Patents by Inventor Aron Pentek

Aron Pentek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8259413
    Abstract: A system according to one embodiment includes a write pole having an end region positioned towards an air bearing surface, a first flare point, and a second flare point positioned between the air bearing surface and the first flare point; and a shield positioned above the write pole, wherein a cross sectional area of the write pole at a point between the first and second flare points along a plane passing through the write pole and oriented about parallel to the air bearing surface is greater than a cross sectional area of the end region of the write pole along a plane oriented parallel to the plane passing through the second flare point. Additional systems and methods are also presented.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: September 4, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian René Bonhôte, Quang Le, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek
  • Patent number: 8252190
    Abstract: A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: August 28, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Patent number: 8225487
    Abstract: A method according to one embodiment includes forming a mask above a thin film sensor stack; forming an electrically insulating layer above the mask and sensor stack, the insulating layer having a portion extending along a nonhorizontal end of the mask; selectively removing the insulating layer except for the portion thereof extending along the nonhorizontal end of the mask; removing portions of the sensor stack that are not covered by the mask and the portion of the insulating layer, wherein an end of the portion of the insulating layer positioned away from the mask is about aligned with a back end of the sensor stack after removing the portions thereof; and removing the mask.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: July 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Ying Hong, Edward Hin Pong Lee, Aron Pentek, David John Seagle
  • Publication number: 20120154951
    Abstract: A method for manufacturing a magnetic write head having a that has a write pole with a tapered trailing edge in a pole tip region, and a trailing shield that has a leading edge that tapers away from the write pole at an angle that is greater than that taper angle of the trailing edge of the write pole. The magnetic head has a step feature with a front edge that is recessed from the ABS. In one embodiment a magnetic wedge is formed over the tapered surface of the write pole. In another embodiment, a non-magnetic bump is formed over a first tapered portion of the write pole adjacent to the front edge of the step feature, and a non-magnetic wedge is formed over a second tapered portion of the write pole and extends from the non-magnetic bump to the air bearing surface.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien D. Hsiao, Fenglin Liu, Aron Pentek, Yi Zheng
  • Patent number: 8189292
    Abstract: A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: May 29, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20120107645
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
    Type: Application
    Filed: December 28, 2011
    Publication date: May 3, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-Chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
  • Publication number: 20120106002
    Abstract: Magnetic write heads and corresponding fabrication methods for bi-layer wrap around shields resulting in dissimilar shield layer widths are disclosed. A gap structure is formed around a main write pole for a magnetic write head. A wrap around shield for the main write pole is fabricated to include a first magnetic layer proximate to the main write pole and a second magnetic layer on the first magnetic layer. A width of the first magnetic layer is less than the width of the second magnetic layer, and back edges of the first and second magnetic layers are coplanar. Further, a throat height of the wrap around shield is maintained between the first and the second magnetic layers because their back edges are coplanar.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 3, 2012
    Inventors: Yimin Hsu, Aron Pentek, Thomas Roucoux, Jing Zhang, Honglin Zhu
  • Patent number: 8161627
    Abstract: A method in one embodiment includes forming an electric lapping guide layer; forming a write pole; forming a first gap layer over the write pole; masking a portion of the first gap layer for defining a window over the write pole and at least a portion of the electric lapping guide layer; and forming a bump over the write pole in the window. Additional methods and systems are presented.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: April 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian Rene Bonhote, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Publication number: 20120094009
    Abstract: Methods of fabricating magnetic write heads and electrical lapping guides (ELG's) using a split gap deposition process is described. A removal process is performed on a magnetic material to define a main write pole and to define a corresponding ELG for the main write pole. A first non-magnetic gap layer is deposited. A mask and liftoff process is performed to deposit an electrically conductive material on the first gap layer disposed along a front edge of the ELG. A second non-magnetic gap layer is then deposited and a shield is fabricated for the write pole.
    Type: Application
    Filed: October 14, 2010
    Publication date: April 19, 2012
    Inventors: Donald Allen, Jennifer Ai-Ming Leung, Aron Pentek, Thomas Roucoux
  • Patent number: 8136228
    Abstract: A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: March 20, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20120050915
    Abstract: A method for manufacturing a magnetic write head having a tapered write pole as well as a leading edge taper, and independent trailing and side magnetic shields. The method allows the write pole to be constructed by a dry process wherein the write pole material is either deposited by a process such as sputter deposition or electrically plated and the write pole shape is defined by masking and ion milling. The write pole has a stepped feature that can either be used to provide increased magnetic spacing between the trailing shield and the write pole at a location slightly recessed from the ABS or can be magnetic material that increases the effective thickness of the write pole at a location slightly recessed from the ABS. A bump structure can be further built over that stepped feature to enhance field gradient as well as reduce trailing shield saturation. Because the trailing and side shields are formed independently, they can be made of different materials and with different throat heights.
    Type: Application
    Filed: September 1, 2010
    Publication date: March 1, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Liubo Hong, Aron Pentek, Yi Zheng, Honglin Zhu
  • Patent number: 8108985
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: February 7, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-Chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
  • Patent number: 8085497
    Abstract: A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: December 27, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien David Hsiao, Vladimir Nikitin, Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Patent number: 8059367
    Abstract: A method according to another embodiment includes forming a side shield layer of ferromagnetic material above a substrate; masking the side shield layer; milling an unmasked region of the side shield layer for forming a pole trench therein; and forming a pole layer in the pole trench. A structure according to one embodiment includes a substrate; a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer; a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer; a layer of nonmagnetic material in the pole trench; and a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: November 15, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Edward Hin Pong Lee, Aron Pentek
  • Patent number: 8054586
    Abstract: A perpendicular write head having a wrap around trailing shield for reducing stray field writing and adjacent track interference. A method for constructing such a write head allows for excellent control of side shield gap thickness and trailing shield gap thickness, and allows the ratio of side gap to trailing gap thicknesses to be maintained at about two to one as desired. The method includes depositing forming a write pole by constructing a mask which may include a bi-layer hard mask, and then ion milling to form the write pole. Once the write pole has been formed, a layer of alumina or some other non-magnetic material can be conformally deposited. A reactive ion mill (RIM) can be performed to open up the top of the write pole (remove the horizontally disposed portions of the alumina layer). Then, a second layer of alumina or some other non-magnetic material can be deposited, and the write pole can be plated.
    Type: Grant
    Filed: November 23, 2005
    Date of Patent: November 8, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Yimin Hsu, Aron Pentek, Yi Zheng
  • Publication number: 20110262774
    Abstract: A magnetic write head having write pole and a wrap-around-trailing magnetic shield having side portions that are separated from the write pole by tapered non-magnetic side gap layers. The tapered non-magnetic side gap layers provide a non-magnetic side gap width that increases with increasing distance from the ABS, thereby providing optimal protection against adjacent track interference at the ABS while minimizing write field loss to the shield in regions away from the ABS.
    Type: Application
    Filed: April 23, 2010
    Publication date: October 27, 2011
    Inventors: Aron Pentek, Yi Zheng
  • Publication number: 20110261485
    Abstract: A magnetic write head having a magnetic write pole with a wrap around magnetic trailing shield. The wrap around magnetic trailing shield is separated by a first non-magnetic side gap at a first side of the write pole and by a second non-magnetic side gap at a second side of the write pole. The first second non-magnetic side gap is larger than the first non-magnetic side gap and is preferably at least twice the thickness of the first non-magnetic side gap. This design provides additional protection adjacent track interference at one side of the write pole and additional protection against magnetic write field loss at the other side of the write pole.
    Type: Application
    Filed: April 23, 2010
    Publication date: October 27, 2011
    Inventors: Aron Pentek, Yi Zheng
  • Patent number: 8028399
    Abstract: Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
    Type: Grant
    Filed: December 16, 2007
    Date of Patent: October 4, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Amanda Baer, Jeffrey S. Lille, Aron Pentek
  • Patent number: 8031434
    Abstract: A magnetic write head for perpendicular magnetic recording. The write head has a secondary flare point defined by magnetic structures that extend from the sides of the write pole, but not over the trailing edge of the write pole. The magnetic structures each have a front edge that defines the secondary flare point. By constructing the magnetic structures so that they only extend from the sides of the write pole and not over the write pole, they can be formed by electroplating, while leafing the mask structure (used to define the write pole) still intact, thereby greatly simplifying manufacture and preventing damage to the write pole during manufacture.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: October 4, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Jeffrey S. Lille, Aron Pentek
  • Publication number: 20110233167
    Abstract: A method for manufacturing a magnetic write head having a write pole with a tapered leading edge and a tapered trailing edge. The method includes forming a non-magnetic bump player over a surface, forming a mask over the non-magnetic bump layer and performing a first ion milling to form a tapered back edge on the non-magnetic bump layer. A magnetic write pole material is then deposited over the surface and over the non-magnetic bump layer. Then a non-magnetic step structure is formed over the magnetic write pole material and an ion milling is performed to form a taper on the upper surface of the write pole. The write pole lateral dimensions can then be defined, and a non-magnetic bump formed over the tapered portion of the upper surface of the write pole. Another ion milling can then be performed to extend the taper of the surface of the write pole.
    Type: Application
    Filed: March 26, 2010
    Publication date: September 29, 2011
    Inventors: Aron Pentek, Thomas J.A. Roucoux, Yi Zheng