.Inventors: Myhan NGUYEN, Andrew Keum Min MIYASHIRO, Ying Joy ZHONG
-
Publication number: 20240354341Abstract: Methods, systems, and apparatuses for audience metric determination are described herein. An audience segment may be targeted for delivery of content. A clustering algorithm may be used to categorize a quantity of users or devices into subsets based on a propensity to consume, present or output a particular type of content, and a quantity of time to output the particular type of content. A weight may be assigned to each subset based on its relevance to other subsets, such as based on data variance, e.g., on a distance to a midpoint of a specific subset of the subsets. An index parameter may be determined for the datasets, e.g., based on each weight for each subset, and data may be generated that reflects a ranking of content delivery spots for delivery of content to the audience segment.Type: ApplicationFiled: January 30, 2024Publication date: October 24, 2024Inventors: Andrew Pagtakhan, Robert Bress, Tracy Nguyen
-
Publication number: 20240351055Abstract: Example structures, methods, and systems for additive manufacturing of a gas hub and delivery nozzle are disclosed. One example structure includes a unitary gas hub and distribution nozzle that includes a gas hub portion and a gas delivery nozzle portion. The gas hub portion includes multiple gas inlet paths and one or more plenum chambers. The multiple gas inlet paths and the one or more plenum chambers form fully recursive gas paths. Each of the one or more plenum chambers has one or more output holes. The gas delivery nozzle portion includes multiple gas flow paths, where each gas flow path is coupled to one of the one or more output holes in each of the one or more plenum chambers, and each gas flow path has a respective output at an outer surface of the gas delivery nozzle portion.Type: ApplicationFiled: June 7, 2023Publication date: October 24, 2024Inventors: Yogananda Sarode Vishwanath, Andrew Nguyen, Tom K. Cho
-
Patent number: 12125689Abstract: Methods and apparatus for forming plasma in a process chamber use an annular exciter formed of a first conductive material with a first end electrically connected to an RF power source that provides RF current and a second end connected to a ground and an annular applicator, physically separated from the annular exciter, formed of a second conductive material with at least one angular split with an angle forming an upper overlap portion and a lower overlap portion separated by a high K dielectric material which is configured to provide capacitance in conjunction with an inductance of the annular applicator to form a resonant circuit that is configured to resonate when the annular exciter flows RF current that inductively excites the annular applicator to a resonant frequency which forms azimuthal plasma from the annular applicator.Type: GrantFiled: September 8, 2022Date of Patent: October 22, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Kartik Ramaswamy, Andrew Nguyen, Yang Yang, Sathya Ganta, Fernando Silveira, Yue Guo, Lu Liu
-
Patent number: 12121354Abstract: Disclosed is a tubing system for use in a blood sampling-blood pressure monitoring system. The blood sampling-blood pressure monitoring system may include a control valve, a reservoir with a plunger, a sampling site, and a blood pressure transducer for measuring the blood pressure of a patient. The tubing system may comprise: a plurality of flexible tubing sections and a plurality of rigid tubing sections. The plurality of rigid tubing sections and flexible tubing sections may be interlinked with one another between the patient and the blood pressure transducer for the blood pressure measurement of the patient.Type: GrantFiled: July 7, 2022Date of Patent: October 22, 2024Assignee: Edwards Lifesciences CorporationInventor: Andrew Nguyen Hoan
-
Publication number: 20240338141Abstract: Filling out the space of Redundant Array of Disks (RAID) format changes during drive capacity and count changes, including: detecting, in a storage system having a first Redundant Array of Independent Disks (RAID) format, a change to an operational characteristic of the storage system; and reconfiguring the storage system to have a second RAID format in response to the detected change.Type: ApplicationFiled: June 17, 2024Publication date: October 10, 2024Inventors: ANDREW BERNAT, TOM NGUYEN, BENJAMIN SCHOLBROCK
-
Publication number: 20240339302Abstract: Systems, methods, and apparatus including designs embodied in machine-readable media for a gas break used in semiconductor processing systems. The apparatus includes a gas break structure comprising an insulating material and having one or more gas flow paths formed within a body of the gas break structure, the gas break structure configured to provide a specified impedance when coupled between a grounded gas distribution manifold and an electrically charged gas delivery nozzle, the gas break structure further comprising an internal structure having a specified geometry comprising a repeating structure and one or more empty gaps between elements of the repeating structure. The gas break can be formed using additive manufacturing.Type: ApplicationFiled: June 6, 2023Publication date: October 10, 2024Inventors: Yogananda Sarode Vishwanath, Andrew Nguyen, Tom K. Cho
-
Publication number: 20240339301Abstract: Example structures, methods, and systems for additive manufacturing of components of source and gas delivery nozzle assembly are disclosed. One example structure includes a unitary gas distribution nozzle assembly that includes an upper electrode portion and a lower electrode portion joined by multiple joining structures, and one or more gas zone divider walls positioned between the upper electrode portion and the lower electrode portion. The unitary gas distribution nozzle assembly is of a single material. Each of the multiple joining structures is positioned between the upper electrode portion and the lower electrode portion. Each of the multiple joining structures is configured to transfer radio-frequency (RF) energy and thermal energy between the upper electrode portion and the lower electrode portion. The one or more gas zone divider walls are configured to separate a region between the upper electrode portion and the lower electrode portion into two or more plenum chambers.Type: ApplicationFiled: June 7, 2023Publication date: October 10, 2024Inventors: Yogananda Sarode Vishwanath, Andrew Nguyen, Tom K. Cho
-
Patent number: 12112764Abstract: A method is disclosed to estimate the delay between an original signal and the corresponding captured signal. The signals are transformed and buffered to two sets of spectral descriptors for a similarity measure. The method advantageously offers robust delay estimation for inconsistent delays and adverse spectral distortions.Type: GrantFiled: August 31, 2022Date of Patent: October 8, 2024Assignee: Nuvoton Technology CorporationInventors: Powen Ru, Dung Nguyen, Andrew Zamansky
-
Publication number: 20240321392Abstract: Contemplated antiviral/cancer treatments comprise analysis of neoepitopes from viral DNA that has integrated into the host genome, and design of immunotherapeutic agents against such neoepitopes.Type: ApplicationFiled: June 11, 2024Publication date: September 26, 2024Applicant: Nantomics LLCInventors: Andrew Nguyen, John Zachary Sanborn, Stephen Charles Benz
-
Patent number: 12100576Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a chamber liner having a tubular body with an upper portion and a lower portion; a confinement plate coupled to the lower portion of the chamber liner and extending radially inward from the chamber liner, wherein the confinement plate includes a plurality of slots; a shield ring disposed within the chamber liner and movable between the upper portion of the chamber liner and the lower portion of the chamber liner; and a plurality of ground straps coupled to the shield ring at a first end of each ground strap of the plurality of ground straps and to the confinement plate at a second end of each ground strap to maintain electrical connection between the shield ring and the chamber liner when the shield ring moves.Type: GrantFiled: April 30, 2020Date of Patent: September 24, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Andrew Nguyen, Xue Yang Chang, Yu Lei, Xianmin Tang, John C. Forster, Yogananda Sarode Vishwanath, Abilash Sainath, Tza-Jing Gung
-
Patent number: 12093009Abstract: Implementations are described herein for provisioning a device such as a DCN with configuration data for operation on a process automation network using an “out-of-band” communication channel. In various implementations, a temporary out-of-band communication channel may be established between a first and second DCNs. The out-of-band communication channel may be distinct from a process automation network through which the first DCN is to be communicatively coupled with other process automation nodes of a process automation system. Provisioning data may be transmitted from the second DCN to the first DCN over the temporary out-of-band communication channel. The provisioning data may include: information technology (IT) configuration data and operational technology (OT) configuration data. Subsequent to the transmitting, the temporary out-of-band communication channel may be closed.Type: GrantFiled: March 24, 2021Date of Patent: September 17, 2024Assignee: YOKOGAWA ELECTRIC CORPORATIONInventors: Patrick Clay, Vien Nguyen, David Emerson, Hidenori Sawahara, Andrew Keller, Joseph Malm
-
Patent number: 12094715Abstract: Examples of the present invention include a method for removing halogen-containing residues from a substrate. The method includes transferring a substrate to a substrate processing system through a first chamber volume of a load lock chamber. The load lock chamber is coupled to a transfer chamber of the substrate processing system. The substrate is etched in one or more processing chambers coupled to the transfer chamber of the substrate processing system with chemistry from a showerhead disposed over a heated substrate support assembly. The chemistry includes halogen. Halogen-containing residues are removed from the etched substrate in a second chamber volume of the load lock chamber. Cooling the etched substrate in a cooled substrate support assembly of the load lock chamber after removing the halogen-containing residue.Type: GrantFiled: January 12, 2023Date of Patent: September 17, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Martin Jeffrey Salinas, Paul B. Reuter, Andrew Nguyen, Jared Ahmad Lee
-
Patent number: 12090661Abstract: A velocity control-based robotic system is disclosed. In various embodiments, sensor data is received from one or more sensors deployed in a physical space in which a robot is located. A processor is used to determine based at least in part on the sensor data an at least partly velocity-based trajectory along which to move an element comprising the robot. A command to implement the velocity-based trajectory is sent to the robot.Type: GrantFiled: September 22, 2021Date of Patent: September 17, 2024Assignee: Dexterity, Inc.Inventors: Zhouwen Sun, Samir Menon, Kevin Jose Chavez, Toby Leonard Baker, David Leo Tondreau, III, Andrew Nguyen, Cuthbert Sun
-
Publication number: 20240302819Abstract: Implementations are described herein for commissioning a device such as a distributed control node (DCN) for operation with a process automation system (PAS) using a portable setup device (PSD) and an “out-of-band” communication channel. In various implementations, static information conveyed by a passive data store of the DCN may be used to establish an out-of-band communication channel between the DCN and PSD. The out-of-band communication channel may be distinct from a process automation network through which the DCN is to be communicatively coupled with other process automation nodes of the PAS. The DCN may be commissioned to the process automation system by exchanging operational technology (OT) data between the DCN and the PSD via the out-of-band communication channel to enable the DCN to cooperate with one or more of the other process automation nodes on the process automation network to implement an at least partially automated process.Type: ApplicationFiled: May 15, 2024Publication date: September 12, 2024Inventors: Joseph Malm, David Emerson, Andrew Keller, Patrick Clay, Hidenori Sawahara, Vien Nguyen
-
Publication number: 20240297059Abstract: Embodiments of the present disclosure generally relate to semiconductor processing equipment, and more specifically to apparatus, e.g., magnet holding structures, that can be used with magnets during plasma processing of a substrate. In an embodiment, a magnet holding structure for a plasma-enhanced chemical vapor deposition chamber is provided. The magnet holding structure includes a top piece having a plurality of magnet retention members and a bottom piece having a plurality of magnet retention members. The top piece has a first inside edge and a first outside edge, and the bottom piece has a second inside edge and a second outside edge. The magnet holding structure further includes a plurality of casings. Each casing of the plurality of casings is configured to at least partially encapsulate a magnet, and each casing positioned between a magnet retention member of the top piece and a magnet retention member of the bottom piece.Type: ApplicationFiled: May 14, 2024Publication date: September 5, 2024Inventors: Andrew NGUYEN, Sathya Swaroop GANTA, Kallol BERA, Canfeng LAI
-
Patent number: 12080382Abstract: Contemplated antiviral/cancer treatments comprise analysis of neoepitopes from viral DNA that has integrated into the host genome, and design of immunotherapeutic agents against such neoepitopes.Type: GrantFiled: May 24, 2019Date of Patent: September 3, 2024Assignee: NantOmics, LLCInventors: Andrew Nguyen, John Zachary Sanborn, Stephen Charles Benz
-
Patent number: 12073238Abstract: Particular embodiments are directed to automatically determining whether first values—corresponding to overflight/landing charges—indicated in a document exceed a threshold associated with second charges—corresponding to expected overflight/landing charges—and then causing presentation, at a single page of a user interface, of one or more user interface elements that at least partially indicate whether the threshold has been exceeded.Type: GrantFiled: December 29, 2022Date of Patent: August 27, 2024Assignee: United Parcel Service of America, Inc.Inventors: Roman Anderson, Andrew Nguyen Vo, Balakrishna Subramaniam
-
Patent number: 12068153Abstract: Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.Type: GrantFiled: May 31, 2022Date of Patent: August 20, 2024Assignee: Applied Materials, Inc.Inventors: Kaushik Alayavalli, Andrew Nguyen, Edward Haywood, Lu Liu, Malav Kapadia