Patents by Inventor Anup Kumar

Anup Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210244477
    Abstract: Described herein are systems and methods in which a surgeon can use computer-implemented deformity assessment and correction tools to create 3D models of a bone. To ensure adequate healing, a surgeon may choose to use a prefabricated bone plate, a semi-customized bone plate, or a fully-customized bone plate to hold first and second bone portions in a corrected position. To select the appropriate prefabricated bone plate, the surgeon may identify three landmark locations on the first and second bone portions corresponding to desired fixation hole locations on the bone plate. The surgeon can then use a software application to evaluate multiple bone plate designs in a library and compare the average proximity of the landmark locations to fixation hole locations on each of the bone plate designs. Then, the surgeon can determine which bone plate design best fits the patient anatomy based on his comparison.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 12, 2021
    Inventors: Manoj Kumar Singh, Anup Kumar
  • Publication number: 20210205813
    Abstract: Disclosed herein include systems, devices, and methods for generating and directly loading droplets onto a microfluidic device with contactless delivery. Droplets can be generated and loaded onto a sealed microfluidic device through one or more connecting ports. Loaded droplets can be manipulated, such as merged.
    Type: Application
    Filed: December 22, 2020
    Publication date: July 8, 2021
    Inventors: Kosuke Iwai, Jess Sustarich, William Randy Gaillard, Anup Kumar Singh
  • Patent number: 11033333
    Abstract: Described herein are systems and methods in which a surgeon can use computer-implemented deformity assessment and correction tools to create 3D models of a bone. To ensure adequate healing, a surgeon may choose to use a prefabricated bone plate, a semi-customized bone plate, or a fully-customized bone plate to hold first and second bone portions in a corrected position. To select the appropriate prefabricated bone plate, the surgeon may identify three landmark locations on the first and second bone portions corresponding to desired fixation hole locations on the bone plate. The surgeon can then use a software application to evaluate multiple bone plate designs in a library and compare the average proximity of the landmark locations to fixation hole locations on each of the bone plate designs. Then, the surgeon can determine which bone plate design best fits the patient anatomy based on his comparison.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: June 15, 2021
    Assignee: Stryker European Holdings I, LLC
    Inventors: Manoj Kumar Singh, Anup Kumar
  • Patent number: 11020186
    Abstract: A method of generating a correction plan for correcting a deformed bone includes inputting to a computer system a first image of the deformed bone in a first plane and inputting to the computer system a second image of the deformed bone in a second plane. Image processing techniques are employed to identify a plurality of anatomical landmarks of the deformed bone in the first image. The first image of the deformed bone is displayed on a display device. A graphical of the deformed bone is autonomously generated and graphically overlaid on the first image of the deformed bone on the display device, the graphical template including a plurality of lines, each line connected at each end to a landmark point corresponding to one of the anatomical landmarks. A model of the deformed bone may be autonomously generated based on the graphical template.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: June 1, 2021
    Assignee: Stryker European Operations Holdings LLC
    Inventors: Anup Kumar, Sridhar Anjanappa, Ashish Gangwar, Manash Lahiri, Arpit Gautam, Kanishk Sethi, Sistu Ganesh
  • Publication number: 20210108309
    Abstract: Implementations of the present disclosure generally relate to hardmask films and methods for depositing hardmask films. More particularly, implementations of the present disclosure generally relate to tungsten carbide hardmask films and processes for depositing tungsten carbide hardmask films. In one implementation, a method of forming a tungsten carbide film is provided. The method comprises forming a tungsten carbide initiation layer on a silicon-containing surface of a substrate at a first deposition rate. The method further comprises forming a tungsten carbide film on the tungsten carbide initiation layer at a second deposition rate, wherein the second deposition rate is greater than the first deposition rate.
    Type: Application
    Filed: January 3, 2019
    Publication date: April 15, 2021
    Inventors: Vivek Bharat SHAH, Anup Kumar SINGH, Bhaskar KUMAR, Ganesh BALASUBRAMANIAN
  • Patent number: 10892143
    Abstract: Implementations of the present disclosure provide methods for treating a processing chamber. In one implementation, the method includes purging a 300 mm substrate processing chamber, without the presence of a substrate, by flowing a purging gas into the substrate processing chamber at a flow rate of about 0.14 sccm/mm2 to about 0.33 sccm/mm2 and a chamber pressure of about 1 Torr to about 30 Torr, with a throttle valve of a vacuum pump system of the substrate processing chamber in a fully opened position, wherein the purging gas is chemically reactive with deposition residue on exposed surfaces of the substrate processing chamber.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: January 12, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Vivek Bharat Shah, Bhaskar Kumar, Anup Kumar Singh, Ganesh Balasubramanian
  • Publication number: 20200381222
    Abstract: Embodiments of the present disclosure generally relate to apparatuses for reducing particle contamination on substrates in a plasma processing chamber. In one or more embodiments, an edge ring is provided and includes a top surface, a bottom surface opposite the top surface and extending radially outward, an outer vertical wall extending between and connected to the top surface and the bottom surface, an inner vertical wall opposite the outer vertical wall, an inner lip extending radially inward from the inner vertical wall, and an inner step disposed between and connected to the inner wall and the bottom surface. During processing, the edge ring shifts the high plasma density zone away from the edge area of the substrate to avoid depositing particles on the substrate when the plasma is de-energized.
    Type: Application
    Filed: August 18, 2020
    Publication date: December 3, 2020
    Inventors: Bhaskar KUMAR, Prashanth KOTHNUR, Sidharth BHATIA, Anup Kumar SINGH, Vivek Bharat SHAH, Ganesh BALASUBRAMANIAN, Changgong WANG
  • Publication number: 20200356443
    Abstract: An information management system according to certain aspects may be configured to generate a snapshot of data relating to a plurality of applications. The system may include a plurality of data agents, wherein each data agent is associated with at least one of a plurality of applications, and data generated by the plurality of applications is stored in a logical volume in primary storage. The system may also include a snapshot manager configured to detect the plurality of applications; check with the plurality of data agents whether the associated applications are in consistent states; obtain a snapshot of the logical volume in response to receiving notifications from the plurality of data agents that the associated applications are in consistent states; and generate mapping information between a particular one of the plurality of applications and a portion of the snapshot relating to the particular one of the plurality of applications.
    Type: Application
    Filed: April 24, 2020
    Publication date: November 12, 2020
    Inventors: Rahul S. PAWAR, Jun H. AHN, Manas Bhikchand MUTHA, Henry Wallace DORNEMANN, Anup KUMAR
  • Publication number: 20200357668
    Abstract: Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.
    Type: Application
    Filed: July 28, 2020
    Publication date: November 12, 2020
    Inventors: Sidharth BHATIA, Edward P. HAMMOND, IV, Bhaskar KUMAR, Anup Kumar SINGH, Vivek Bharat SHAH, Ganesh BALASUBRAMANIAN
  • Publication number: 20200350146
    Abstract: A method and apparatus for operating a plasma processing chamber includes performing a plasma process at a process pressure and a pressure power to generate a plasma. A first ramping-down stage starts in which the process power and the process pressure are ramped down substantially simultaneously to an intermediate power level and an intermediate pressure level, respectively. The intermediate power level and intermediate pressure level are preselected so as to raise a plasma sheath boundary above a threshold height from a surface of a substrate. A purge gas is flowed from a showerhead assembly at a sufficiently high rate to sweep away contaminant particles trapped in the plasma such that one or more contaminant particles move outwardly of an edge of the substrate. A second ramping-down stage starts where the intermediate power level and the intermediate pressure level decline to a zero level and a base pressure, respectively.
    Type: Application
    Filed: July 13, 2020
    Publication date: November 5, 2020
    Inventors: Bhaskar KUMAR, Anup Kumar SINGH, Vivek Bharat SHAH, Sidharth BHATIA, Ganesh BALASUBRAMANIAN
  • Patent number: 10790121
    Abstract: Implementations of the present disclosure generally relate to an apparatus for reducing particle contamination on substrates in a plasma processing chamber. The apparatus for reduced particle contamination includes a chamber body, a lid coupled to the chamber body. The chamber body and the lid define a processing volume therebetween. The apparatus also includes a substrate support disposed in the processing volume and an edge ring. The edge ring includes an inner lip disposed over a substrate, a top surface connected to the inner lip, a bottom surface opposite the top surface and extending radially outward from the substrate support, and an inner step between the bottom surface and the inner lip. To avoid depositing the particles on the substrate being processed when the plasma is de-energized, the edge ring shifts the high plasma density zone away from the edge area of the substrate.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: September 29, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bhaskar Kumar, Prashanth Kothnur, Sidharth Bhatia, Anup Kumar Singh, Vivek Bharat Shah, Ganesh Balasubramanian, Changgong Wang
  • Publication number: 20200302581
    Abstract: A data restoring method using compressed sensing and computer program product, the method includes (a) continuously measuring data for plural times to generate measurement results correspondingly, and processing the i-th measurement result using the compressed sensing, and starting to generate data matrix when times of measuring reaches a preset times of measurements N; (b) generating a first data matrix using the [(j+1)?N]th to the j-the measurements, and then generating a first restored data; (c) generating a second data matrix using the [(j+2)?N]th to the (j+1)-the measurements, and then generating a second restored data; (d) calculating an error between the first and the second restored data; (e) determining whether the error keeps constant for a predetermined number of times; (f) if not, repeating steps (c) to (e).
    Type: Application
    Filed: July 3, 2019
    Publication date: September 24, 2020
    Applicants: National Tsing Hua University, Advanced ACEBIOTEK CO., LTD.
    Inventors: Ci-Ling Pan, Bo-Lin Jian, Anup Kumar Sahoo
  • Patent number: 10754201
    Abstract: A liquid crystal photoelectric apparatus including an upper substrate, a lower substrate, a plurality of alignment layers, and a liquid crystal material is provided. The alignment layers include an upper alignment layer, a lower alignment layer, and at least one intermediate alignment layer. The upper alignment layer has a first orientation direction. The lower alignment layer has a second orientation direction. The at least one intermediate alignment layer has an intermediate orientation direction. The intermediate orientation direction is between the first orientation direction and the second orientation direction. The liquid crystal material includes a plurality of liquid crystal material portions. Each of the liquid crystal material portions is disposed between any adjacent two alignment layers. A manufacturing method of the liquid crystal photoelectric apparatus is also provided.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: August 25, 2020
    Assignees: National Tsing Hua University, Advanced Comm. Engineering Solution Co., Ltd.
    Inventors: Ci-Ling Pan, Anup Kumar Sahoo, Chun-Ling Yen, Chan-Shan Yang, Yi-Hsin Lin, Hung-Chun Lin, Yu-Jen Wang
  • Patent number: 10748797
    Abstract: Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.
    Type: Grant
    Filed: January 18, 2018
    Date of Patent: August 18, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sidharth Bhatia, Edward P. Hammond, IV, Bhaskar Kumar, Anup Kumar Singh, Vivek Bharat Shah, Ganesh Balasubramanian
  • Publication number: 20200246078
    Abstract: A computer process including receiving first patient bone data of a patient leg and foot in a first pose, the first pose comprising a position and orientation of the patient leg relative to the patient foot as defined in the first patient bone data. The computer process may further include receiving second patient bone data of the patient leg and foot in a second pose, the second pose comprising a position and orientation of the patient leg relative to the patient foot as defined in the second patient bone data. The computer process may further include generating a 3D bone model of the patient leg and foot. Finally, the computer process may include modifying the 3D bone model of the patient leg and foot such that the plurality of 3D bone models are reoriented into a third pose that matches the second pose.
    Type: Application
    Filed: April 23, 2020
    Publication date: August 6, 2020
    Applicant: Stryker European Holdings I, LLC
    Inventors: Ashish Gangwar, Kanishk Sethi, Anup Kumar, Ryan Sellman, Peter Sterrantino, Manoj Kumar Singh
  • Patent number: 10718707
    Abstract: A liquid crystal photoelectric apparatus includes a first and a second quartz glass substrates, an upper alignment layer disposed between the first and the second quartz glass substrates, a lower alignment layer disposed between the upper alignment layer and the second quartz glass substrate, a liquid crystal material disposed between the upper and the lower alignment layers, a first transparent conductive layer disposed between the upper alignment layer and the first quartz glass substrate and including at least one first main portion and first finger portions extending from the corresponding first main portion and a second transparent conductive layer second transparent conductive layer disposed between the lower alignment layer and the second quartz glass substrate and including a second main portion and second finger portions extending from the second main portion in an extension direction perpendicular to that of the first finger portions. An optical imaging processing system is provided.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: July 21, 2020
    Assignees: National Tsing Hua University, Advanced Comm. Engineering Solution Co., Ltd.
    Inventors: Ci-Ling Pan, Anup Kumar Sahoo, Chan-Shan Yang, Chun-Ling Yen, Yuan-Chun Lu
  • Patent number: 10714319
    Abstract: A method and apparatus for operating a plasma processing chamber includes performing a plasma process at a process pressure and a pressure power to generate a plasma. A first ramping-down stage starts in which the process power and the process pressure are ramped down substantially simultaneously to an intermediate power level and an intermediate pressure level, respectively. The intermediate power level and intermediate pressure level are preselected so as to raise a plasma sheath boundary above a threshold height from a surface of a substrate. A purge gas is flowed from a showerhead assembly at a sufficiently high rate to sweep away contaminant particles trapped in the plasma such that one or more contaminant particles move outwardly of an edge of the substrate. A second ramping-down stage starts where the intermediate power level and the intermediate pressure level decline to a zero level and a base pressure, respectively.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: July 14, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bhaskar Kumar, Anup Kumar Singh, Vivek Bharat Shah, Sidharth Bhatia, Ganesh Balasubramanian
  • Publication number: 20200198872
    Abstract: The subject matter disclosed herein relates a doubled layered liquid bottle (100) to keep water cool by approximately 2½ to 4½ hours more without any real increase 5 in the cost of the product. The present bottle (100) has inner compartment (101) and an outer compartment (103) which defines an air gap (102) there between. The air gap (102) which act as an insulation layer to restrict heat loss to environment.
    Type: Application
    Filed: March 15, 2018
    Publication date: June 25, 2020
    Inventors: R.P. AGARWAL, ANUP KUMAR GUPTA
  • Patent number: 10688538
    Abstract: Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate-processing chamber. In one implementation, the method comprises forming a reactive fluorine species from a fluorine-containing cleaning gas mixture. The method further comprises delivering the reactive fluorine species into a processing volume of a substrate-processing chamber. The processing volume includes one or more aluminum-containing interior surfaces having unwanted deposits formed thereon. The method further comprises permitting the reactive fluorine species to react with the unwanted deposits and aluminum-containing interior surfaces of the substrate-processing chamber to form aluminum fluoride. The method further comprises exposing nitrogen-containing cleaning gas mixture to in-situ plasma to form reactive nitrogen species in the processing volume.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: June 23, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vivek Bharat Shah, Anup Kumar Singh, Bhaskar Kumar, Ganesh Balasubramanian, Bok Hoen Kim
  • Publication number: 20200179055
    Abstract: A method of generating a correction plan for correcting a deformed bone includes inputting to a computer system a first image of the deformed bone in a first plane and inputting to the computer system a second image of the deformed bone in a second plane. Image processing techniques are employed to identify a plurality of anatomical landmarks of the deformed bone in the first image. The first image of the deformed bone is displayed on a display device. A graphical of the deformed bone is autonomously generated and graphically overlaid on the first image of the deformed bone on the display device, the graphical template including a plurality of lines, each line connected at each end to a landmark point corresponding to one of the anatomical landmarks. A model of the deformed bone may be autonomously generated based on the graphical template.
    Type: Application
    Filed: February 18, 2020
    Publication date: June 11, 2020
    Inventors: Anup Kumar, Sridhar Anjanappa, Ashish Gangwar, Manash Lahiri, Arpit Gautam, Kanishk Sethi, Sistu Ganesh