Abstract: A corner bracket may include first and second retainers configured to receive respective ends of first and second frame members, such that the first and second frame members are substantially perpendicular with respect to one another. The first and second retainers may include structural and sealing portions, wherein the structural portion includes a first material and the sealing portion includes a second material, with the first material being relatively more rigid than the second material, and the second material being relatively more elastic than the first material. The corner bracket may also include first and second exterior surfaces at least partially including the second material and first and second door panel interfaces configured to provide a seal between the first and second exterior surfaces and interior surfaces of first and second door panels in a closed position. The corner bracket may be incorporated into a frame for a cabinet.

Abstract: A corner bracket may include first and second retainers configured to receive respective ends of first and second frame members, such that the first and second frame members are substantially perpendicular with respect to one another. The first and second retainers may include structural and sealing portions, wherein the structural portion includes a first material and the sealing portion includes a second material, with the first material being relatively more rigid than the second material, and the second material being relatively more elastic than the first material. The corner bracket may also include first and second exterior surfaces at least partially including the second material and first and second door panel interfaces configured to provide a seal between the first and second exterior surfaces and interior surfaces of first and second door panels in a closed position. The corner bracket may be incorporated into a frame for a cabinet.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: Embodiments of the disclosure relate to an optical fiber ribbon. The optical fiber ribbon includes a plurality of subunits each having a subunit coating surrounding at least one optical fiber. The subunit coating is made of a first material. The optical fiber ribbon also includes a plurality of bonds intermittently formed between adjacent subunits of the plurality of subunits. The plurality of bonds are made of a second material. Each bond of the plurality of bonds has a unique longitudinal position along a length of the optical fiber ribbon such that no other bond of the plurality of bonds is located at the unique longitudinal position. Further, each bond of the plurality of bonds includes a diffusion zone comprising a mixture of the first material and the second material.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A corner bracket may include first and second retainers configured to receive respective ends of first and second frame members, such that the first and second frame members are substantially perpendicular with respect to one another. The first and second retainers may include structural and sealing portions, wherein the structural portion includes a first material and the sealing portion includes a second material, with the first material being relatively more rigid than the second material, and the second material being relatively more elastic than the first material. The corner bracket may also include first and second exterior surfaces at least partially including the second material and first and second door panel interfaces configured to provide a seal between the first and second exterior surfaces and interior surfaces of first and second door panels in a closed position. The corner bracket may be incorporated into a frame for a cabinet.

Abstract: Apparatuses and methods for processing an optical fiber preform are disclosed. According to one aspect, an apparatus may generally include a muffle defining an interior volume enclosed by at least one sidewall and a handle assembly for supporting the optical fiber preform in the muffle. The handle assembly may be removably coupled to the muffle and extend into the interior volume. At least one baffle may be positioned in the interior volume and define an upper portion of the interior volume and a lower portion of the interior volume. The at least one baffle may define at least one flow channel between the upper portion of the interior volume and the lower portion of the interior volume.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: The present disclosure provides optical fibers with an impact-resistant coating system. The fibers feature low microbending and high mechanical reliability. The coating system includes a primary coating and a secondary coating. The primary coating and secondary coating have reduced thickness to provide reduced radius fibers without sacrificing protection. The primary coating has a low spring constant and sufficient thickness to resist transmission of force to the glass fiber. The secondary coating has high puncture resistance. The outer diameter of the optical fiber is less than or equal to 200 ?m.

Abstract: The present disclosure provides optical fibers with an impact-resistant coating system. The fibers feature low microbending and high mechanical reliability. The coating system includes a primary coating and a secondary coating. The primary coating and secondary coating have reduced thickness to provide reduced radius fibers without sacrificing protection. The primary coating has a low spring constant and sufficient thickness to resist transmission of force to the glass fiber. The secondary coating has high puncture resistance. The outer diameter of the optical fiber is less than or equal to 200 ?m.

Abstract: Apparatuses and methods for processing an optical fiber preform are disclosed. According to one aspect, an apparatus may generally include a muffle defining an interior volume enclosed by at least one sidewall and a handle assembly for supporting the optical fiber preform in the muffle. The handle assembly may be removably coupled to the muffle and extend into the interior volume. At least one baffle may be positioned in the interior volume and define an upper portion of the interior volume and a lower portion of the interior volume. The at least one baffle may define at least one flow channel between the upper portion of the interior volume and the lower portion of the interior volume.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract: A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.

Abstract: A method for controlling temperatures in an epitaxial reactor for use in a wafer-production process is provided. The method is implemented by a computing device coupled to a memory. The method includes transmitting, to a heating device in a first zone of the epitaxial reactor, an output power instruction representing a base output power. The method additionally includes determining an actual time period for a temperature in the first zone of the epitaxial reactor to reach a target temperature, determining a difference between the actual time period and a reference time period, determining an output power offset based on the difference, and storing the output power offset in the memory in association with the heating device.

Abstract: A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.

Abstract: A method for controlling temperatures in an epitaxial reactor for use in a wafer-production process is provided. The method is implemented by a computing device coupled to a memory. The method includes transmitting, to a heating device in a first zone of the epitaxial reactor, an output power instruction representing a base output power. The method additionally includes determining an actual time period for a temperature in the first zone of the epitaxial reactor to reach a target temperature, determining a difference between the actual time period and a reference time period, determining an output power offset based on the difference, and storing the output power offset in the memory in association with the heating device.