Patents by Inventor Arnold Kholodenko

Arnold Kholodenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9905402
    Abstract: An optimized plasma processing chamber configured to provide a current path is provided. The optimized plasma processing chamber includes at least an upper electrode, a powered lower electrode, a heating plate, a cooling plate, a plasma chamber lid, and clamp ring. Both the heating plate and the cooling plate are disposed above the upper electrode whereas the heating plate is configured to heat the upper electrode while the cooling plate is configured to cool the upper electrode. The clamp ring is configured to secure the upper electrode to a plasma chamber lid and to provide a current path from the upper electrode to the plasma chamber lid. A pocket may be formed between the clamp ring and the upper electrode to hold at least the heater plate, wherein the pocket is configured to allow longitudinal and lateral tolerances for thermal expansion of the heater plate from repetitive thermal cycling.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: February 27, 2018
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwar Husain
  • Publication number: 20160282973
    Abstract: A method of designing a metal mesh touch sensor with randomized channel displacement includes generating a representation of a first conductive pattern. The representation of the first conductive pattern is partitioned into a plurality of representations of column channels. A random channel displacement is applied to at least one column channel. A representation of a second conductive pattern is generated. The representation of the second conductive pattern is partitioned into a plurality of representations of row channels. A random channel displacement is applied to at least one row channel.
    Type: Application
    Filed: April 7, 2015
    Publication date: September 29, 2016
    Inventors: Arnold Kholodenko, Hong Shu, Mark Wendt, Kenneth B. Frame, Francisco D. Saldana
  • Publication number: 20150325416
    Abstract: An optimized plasma processing chamber configured to provide a current path is provided. The optimized plasma processing chamber includes at least an upper electrode, a powered lower electrode, a heating plate, a cooling plate, a plasma chamber lid, and clamp ring. Both the heating plate and the cooling plate are disposed above the upper electrode whereas the heating plate is configured to heat the upper electrode while the cooling plate is configured to cool the upper electrode. The clamp ring is configured to secure the upper electrode to a plasma chamber lid and to provide a current path from the upper electrode to the plasma chamber lid. A pocket may be formed between the clamp ring and the upper electrode to hold at least the heater plate, wherein the pocket is configured to allow longitudinal and lateral tolerances for thermal expansion of the heater plate from repetitive thermal cycling.
    Type: Application
    Filed: July 24, 2015
    Publication date: November 12, 2015
    Inventors: Arnold Kholodenko, Anwar Husain
  • Patent number: 9111968
    Abstract: An optimized plasma processing chamber configured to provide a current path is provided. The optimized plasma processing chamber includes at least an upper electrode, a powered lower electrode, a heating plate, a cooling plate, a plasma chamber lid, and clamp ring. Both the heating plate and the cooling plate are disposed above the upper electrode whereas the heating plate is configured to heat the upper electrode while the cooling plate is configured to cool the upper electrode. The clamp ring is configured to secure the upper electrode to a plasma chamber lid and to provide a current path from the upper electrode to the plasma chamber lid. A pocket may be formed between the clamp ring and the upper electrode to hold at least the heater plate, wherein the pocket is configured to allow longitudinal and lateral tolerances for thermal expansion of the heater plate from repetitive thermal cycling.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: August 18, 2015
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwer Husain
  • Patent number: 8900400
    Abstract: A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: December 2, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Publication number: 20140251382
    Abstract: A method suctions liquid from an upper surface of a substrate as the substrate is transported by a carrier under a head in a chamber. This operation is performed by the first section of the head. The method causes a first film of cleaning foam to flow onto the upper surface of the substrate as the substrate proceeds under the head. This operation is performed by a second section which is contiguous to the first section in the head. The method causes a second film of rinsing fluid to flow onto the upper surface of the substrate as the substrate is carried under the head. This rinsing operation is performed by a third section which is contiguous to the second section in the head and which is defined partially around the second section and up to the first section.
    Type: Application
    Filed: May 22, 2014
    Publication date: September 11, 2014
    Applicant: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu Lin, Leon Ginzburg, Mark Mandelboym, Greg Tomasch, Anwar Husain
  • Patent number: 8757177
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: June 24, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Patent number: 8739805
    Abstract: In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: June 3, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Leon Ginzburg, Mark Mandelboym, Gregory A. Tomasch, Anwar Husain
  • Publication number: 20140041581
    Abstract: A head for dispensing a thin film of a fluid over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extends to an outlet slot. The plurality of feeds has a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. The fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the outlet slot onto the substrate.
    Type: Application
    Filed: October 11, 2013
    Publication date: February 13, 2014
    Applicant: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-yu Lin, Leon Ginzburg, Mark Mandelboym, Gregory A. Tomasch, Anwar Hussain
  • Patent number: 8584613
    Abstract: A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate.
    Type: Grant
    Filed: June 30, 2008
    Date of Patent: November 19, 2013
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-yu Lin, Leon Ginzburg, Mark Mandelboym, Gregory A. Tomasch, Anwar Husain
  • Patent number: 8557051
    Abstract: A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: October 15, 2013
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwar Husain, Gregory A. Tomasch, Cheng-Yu (Sean) Lin
  • Publication number: 20130068261
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Application
    Filed: November 6, 2012
    Publication date: March 21, 2013
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Publication number: 20130048765
    Abstract: A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
    Type: Application
    Filed: October 26, 2012
    Publication date: February 28, 2013
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Patent number: 8317966
    Abstract: Conditioning fluid flow into a proximity head is provided for fluid delivery to a wafer surface. An upper plenum connected to a plurality of down flow bores is supplied by a main bore. The down flow bores provide fluid into the upper plenum, and a resistor bore is connected to the upper plenum. The resistor bore receives a resistor having a shape so as to limit flow of the fluid through the resistor bore. A lower plenum connected to the resistor bore is configured to receive fluid from the resistor bore as limited by the resistor for flow to a plurality of outlet ports extending between the lower plenum and surfaces of the head surface. Fluid flowing through the upper plenum, the resistor bore with the resistor and the lower plenum is substantially conditioned to define a substantially uniform fluid outflow from the plurality of outlet ports, across the width of the proximity head.
    Type: Grant
    Filed: February 7, 2009
    Date of Patent: November 27, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Patent number: 8317934
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: November 27, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Patent number: 8313582
    Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete holes connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: November 20, 2012
    Assignee: Lam Research Corporation
    Inventors: Robert O'Donnell, Cheng-Yu (Sean) Lin, Arnold Kholodenko
  • Patent number: 8292697
    Abstract: A carrier structure for supporting a substrate when being processed by passing the carrier through a meniscus formed by upper and lower proximity heads is described. A method of manufacturing the carrier further described. The method includes forming a composite frame having a carbon fiber core, a top sheet, a bottom sheet, a layer of aramid fabric between the top sheet and the core and a second layer of aramid fabric between the bottom sheet and the core. The top sheet and the bottom are each formed from a polymer material. The method further includes forming an opening sized for receiving a substrate and providing a plurality of support pins extending into the opening for supporting the substrate within the opening. The opening is formed slightly larger than the substrate such that a gap exists between the substrate and the opening.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: October 23, 2012
    Assignee: Lam Research Corporation
    Inventors: Wing Lau Cheng, Helen Cheng, legal representative, Arnold Kholodenko
  • Publication number: 20120255618
    Abstract: A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
    Type: Application
    Filed: April 12, 2012
    Publication date: October 11, 2012
    Inventors: Arnold Kholodenko, Anwar Husain, Gregory A. Tomasch, Chen-Yu (Sean) Lin
  • Patent number: 8261905
    Abstract: A drive rail includes a sealed interior cavity and an exterior drive surface that extends along a length of the drive rail. A first magnetic member is disposed within the interior cavity and adjacent to a surface of the interior cavity that is immediately opposite the exterior drive surface. A drive mechanism is disposed within the interior cavity and in connection with the first magnetic member, and is configured to move the first magnetic member within the interior cavity along the length of the drive rail, such that the first magnetic member remains immediately opposite the exterior drive surface. The first magnetic member is configured to magnetically couple through the exterior drive surface to a wafer carrier disposed adjacent to the exterior drive surface. Movement of the first magnetic member within the interior cavity along the drive rail causes corresponding movement of the wafer carrier along the exterior drive surface.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: September 11, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwar Husain, George Khait
  • Patent number: 8246755
    Abstract: In an example embodiment, a wet system delivers a flow of cleaning foam through a channel in a proximity head to a meniscus interfacing with a semiconductor wafer. The wet system diverts a sample of the flow from the channel through a transparent cell that is connected to the channel by an input passage that leads from the channel to the transparent cell and by an output passage that leads from the transparent cell back to the channel. The wet system illuminates the sample in the transparent cell with an LED from the top or the back and captures an image of the illuminated sample with a CCD camera. The image shows a morphological attribute of the cleaning foam such as bubble diameter or spacing. The wet system generates a statistical characterization from the morphological attribute and adjusts other attributes of the cleaning foam based on the statistical characterization.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: August 21, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Gregrory A. Tomasch, Leonid Ginzburg, Cheng-Yu (Sean) Lin