Abstract: An apparatus for retaining a workpiece and a method of fabricating same. The apparatus contains an electrostatic chuck having a workpiece support surface. The workpiece support surface has protruded regions and non-protruded regions, where a total surface area of the protruded regions is less than a total surface area of the non-protruded regions. The apparatus contains a pedestal having a surface that supports a flex circuit. The topography of the chuck is formed by either machining the surface of the pedestal prior to adhering and conforming the flex circuit to the surface or sculpting the surface of an electrode within the flex circuit.

Abstract: Apparatus for retaining a workpiece in a semiconductor wafer processing system. The apparatus has a collector positioned between an electrostatic chuck pedestal and the floor of the processing chamber. The collector has inlet and exhaust control valves connected to inlet and exhaust ports for providing and expelling a backside heat transfer gas (e.g., Helium). Heat transfer exhaust cavities in the collector are connected to the exhaust port to rapidly draw the gas off the backside of the wafer. Additionally, control of the heat transfer gas layer uniformity during processing is achieved by opening and closing the valves to the inlet and exhaust ports as required.

Abstract: An electrostatic chuck (20) for holding a substrate (45) in a process chamber (80) having a voltage supply terminal (65) for charging the chuck (20). The chuck includes an electrostatic member (25) comprising at least one electrode (30), an electrically insulated holding surface (40) for holding a substrate (45) thereon, and an electrical contact surface (48) for providing charge to the electrode. A unidirectionally conducting coupler layer (70) electrically couples the contact surface (48) of the electrostatic member to the voltage supply terminal to conduct charge substantially only in a single direction from the terminal to the contact surface. Preferably, an electrical connector (50) having a junction surface (55) bonded to the contact surface (55) of the electrode, and a terminal surface (60) for electrically contacting the voltage supply terminal (65), is used to electrically couple the unidirectionally conducting coupler layer (70) to the voltage supply terminal (65).

Abstract: A seal for preventing leakage around a rotary shaft extending through a structural casing comprising an annular stationary rigid seal secured to the structural casing for surrounding the rotary shaft. The stationary rigid seal has a smooth sealing surface for establishing a seal, and a resilient rotary seal adapted to be secured to the rotary shaft and having an annular projecting edge for contacting the smooth sealing surface under a biased pressure to form a seal in conjunction therewith. The projecting edge is formed by the convergence of inner and outer forward surfaces. A radial surface extends to the inner concentric forward surface from a torque point at its forward cylindrical base. An outer rearward surface extends to the outer concentric forward surface from a pivot point at its rearward cylindrical base. The outer forward surface forms an angle with the central axis of the seal in a plane through the central axis of the seal of from 40.degree. to 60.degree..

Abstract: A dry-face sealing method for preventing leakage around a rotary shaft uses an annular rigid seal having a smooth sealing surface and an annular resilient seal having a projecting sealing edge aligned coaxially therewith. The annular resilient seal has a breaking elongation of at least about 100 percent of its original length, the resilient seal being stretched at least about 20 percent and less than 40 percent of its breaking elongation in a direction substantially parallel to the smooth sealing surface to align polymeric resilient seal components in a direction parallel with the smooth sealing surface and smooth the sealing surface thereof. The projecting edge, because of its shape and position, functions as a stress concentrator, concentrating the stress hardening effect on the sealing surface of the projecting edge.