Patents by Inventor Aron Pentek

Aron Pentek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100165513
    Abstract: A system according to one embodiment includes a write pole having an end region positioned towards an air bearing surface, a first flare point, and a second flare point positioned between the air bearing surface and the first flare point; and a shield positioned above the write pole, wherein a cross sectional area of the write pole at a point between the first and second flare points along a plane passing through the write pole and oriented about parallel to the air bearing surface is greater than a cross sectional area of the end region of the write pole along a plane oriented parallel to the plane passing through the second flare point. Additional systems and methods are also presented.
    Type: Application
    Filed: December 31, 2008
    Publication date: July 1, 2010
    Inventors: Christian Rene Bonhote, Quang Le, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek
  • Publication number: 20100163522
    Abstract: A method for manufacturing a magnetic write head. The write head is constructed by a method that includes depositing a magnetic write pole material and then depositing a hard mask over the magnetic material. An inorganic image transfer layer is formed over the hard mask. SiC, alumina, SiO2, SiN, Ta or TaOx. This image transfer is physically robust, so that it does not bend or tip over during manufacture. The image of a patterned photoresist layer can be transferred onto the underlying image transfer layer, and an ion milling can be performed to pattern the image of the image transfer layer onto the underlying hard mask and magnetic material, thereby forming a magnetic write pole.
    Type: Application
    Filed: December 30, 2008
    Publication date: July 1, 2010
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Patent number: 7743487
    Abstract: A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
    Type: Grant
    Filed: June 14, 2006
    Date of Patent: June 29, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Hamid Balamane, Michael Feldbaum, Ming Jiang, Aron Pentek, Neil Leslie Robertson, Sue Siyang Zhang
  • Publication number: 20100157472
    Abstract: A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.
    Type: Application
    Filed: December 24, 2008
    Publication date: June 24, 2010
    Inventors: Wen-Chien David Hsiao, Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20100159282
    Abstract: A method according to another embodiment includes forming a side shield layer of ferromagnetic material above a substrate; masking the side shield layer; milling an unmasked region of the side shield layer for forming a pole trench therein; and forming a pole layer in the pole trench. A structure according to one embodiment includes a substrate; a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer; a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer; a layer of nonmagnetic material in the pole trench; and a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Inventors: Edward Hin Pong Lee, Aron Pentek
  • Publication number: 20100155367
    Abstract: A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.
    Type: Application
    Filed: December 24, 2008
    Publication date: June 24, 2010
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20100157474
    Abstract: A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Inventors: Wen-Chien David Hsiao, Vladimir Nikitin, Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20100155232
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic data recording, having a write pole with a tapered trailing edge for improved write field at small bit lengths. The trailing edge taper is formed by a deposition process that can be performed after the write pole flare point has already been formed, and especially after a wrap around shield side gap has been formed. This advantageously allows the distance between the write pole flare point and the trailing edge taper to be closely controlled.
    Type: Application
    Filed: December 23, 2008
    Publication date: June 24, 2010
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20100155364
    Abstract: A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge.
    Type: Application
    Filed: December 24, 2008
    Publication date: June 24, 2010
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20100155363
    Abstract: A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
    Type: Application
    Filed: December 24, 2008
    Publication date: June 24, 2010
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Patent number: 7715147
    Abstract: A magnetic write head for perpendicular magnetic recording that has a write pole and a trailing or side shield that has a leading edge that extends to or beyond the leading edge of write pole, thereby ensuring complete side magnetic shielding. The write head can be formed by forming the write pole on a non-magnetic substrate that is constructed of a material that can be readily removed by reactive ion etching (RIE). The write pole can be formed by depositing a layer of magnetic write pole material over the substrate and then forming a mask over the magnetic write pole material. An ion mill can be performed to define the write pole, and then a reactive ion etch can be performed to notch the substrate, so that when a non-magnetic shield gap material is deposited it will be below or at the bottom of the write pole. Then a magnetic shield material can be deposited to form a shield having a leading edge that extends beyond the leading edge of the write pole.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Michael Feldbaum, Quang Le, Aron Pentek, Sue Siyang Zhang
  • Patent number: 7712206
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield. After forming a magnetic write pole such as by masking and ion milling a magnetic write pole layer, a thin layer of alumina is deposited. This is followed by the deposition of a thin layer of Rh. Then, a thick layer of alumina is deposited, having a thickness that is preferably at least equal to the height of the write pole layer. A chemical mechanical polish is then performed until a portion of the Rh layer over the top (trailing edge) of the write pole is exposed. A material removal process such as ion milling is then performed to remove the exposed Rh layer exposing the thin alumina layer there beneath. Since the Rh trailing gap layer is electrically conductive it can also serve as a seed layer for electroplating the magnetic trailing shield.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Ming Jiang, Aron Pentek, Yi Zheng
  • Patent number: 7712207
    Abstract: A method for manufacturing a magnetic write pole and trailing wrap around magnetic shield for use in a perpendicular magnetic data recording system. The method includes the use of a hard mask structure with end point detection material embedded in a hard mask material. The novel hard mask structure provides the mill resistance of a hard mask, with the end point detection advantages of an end point detection layer.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng, Howard Gordon Zolla
  • Patent number: 7675709
    Abstract: A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: March 9, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Wen-Chien David Hsiao, Jyh-Shuey Lo, Aron Pentek
  • Publication number: 20100021764
    Abstract: A method in one embodiment includes forming a mask above a thin film sensor stack; forming an electrically insulating layer above the mask and sensor stack, the insulating layer having a portion extending along a nonhorizontal end of the mask; selectively removing the insulating layer except for the portion thereof extending along the nonhorizontal end of the mask; removing portions of the sensor stack that are not covered by the mask and the portion of the insulating layer, wherein an end of the portion of the insulating layer positioned away from the mask is about aligned with a back end of the sensor stack after removing the portions thereof; and removing the mask. Additional systems and methods are also presented.
    Type: Application
    Filed: July 25, 2008
    Publication date: January 28, 2010
    Inventors: Ying Hong, Edward Hin Pong Lee, Aron Pentek, David John Seagle
  • Patent number: 7648731
    Abstract: Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: January 19, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Yinshi Liu, Aron Pentek, John J. Yang, Sue Siyang Zhang
  • Publication number: 20090268348
    Abstract: A method in one embodiment includes forming an electric lapping guide layer; forming a write pole; forming a first gap layer over the write pole; masking a portion of the first gap layer for defining a window over the write pole and at least a portion of the electric lapping guide layer; and forming a bump over the write pole in the window. A system in one embodiment includes an electric lapping guide layer; a write pole positioned to one side of the electric lapping guide layer; and a bump formed over the write pole in a window, wherein a back end of the electric lapping guide layer and a front end of the bump are about a same distance from a lapped surface of a head. Additional methods and systems are presented.
    Type: Application
    Filed: April 28, 2008
    Publication date: October 29, 2009
    Inventors: Christian Rene Bonhote, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 7603762
    Abstract: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: October 20, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 7593186
    Abstract: A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: September 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Daniel Wayne Bedell, Hung-Chin Guthrie, Ming Jiang, Hieu Lam, Jyh-Shuey Lo, Edward Hin Pong Lee, Aron Pentek
  • Patent number: 7587811
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Christian Rene Bonhote, Yimin Hsu, Aaron Neuhaus, Aron Pentek, Yi Zheng