Patents by Inventor Anne Troxell Wyand
Anne Troxell Wyand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10745570Abstract: A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.Type: GrantFiled: January 26, 2018Date of Patent: August 18, 2020Assignee: EASTMAN RODACK COMPANYInventors: Thomas B. Brust, Grace Ann Bennett, Catherine A. Falkner, Anne Troxell Wyand
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Publication number: 20190233660Abstract: A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.Type: ApplicationFiled: January 26, 2018Publication date: August 1, 2019Inventors: Thomas B. Brust, Grace Ann Bennett, Catherine A. Falkner, Anne Troxell Wyand
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Patent number: 10059821Abstract: A method is used to provide an electrically-conductive polyaniline pattern by providing a uniform layer of a photocurable composition on a substrate. The photocurable composition comprises a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The photocurable composition is exposed to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units, thereby forming a crosslinked polymer. Any remaining water-soluble reactive polymer is removed. The crosslinked polymer is contacted with an aniline reactive composition having aniline monomer and up to 0.5 molar of an aniline oxidizing agent, thereby forming an electrically-conductive polyaniline disposed either within, on top of, or both within and on top of, the crosslinked polymer.Type: GrantFiled: April 20, 2016Date of Patent: August 28, 2018Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Patent number: 10040957Abstract: Ink jettable and UV-curable compositions include a reactive polymer comprising: (a1) at least 20 mol % of recurring units comprising pendant metal complexing water-solubilizing groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The compositions can optionally have a humectant, a dye or pigment colorant, an anionic or nonionic surfactant, a water-soluble or water-dispersible acrylic polymer, or a water-soluble or water-dispersible polyurethane. Such ink jettable and UV-curable compositions can include a complex of reducible metal ions or metal nanoparticles with the reactive polymer.Type: GrantFiled: September 17, 2015Date of Patent: August 7, 2018Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Patent number: 9963614Abstract: A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.Type: GrantFiled: May 18, 2015Date of Patent: May 8, 2018Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Grace Ann Bennett, Catherine A. Falkner, Anne Troxell Wyand
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Patent number: 9902168Abstract: A method for forming an ink jet image on a substrate includes ink jetting an ink jettable and UV-curable composition onto the substrate in an imagewise fashion to form an ink jetted image on the substrate. The ink jettable and UV-curable composition includes: a reactive polymer having: (a1) or (a2) recurring units having pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units having a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units including a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. The ink jetted image is cured to form a UV-cured ink jet image on the substrate. The ink jettable and UV-curable composition can also include metal nanoparticles or reducible metal ions that can serve as catalytic sites for electroless plating.Type: GrantFiled: May 18, 2017Date of Patent: February 27, 2018Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand
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Publication number: 20170306121Abstract: A method is used to provide an electrically-conductive polyaniline pattern by providing a uniform layer of a photocurable composition on a substrate. The photocurable composition comprises a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The photocurable composition is exposed to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units, thereby forming a crosslinked polymer. Any remaining water-soluble reactive polymer is removed. The crosslinked polymer is contacted with an aniline reactive composition having aniline monomer and up to 0.5 molar of an aniline oxidizing agent, thereby forming an electrically-conductive polyaniline disposed either within, on top of, or both within and on top of, the crosslinked polymer.Type: ApplicationFiled: April 20, 2016Publication date: October 26, 2017Inventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Publication number: 20170253051Abstract: A method for forming an ink jet image on a substrate includes ink jetting an ink jettable and UV-curable composition onto the substrate in an imagewise fashion to form an ink jetted image on the substrate. The ink jettable and UV-curable composition includes: a reactive polymer comprising: (a1) or (a2) recurring units comprising pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. The ink jetted image is cured to form a UV-cured ink jet image on the substrate. The ink jettable and UV-curable composition can also include metal nanoparticles or reducible metal ions that can serve as catalytic sites for electroless plating.Type: ApplicationFiled: May 18, 2017Publication date: September 7, 2017Inventors: Thomas B. Brust, Anne Troxell Wyand
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Patent number: 9731513Abstract: A method for forming an ink jet image on a substrate includes ink jetting an ink jettable and UV-curable composition onto the substrate in an imagewise fashion to form an ink jetted image on the substrate. The ink jettable and UV-curable composition includes: a reactive polymer comprising: (a1) or (a2) recurring units comprising pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units having a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. The ink jetted image is cured to form a UV-cured ink jet image on the substrate. The ink jettable and UV-curable composition can also include metal nanoparticles or reducible metal ions that can serve as catalytic sites for electroless plating.Type: GrantFiled: September 17, 2015Date of Patent: August 15, 2017Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand
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Patent number: 9718935Abstract: A method is used to provide an electrically-conductive polyaniline patterns on a substrate. A photocurable composition is applied as a pattern, comprising a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The pattern is exposed to radiation sufficient to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units to form a pattern of crosslinked polymer. The crosslinked polymer is contacted with an aniline reactive composition comprising an aniline monomer and up to 0.5 molar of an aniline oxidizing agent, in a molar ratio of from 1:0.5 to 1:1.5 of the aniline monomer to the aniline oxidizing agent. A pattern of electrically-conductive polyaniline disposed within, on top of, or both within and on top of, the crosslinked polymer only.Type: GrantFiled: April 20, 2016Date of Patent: August 1, 2017Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Patent number: 9676950Abstract: Articles are prepared with a substrate and an ink jetted and UV-curable image some of which also include metal nanoparticles or reducible metal ions. The in jetted and UV-curable image can be obtained from an ink jettable and UV-curable composition comprising: a reactive polymer comprising: (a1) or (a2) recurring units comprising pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. Such articles can be used to provide electrically-conductive articles and devices after electrolessly plating a complex of the metal nanoparticles and the UV-cured reactive polymer.Type: GrantFiled: September 17, 2015Date of Patent: June 13, 2017Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand
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Patent number: 9644112Abstract: Articles are designed with a substrate and have either a uniform layer or pattern of electrically-conductive polyaniline on one or both supporting sides of the substrate. The electrically-conductive polyaniline is disposed either within, on top of, or both within and on top of, a uniform or pattern of a crosslinked polymer that is derived from a photocurable composition comprising water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, lactam, phosphonic acid, phosphonate, carboxylic acid, or carboxylate group, all amounts based on the total recurring units in the water-soluble reactive polymer.Type: GrantFiled: April 20, 2016Date of Patent: May 9, 2017Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Publication number: 20170081532Abstract: Ink jettable and UV-curable compositions include a reactive polymer comprising: (a1) at least 20 mol % of recurring units comprising pendant metal complexing water-solubilizing groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The compositions can optionally have a humectant, a dye or pigment colorant, an anionic or nonionic surfactant, a water-soluble or water-dispersible acrylic polymer, or a water-soluble or water-dispersible polyurethane. Such ink jettable and UV-curable compositions can include a complex of reducible metal ions or metal nanoparticles with the reactive polymer.Type: ApplicationFiled: September 17, 2015Publication date: March 23, 2017Inventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
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Publication number: 20170081536Abstract: Articles are prepared with a substrate and an ink jetted and UV-curable image some of which also include metal nanoparticles or reducible metal ions. The in jetted and UV-curable image can be obtained from an ink jettable and UV-curable composition comprising: a reactive polymer comprising: (a1) or (a2) recurring units comprising pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. Such articles can be used to provide electrically-conductive articles and devices after electrolessly plating a complex of the metal nanoparticles and the UV-cured reactive polymer.Type: ApplicationFiled: September 17, 2015Publication date: March 23, 2017Inventors: Thomas B. Brust, Anne Troxell Wyand
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Publication number: 20170081533Abstract: A method for forming an ink jet image on a substrate includes ink jetting an ink jettable and UV-curable composition onto the substrate in an imagewise fashion to form an ink jetted image on the substrate. The ink jettable and UV-curable composition comprises: a reactive polymer comprising: (a1) or (a2) recurring units comprising pendant metal complexing water-solubilizing groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, or lactam group, or a pendant precursor moiety for the pendant amide, hydroxyl, or lactam group. The ink jetted image is cured to form a UV-cured ink jet image on the substrate. The ink jettable and UV-curable composition can also include metal nanoparticles or reducible metal ions that can serve as catalytic sites for electroless plating.Type: ApplicationFiled: September 17, 2015Publication date: March 23, 2017Inventors: Thomas B. Brust, Anne Troxell Wyand
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Patent number: 9557648Abstract: Articles are prepared to have a substrate and a silver-containing composition on either or both supporting sides of the substrate. The silver-containing composition can comprise either reducible silver ions or silver nanoparticles, complexed with a reactive polymer. The reactive polymer comprises: (a) greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, lactam, phosphonic acid, or carboxylic acid group. Some other articles have a water-insoluble complex of reacted (crosslinked) polymer with reducible silver ions or silver nanoparticles on either or both supportive sides of the substrate. Such reacted polymer is derived from the noted reactive polymer.Type: GrantFiled: March 18, 2015Date of Patent: January 31, 2017Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand
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Patent number: 9512243Abstract: A method can be used to provide electrically-conductive articles with electrolessly plated metal, or articles having antimicrobial properties for marine environments. The method includes disposing a silver-containing composition onto one or more supporting sides of a substrate such as continuous polymeric web. The silver-containing composition comprises a water-soluble complex of a reactive polymer with reducible silver ions, the reactive polymer comprising: (a) greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, lactam, phosphonic acid, or carboxylic acid group. The reducible silver ions can be suitably reduced and the reactive polymer can be photoexposed to provide crosslinking in patternwise or uniform fashion.Type: GrantFiled: March 18, 2015Date of Patent: December 6, 2016Assignee: EASTMAN KODAK COMPANYInventors: Thomas B. Brust, Anne Troxell Wyand
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Publication number: 20160338358Abstract: A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.Type: ApplicationFiled: May 18, 2015Publication date: November 24, 2016Inventors: Thomas B. Brust, Grace Ann Bennett, Catherine A. Falkner, Anne Troxell Wyand
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Publication number: 20160340540Abstract: A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.Type: ApplicationFiled: May 18, 2015Publication date: November 24, 2016Inventors: THOMAS B. BRUST, Grace Ann Bennett, Catherine A. Falkner, Anne Troxell Wyand
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Publication number: 20160274461Abstract: Articles are prepared to have a substrate and a silver-containing composition on either or both supporting sides of the substrate. The silver-containing composition can comprise either reducible silver ions or silver nanoparticles, complexed with a reactive polymer. The reactive polymer comprises: (a) greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, hydroxyl, lactam, phosphonic acid, or carboxylic acid group. Some other articles have a water-insoluble complex of reacted (crosslinked) polymer with reducible silver ions or silver nanoparticles on either or both supportive sides of the substrate. Such reacted polymer is derived from the noted reactive polymer.Type: ApplicationFiled: March 18, 2015Publication date: September 22, 2016Inventors: Thomas B. Brust, Anne Troxell Wyand