Patents by Inventor Arnoud Cornelis Wassink
Arnoud Cornelis Wassink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8269179Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.Type: GrantFiled: December 24, 2008Date of Patent: September 18, 2012Assignee: ASML Netherlands B.V.Inventors: Arnoud Cornelis Wassink, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans
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Patent number: 8018572Abstract: A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for filtering debris particles out of the radiation beam, and an illumination system configured to condition a radiation beam. A projection system is configured to project the projection beam of radiation onto a substrate. The filter system includes a plurality of foils for trapping the debris particles. At least one foil includes at least two parts that have a mutually different orientation and that are connected to each other along a substantially straight connection line. Each of the two parts substantially coincide with a virtual plane that extends through a predetermined position that substantially coincides with the radiation source. The straight connection substantially line coincides with a virtual straight line that also extends through the predetermined position.Type: GrantFiled: August 8, 2008Date of Patent: September 13, 2011Assignee: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink
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Patent number: 8018576Abstract: A contamination prevention system constructed and arranged to prevent material emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The contamination prevention system includes a channel barrier constructed and arranged to traverse the radiation from the radiation source. The channel barrier includes a plurality of elongated channel members constructed and arranged to absorb or deflect the material. The channel members are rotatable around an axis of rotation by a drive connected to the channel barrier. The contamination prevention system also includes a cooling system provided on an outer surface of the channel barrier.Type: GrantFiled: March 23, 2007Date of Patent: September 13, 2011Assignee: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink
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Publication number: 20110096308Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).Type: ApplicationFiled: January 5, 2011Publication date: April 28, 2011Applicant: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus FRANKEN, Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink
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Patent number: 7889312Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).Type: GrantFiled: September 22, 2006Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus Franken, Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink
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Patent number: 7868304Abstract: A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.Type: GrantFiled: February 7, 2005Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Johannes Christiaan Leonardus Franken, Arnoud Cornelis Wassink, Paul Peter Anna Antonius Brom
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Publication number: 20100259733Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).Type: ApplicationFiled: September 22, 2006Publication date: October 14, 2010Applicant: ASML Netherlands B.V.Inventors: Johannes Christiaan Franken, Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink
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Publication number: 20100141909Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.Type: ApplicationFiled: November 27, 2007Publication date: June 10, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailòvitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer, Denis Alexandrovich Glushkov
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Patent number: 7696492Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.Type: GrantFiled: December 13, 2006Date of Patent: April 13, 2010Assignee: ASML Netherlands B.V.Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailovitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer
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Patent number: 7612353Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2006Date of Patent: November 3, 2009Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
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Patent number: 7602472Abstract: A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.Type: GrantFiled: June 12, 2007Date of Patent: October 13, 2009Assignee: ASML Netherlands B.V.Inventors: Edwin Johan Buis, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Alexander Matthijs Struycken, Arnoud Cornelis Wassink, Paul Peter Anna Antonius Brom
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Publication number: 20090115980Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.Type: ApplicationFiled: December 24, 2008Publication date: May 7, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Arnoud Cornelis Wassink, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans
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Publication number: 20090045357Abstract: A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.Type: ApplicationFiled: October 14, 2008Publication date: February 19, 2009Applicant: ASML NETHERLANDS B.V.Inventor: Arnoud Cornelis Wassink
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Patent number: 7485881Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.Type: GrantFiled: December 28, 2005Date of Patent: February 3, 2009Assignee: ASML Netherlands B.V.Inventors: Arnoud Cornelis Wassink, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans
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Publication number: 20080309893Abstract: A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.Type: ApplicationFiled: June 12, 2007Publication date: December 18, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Edwin Johan Buis, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Alexander Matthijs Struycken, Arnoud Cornelis Wassink, Paul Peter Anna Antonius Brom
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Publication number: 20080304028Abstract: A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for filtering debris particles out of the radiation beam, and an illumination system configured to condition a radiation beam. A projection system is configured to project the projection beam of radiation onto a substrate. The filter system includes a plurality of foils for trapping the debris particles. At least one foil includes at least two parts that have a mutually different orientation and that are connected to each other along a substantially straight connection line. Each of the two parts substantially coincide with a virtual plane that extends through a predetermined position that substantially coincides with the radiation source. The straight connection substantially line coincides with a virtual straight line that also extends through the predetermined position.Type: ApplicationFiled: August 8, 2008Publication date: December 11, 2008Applicant: ASML NETHERLANDS B.V.Inventor: Arnoud Cornelis Wassink
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Patent number: 7453071Abstract: A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.Type: GrantFiled: March 29, 2006Date of Patent: November 18, 2008Assignee: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink
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Patent number: 7442948Abstract: A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrier is segmented in an inner segment and an outer segment relative to the central rotation axis. Accordingly, higher revolution speeds may be attained without compromising the contamination barrier.Type: GrantFiled: May 15, 2006Date of Patent: October 28, 2008Assignee: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink
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Publication number: 20080231820Abstract: A contamination prevention system constructed and arranged to prevent material emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The contamination prevention system includes a channel barrier constructed and arranged to traverse the radiation from the radiation source. The channel barrier includes a plurality of elongated channel members constructed and arranged to absorb or deflect the material. The channel members are rotatable around an axis of rotation by a drive connected to the channel barrier. The contamination prevention system also includes a cooling system provided on an outer surface of the channel barrier.Type: ApplicationFiled: March 23, 2007Publication date: September 25, 2008Applicant: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink
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Patent number: 7426018Abstract: A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for filtering debris particles out of the radiation beam, and an illumination system configured to condition a radiation beam. A projection system is configured to project the projection beam of radiation onto a substrate. The filter system includes a plurality of foils for trapping the debris particles. At least one foil includes at least two parts that have a mutually different orientation and that are connected to each other along a substantially straight connection line. Each of the two parts substantially coincide with a virtual plane that extends through a predetermined position that substantially coincides with the radiation source. The straight connection substantially line coincides with a virtual straight line that also extends through the predetermined position.Type: GrantFiled: December 27, 2005Date of Patent: September 16, 2008Assignee: ASML Netherlands B.V.Inventor: Arnoud Cornelis Wassink