Patents by Inventor Ari Aviram
Ari Aviram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6197896Abstract: Solutions of graft polymers of a polymer having reactive hydrogen groups and grafted through reactive hydrogen groups an alkoxy metallic compound wherein the metal is titanium, zirconium and/or hafnium are useful as photoresist materials which are resistant to plasma. Also, compounds and graft polymers wherein the alkoxy metallic compound also contains silicon, tin or germanium are provided.Type: GrantFiled: July 12, 1999Date of Patent: March 6, 2001Assignee: International Business Machines CorporationInventors: Ari Aviram, Inna V. Babich
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Patent number: 6171757Abstract: Compositions comprising a polymer of organometallic polymerizable monomer acid or ester are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.Type: GrantFiled: July 12, 1999Date of Patent: January 9, 2001Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong
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Patent number: 6100011Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.Type: GrantFiled: October 27, 1998Date of Patent: August 8, 2000Assignee: International Business Machines CorporationInventors: Ari Aviram, Andrew T. S. Pomerene, David Earle Seeger
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Patent number: 5972571Abstract: Negative lithographic patterns are produced by imagewise exposing to electromagnetic radiation compositions comprising a polymer having pendant recurring ester groups or carbonate groups or both that contain a hetero atom; and a photoinitiator capable of releasing acid upon exposure to electromagnetic radiation. Specific polymersave poly(Hydroxy Alkyl) maleates.Type: GrantFiled: December 2, 1997Date of Patent: October 26, 1999Assignee: International Business Machines CorporationInventor: Ari Aviram
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Patent number: 5955242Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.Z --H; and mixturesthereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.Type: GrantFiled: September 23, 1996Date of Patent: September 21, 1999Assignee: International Business Machines CorporationInventors: Ari Aviram, Andrew T. S. Pomerene, David Earle Seeger
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Patent number: 5908732Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.Type: GrantFiled: September 23, 1996Date of Patent: June 1, 1999Assignee: International Business Machines CorporationInventors: Ari Aviram, Karen Elizabeth Petrillo, Andrew T. S. Pomerene, David Earle Seeger
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Patent number: 5644038Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.Type: GrantFiled: March 15, 1996Date of Patent: July 1, 1997Assignee: International Business Machines CorporationInventors: Ari Aviram, William Ross Brunsvold, Daniel Bucca, Willard Earl Conley, Jr., David Earle Seeger
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Patent number: 5567569Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.Type: GrantFiled: March 15, 1996Date of Patent: October 22, 1996Assignee: International Business Machines CorporationInventors: Ari Aviram, William R. Brunsvold, Daniel Bucca, Willard E. Conley, Jr., David E. Seeger
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Patent number: 5552256Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.Type: GrantFiled: September 29, 1994Date of Patent: September 3, 1996Assignee: International Business Machines CorporationInventors: Ari Aviram, William R. Brunsvold, Daniel Bucca, Willard E. Conley, Jr., David E. Seeger
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Patent number: 4692044Abstract: An improved resistive ribbon for thermal transfer printing is provided, where the ribbon includes a resistive layer, a metal current-return layer, a fusible ink layer, and an electric interface layer located between the resistive layer and the metal layer. The electrical interface layer is sufficiently thin so as not to impair the required mechanical properties of the ribbon (such as flexibility, stability, durability, etc.), and has as its primary function the enhancement of the electrical porperties of the ribbon. Specifically, interface resistance and/or knee voltage of the current-voltage characteristics of the ribbon are enhanced by the electrical interface layer.Preferred compositions of the interface layer include alkylalkoxy silanes of a specific formula, and especially nonsymmetrical compounds of that formula.Type: GrantFiled: April 30, 1985Date of Patent: September 8, 1987Assignee: International Business Machines CorporationInventors: Ari Aviram, Kwang K. Shih
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Patent number: 4609926Abstract: An improved technique and apparatus for color-on-demand resistive ribbon printing is provided in which selected colored ink layers are transferred to a resistive printing ribbon from a color-bearing ribbon, prior to resistive ribbon printing. The color ribbon and the resistive printing ribbon both contain ink layers, the only difference being that the ink layer in the printing ribbon is preferrably uncolored. When the ink layers on the two ribbons are brought into contact with one another and heated, the ink layers will become tacky and will adhere to one another. The temperatures of these ink layers are then reduced and the printing ribbon and the color ribbon are separated from one another to cause the colored ink layer on the color ribbon to separate from that ribbon and adhere to the printing ribbon, thus causing a transfer of the colored ink layer to the printing ribbon. After this, the resistive printing ribbon can be used to print colors.Type: GrantFiled: April 30, 1985Date of Patent: September 2, 1986Assignee: International Business Machines CorporationInventors: Ari Aviram, Derek B. Dove
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Patent number: 4577983Abstract: This printing apparatus and technique incorporates a color transfer station to impart a desired color to a fusible ink layer on a ribbon. The color transfer station is located between a supply reel providing the ribbon for printing, and the location where actual printing occurs. This color transfer technique is particularly suitable for use in resistive ribbon thermal transfer printing, where economical use of the ribbon is mandatory. The structure for transferring color to the ink layer of the ribbon utilizes wicks, felt-coated rollers, nozzles, etc., to bring a selected colorant solution into contact with the ink layer of the ribbon, in accordance with the color desired for printing.Type: GrantFiled: June 29, 1984Date of Patent: March 25, 1986Assignee: International Business Machines CorporationInventors: Ari Aviram, Derek B. Dove, Ramon Lane
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Patent number: 4568621Abstract: Processes for thermal transfer printing are disclosed which comprise electroerosion printing to produce an image bearing element and exposing the imaged element to irradiation so as to permit transfer of thermographic ink from an associated ink layer or ink-containing element onto an ink receiving substrate thus producing copies of the image carried by the image bearing element. Also, described are products for use in such processes.Type: GrantFiled: October 22, 1984Date of Patent: February 4, 1986Assignee: International Business Machines CorporationInventors: Ari Aviram, Mitchell S. Cohen
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Patent number: 4549824Abstract: By adding an aromatic azido compound which exotherms at the conditions of thermal ink transfer to a thermal transfer ink, an improved thermal transfer ink and thermal transfer ink process are achieved.Type: GrantFiled: December 30, 1983Date of Patent: October 29, 1985Assignee: International Business Machines CorporationInventors: Krishna G. Sachdev, Ari Aviram
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Patent number: 4538252Abstract: A method for capacitatively storing data on a grooveless storage device is provided. The storage device is comprised of a conductive substrate having a layer of a photosensitive composition which dielectric constant is varied in the presence of irradiation. The method is carried out by exposing a layer of a photosensitive composition to irradiation in a predetermined pattern. The exposed layer is fixed by heating. Video disks for recording and playing back video signals can be prepared in accordance with the present method.Type: GrantFiled: August 24, 1981Date of Patent: August 27, 1985Assignee: International Business Machines CorporationInventor: Ari Aviram
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Patent number: 4525722Abstract: Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and specifically hydrazone derivatives which are substantially colorless, and have a molecular weight in the approximate range 150-650.Type: GrantFiled: February 23, 1984Date of Patent: June 25, 1985Assignee: International Business Machines CorporationInventors: Krishna G. Sachdev, Harbans S. Sachdev, Ari Aviram, Mark A. Wizner
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Patent number: 4491431Abstract: A resistive ribbon printing technique is described in which the ribbon includes a resistive layer comprised of a metal-wide bandgap insulator combination. The ribbon also includes a support layer, where the support function can be provided by the resistive layer, and a fusible ink layer. Electrical current through the resistive layer produces heat which locally melts the ink for transfer to an adjacent receiving medium. The wide bandgap insulator of the resistive layer must have a bandgap of at least three volts. Many different metals and insulators can be used, where the relative amounts of metal and insulator are chosen to provide a desired resistivity for any type of resistive ribbon printing application.Type: GrantFiled: December 30, 1982Date of Patent: January 1, 1985Assignee: International Business Machines CorporationInventors: Ari Aviram, Kwang K. Shih
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Patent number: 4491432Abstract: Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and include nonaromatic azo compounds, peroxides, and strained valence compounds, such as monomers, dimers, trimers, of the type which change their chemical bonding when they decompose to either a valence isomer or break into a number of molecular species.Type: GrantFiled: December 30, 1982Date of Patent: January 1, 1985Assignee: International Business Machines CorporationInventors: Ari Aviram, Kwang K. Shih
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Patent number: 4470714Abstract: A resistive ribbon for thermal transfer printing comprising a support layer bearing a fusible ink composition and a thin aluminum layer upon which is deposited a resistive layer of non-stoichiometric metal silicide is disclosed. Also disclosed are appropriate power sources for using the resistive ribbon, as well as methods for non-impact printing employing the disclosed ribbon.Type: GrantFiled: March 10, 1982Date of Patent: September 11, 1984Assignee: International Business Machines CorporationInventors: Ari Aviram, Kwang K. Shih
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Patent number: T105002Abstract: An improved lithographic printing plate includes a substrate layer of a nonconducting, hydrophobic polyester, an intermediate film of conducting, hydrophilic material such as aluminum and a top protective film of relatively hard hydrophilic dielectric material, such as aluminum oxide. A printing image is formed in the lithographic printing plate by an electroerosion process wherein erosion electrodes are pulsed with voltage to break down the dielectric in areas adjacent to the erosion electrodes and to evaporate or otherwise remove corresponding portions of the conducting film, thereby creating holes that extend through the dielectric and conducting films and that expose portions of the surface of the underlying hydrophobic substrate.Type: GrantFiled: April 20, 1984Date of Patent: January 1, 1985Inventors: Ari Aviram, John G. Cahill, Peter S. Hauge, Keith S. Pennington