Abstract: A surgical microscope 1 comprises an imaging system 2 providing a magnified multidimensional image of an object 3 disposable in a focal plane 4 of the imaging system 2 along at least one optical imaging path 2a, 2b. The imaging system 2 comprises an objective 5 having at least two lens groups 6, 7, through which the at least one optical imaging path 2a, 2b passes consecutively, and which define the focal plane 4 of the imaging system 2. At least one lens group 6 of the objective is moveable along its optical axis relative to the at least one other lens group 7 of the objective. The objective's first lens group 6 located directly adjacent to the focal plane 4 along the at least one optical imaging path 2a, 2b consists of at least three optical lenses 61, 62, 63 and has altogether a negative optical power.

Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

Abstract: An imaging system with an imaging lens system for imaging an object into an image plane is disclosed. The imaging lens system contains an optical component for a higher depth of field, of which the refractive power is alterable and the optical effect remains rotation-symmetrical.

Abstract: A stereoscopic microscopic providing at least one pair of stereoscopic optical paths comprises an objective system, a first focusing lens having a first optical refractive power and a second focusing lens having a second optical refractive power and at least one actuator. The first optical refractive power and the second optical refractive have different signs. The objective system and the first and second focusing lenses are commonly traversed by the at least one pair of stereoscopic optical paths, respectively. The actuator shifts at least one of these first and second focusing lenses along the at least one pair of stereoscopic optical paths to change the working distance and/or to vary an optical refractive power of at least one of these first and second focusing lenses. The first focusing lens is immediately neighboring the objective system along the at least one pair of stereoscopic optical paths.

Abstract: A varioscope optical unit has a positive member (9) with a positive refractive power and a negative member (11) with a negative refractive power arranged along an optical axis (OA) so that the negative member follows the positive member along an observation direction (B). At least one of the members is displaceable along the optical axis. Each member has a first termination lens surfaces (23, 27) counter to the observation direction (B) and second termination lens surface (25, 29) in the observation direction. The second termination lens surface of the positive member and the first termination lens surface of the negative member are concave when viewed in the observation direction (B) and have radii of curvature of at most 500 mm. The second termination lens surface of the negative member is convex when viewed in the observation direction (B) and has a radius of curvature of at most 70 mm.

Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)<1/6.

Abstract: An illumination device (10) is described for an observation device (100) having one, two or more observation beam paths (16, 17), each with at least one observation beam bundle, particularly for an operating microscope, the illumination device having at least one light source (11, 12) for producing at least one illumination beam path (14, 15) with at least one illumination beam bundle for illuminating an object to be observed, in particular, an eye to be observed, the illumination device (10) having at least one illumination optics unit, which has a collector (18, 22), and the at least one illumination beam path (14, 15) or the at least one illumination beam bundle running coaxially to an observation beam path (16, 17) or observation beam bundle.

Abstract: A camera adaptor (19) is provided for connecting a camera (21) to an interface (13) of a medical-optical observation instrument (1) with a parallel beam path. The interface (13) is situated in the parallel beam path (9a, 9b) of the medical-optical observation instrument (1). The camera adaptor (19) has an instrument connector part (41) for connection to the interface (13) of the medical-optical observation instrument (1) and a camera connector part (43, 143) for connection to a camera (21). The beam path (43) runs through the camera adaptor (19) along a linear optical axis. The camera adaptor (19) has an objective-lenses combination (47) with a total focal length between 40 mm and 120 mm. A lens with a positive partial focal length leading on the instrument side in the objective-lenses combination (47) and is followed, on the side toward the camera, by a lens with a negative partial focal length.

Abstract: A display device includes an image acquisition module which has an image sensor and a first focal plane, which captures a picture of an object, and an observation module which images the object such that a user can perceive it with his eye. A second focal plane is set by the observation module and the accommodation state of the eye, and with a measuring module for measuring the accommodation state of the eye. A control unit adjusts the position of the first focal plane on the basis of the measured accommodation state such that it coincides with the second focal plane.

Abstract: Improvements in respect of performing cataract surgery, and the result thereof, by application of a laser system. A device for cataract surgery, includes a surgical microscope or stereo microscope and a laser source. A module, consisting of a laser-coupling/deflecting unit, a laser-scan unit, and a focusing unit, can be attached to the surgical microscope or stereo microscope, in which at least one of these units can selectively be introduced between the surgical microscope and eye, and in which the focusing unit can scan a depth-of-focus range of greater than 1 mm.

Abstract: Among other items, an illumination device (110) is [provided] for an observation device (100) having one, two or more observation beam paths, each with at least one observation beam bundle, in particular for an operating microscope, having at least one light source (112) for producing at least one illumination beam path with at least one illumination beam bundle (121, 122, 123) for illuminating an object to be observed, in particular, an eye to be observed, in addition having at least one illumination optics unit (11)*, which is constructed according to the Köhler principle of illumination, as well as an objective element (119), wherein the at least one illumination beam path or the at least one illumination beam bundle (121, 122, 123) runs coaxially to an observation beam path or observation beam bundle.

Abstract: A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form.

Abstract: A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form.

Abstract: An optical observation instrument has two optical transmission channels for transmitting two partial ray bundles (9A, 9B). The optical observation instrument has a main objective (1) common to the optical transmission channels, an electronic image sensor (7) for sequentially recording the partial ray bundles (9A, 9B), an intermediate imaging optical system (3) between the main objective (1) and the image sensor (7) and common to the optical transmission channels, and a tilting mirror matrix (5) between the main objective (1) and the image sensor (7). The intermediate imaging optical system (3) is arranged so that the respective partial ray bundle (9A, 9B) is deflected toward the image sensor (7) and passes the intermediate imaging optical system (3) both on the way from the main objective (1) to the tilting mirror matrix (5) and on the way from the tilting mirror matrix (5) to the image sensor (7).

Abstract: Microscope system for acquiring a plurality of images, comprising: a zoom system which is configured to continuously vary a magnification of the microscope system over a magnification range of the microscope system, wherein the zoom system comprises two movable zoom components, which are arranged movably along a common optical axis of the microscope system; an aperture stop, which is configured such that a plurality of different observation beam paths of the microscope system are selectable, which traverse the zoom system; wherein the aperture stop, as seen along the optical axis, is arranged between the two movable zoom components; and wherein for all values of the magnification within the magnification range, the aperture stop is located within an aperture stop range which is measured along the optical axis and which surrounds a pupil position of the microscope system.

Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)<1/6.

Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

Abstract: Among other items, an illumination device (110) is [provided] for an observation device (100) having one, two or more observation beam paths, each with at least one observation beam bundle, in particular for an operating microscope, having at least one light source (112) for producing at least one illumination beam path with at least one illumination beam bundle (121, 122, 123) for illuminating an object to be observed, in particular, an eye to be observed, in addition having at least one illumination optics unit (11)*, which is constructed according to the Köhler principle of illumination, as well as an objective element (119), wherein the at least one illumination beam path or the at least one illumination beam bundle (121, 122, 123) runs coaxially to an observation beam path or observation beam bundle.

Abstract: An illumination device (10) is described for an observation device (100) having one, two or more observation beam paths (16, 17), each with at least one observation beam bundle, particularly for an operating microscope, the illumination device having at least one light source (11, 12) for producing at least one illumination beam path (14, 15) with at least one illumination beam bundle for illuminating an object to be observed, in particular, an eye to be observed, the illumination device (10) having at least one illumination optics unit, which has a collector (18, 22), and the at least one illumination beam path (14, 15) or the at least one illumination beam bundle running coaxially to an observation beam path (16, 17) or observation beam bundle.