Patents by Inventor Arash Abedijaberi

Arash Abedijaberi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11181685
    Abstract: The present disclosure provides optical fibers with an impact-resistant coating system. The fibers feature low microbending and high mechanical reliability. The coating system includes a primary coating and a secondary coating. The primary coating and secondary coating have reduced thickness to provide reduced radius fibers without sacrificing protection. The primary coating has a low spring constant and sufficient thickness to resist transmission of force to the glass fiber. The secondary coating has high puncture resistance. The outer diameter of the optical fiber is less than or equal to 200 ?m.
    Type: Grant
    Filed: January 5, 2021
    Date of Patent: November 23, 2021
    Assignee: Corning Incorporated
    Inventors: Arash Abedijaberi, Scott Robertson Bickham, Darren Andrew Stainer, Pushkar Tandon
  • Publication number: 20210208335
    Abstract: The present disclosure provides optical fibers with an impact-resistant coating system. The fibers feature low microbending and high mechanical reliability. The coating system includes a primary coating and a secondary coating. The primary coating and secondary coating have reduced thickness to provide reduced radius fibers without sacrificing protection. The primary coating has a low spring constant and sufficient thickness to resist transmission of force to the glass fiber. The secondary coating has high puncture resistance. The outer diameter of the optical fiber is less than or equal to 200 ?m.
    Type: Application
    Filed: January 5, 2021
    Publication date: July 8, 2021
    Inventors: Arash Abedijaberi, Scott Robertson Bickham, Darren Andrew Stainer, Pushkar Tandon
  • Publication number: 20210179478
    Abstract: Apparatuses and methods for processing an optical fiber preform are disclosed. According to one aspect, an apparatus may generally include a muffle defining an interior volume enclosed by at least one sidewall and a handle assembly for supporting the optical fiber preform in the muffle. The handle assembly may be removably coupled to the muffle and extend into the interior volume. At least one baffle may be positioned in the interior volume and define an upper portion of the interior volume and a lower portion of the interior volume. The at least one baffle may define at least one flow channel between the upper portion of the interior volume and the lower portion of the interior volume.
    Type: Application
    Filed: December 8, 2020
    Publication date: June 17, 2021
    Inventors: Arash Abedijaberi, Elena Alekseevna Chizhova-Notkina, Steven Bruce Dawes, Nikolay Anatolyevich Panin
  • Publication number: 20210147980
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Application
    Filed: January 29, 2021
    Publication date: May 20, 2021
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Patent number: 10907251
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: February 2, 2021
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Patent number: 10344380
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Grant
    Filed: February 10, 2014
    Date of Patent: July 9, 2019
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Publication number: 20190136375
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Application
    Filed: December 28, 2018
    Publication date: May 9, 2019
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Publication number: 20190136376
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Application
    Filed: December 28, 2018
    Publication date: May 9, 2019
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Patent number: 10145011
    Abstract: A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: December 4, 2018
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Arash Abedijaberi, John A. Pitney, Shawn George Thomas
  • Patent number: 10007255
    Abstract: A method for controlling temperatures in an epitaxial reactor for use in a wafer-production process is provided. The method is implemented by a computing device coupled to a memory. The method includes transmitting, to a heating device in a first zone of the epitaxial reactor, an output power instruction representing a base output power. The method additionally includes determining an actual time period for a temperature in the first zone of the epitaxial reactor to reach a target temperature, determining a difference between the actual time period and a reference time period, determining an output power offset based on the difference, and storing the output power offset in the memory in association with the heating device.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: June 26, 2018
    Assignee: SunEdison Semiconductor Limited (UEN201334164H)
    Inventors: Benno Orschel, Arash Abedijaberi, Gang Wang, Ellen Torack
  • Publication number: 20160289830
    Abstract: A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.
    Type: Application
    Filed: March 29, 2016
    Publication date: October 6, 2016
    Inventors: Arash Abedijaberi, John A. Pitney, Shawn George Thomas
  • Publication number: 20150378372
    Abstract: A method for controlling temperatures in an epitaxial reactor for use in a wafer-production process is provided. The method is implemented by a computing device coupled to a memory. The method includes transmitting, to a heating device in a first zone of the epitaxial reactor, an output power instruction representing a base output power. The method additionally includes determining an actual time period for a temperature in the first zone of the epitaxial reactor to reach a target temperature, determining a difference between the actual time period and a reference time period, determining an output power offset based on the difference, and storing the output power offset in the memory in association with the heating device.
    Type: Application
    Filed: June 27, 2014
    Publication date: December 31, 2015
    Inventors: Benno Orschel, Arash Abedijaberi, Gang Wang, Ellen Torack
  • Patent number: 9117670
    Abstract: A system for depositing a layer on a substrate includes a processing chamber, a gas injecting port for introducing gas into the system, a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein, and an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber. The inject insert liner assembly defines gas flow channels therein extending along a lengthwise direction of the system, wherein each channel includes an inlet and an outlet, and at least one channel is tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction. The inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: August 25, 2015
    Assignee: SunEdison Semiconductor Limited (UEN201334164H)
    Inventors: Arash Abedijaberi, John Allen Pitney, Shawn Thomas
  • Publication number: 20140273410
    Abstract: A system for depositing a layer on a substrate includes a processing chamber, a gas injecting port for introducing gas into the system, a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein, and an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber. The inject insert liner assembly defines gas flow channels therein extending along a lengthwise direction of the system, wherein each channel includes an inlet and an outlet, and at least one channel is tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction. The inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Inventors: Arash Abedijaberi, John Allen Pitney, Shawn Thomas
  • Publication number: 20140273411
    Abstract: A method of depositing an epitaxial layer on a silicon wafer is described. The silicon wafer has a diameter, and is disposed within a processing chamber within a deposition system. The deposition includes a gas distribution plate in fluid communication with a gas injecting port and the processing chamber. The method includes the steps of introducing a process gas into the system from the gas injecting port, flowing the process gas through a flow channel extending along a lengthwise direction of the system and being tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction, wherein the flow channel is defined by an inject insert liner assembly adjacent to the gas distribution plate, and depositing an epitaxial layer on the wafer at a deposition rate of at least about 2.3 micrometers per minute.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Inventors: Arash Abedijaberi, John Allen Pitney, Manabu Hamano
  • Publication number: 20140224174
    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.
    Type: Application
    Filed: February 10, 2014
    Publication date: August 14, 2014
    Inventors: Arash Abedijaberi, Shawn George Thomas
  • Publication number: 20140224175
    Abstract: A gas distribution manifold for a chemical vapor deposition reactor includes a first gas distribution zone including a central gas port located in a central portion of the manifold. The manifold also includes a second gas distribution zone including at least two intermediate ports adjacent the central gas port. The manifold further includes a third gas distribution zone including at least two outer ports, each one of the outer ports spaced from the central gas port by one of the intermediate ports. The gas distribution manifold includes a fourth gas distribution zone comprising at least two edge ports, each edge port being spaced from the central outlet port by at least one of the intermediate and outer ports.
    Type: Application
    Filed: February 14, 2013
    Publication date: August 14, 2014
    Applicant: MEMC ELECTRONIC MATERIALS, INC.
    Inventor: Arash Abedijaberi