Patents by Inventor Ashish Bhatnagar

Ashish Bhatnagar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9481608
    Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: November 1, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
  • Patent number: 9227297
    Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: January 5, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Abraham Palaty, Aswathnarayanaiah Ravi, Ashish Bhatnagar, Young J. Paik, Stacy Meyer, Daniel Martin
  • Patent number: 9168631
    Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: October 27, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Aswathnarayanaiah Ravi, Abraham Palaty, Young J. Paik, Stacy Meyer, James Klingler, Ashish Bhatnagar
  • Publication number: 20140287662
    Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
    Type: Application
    Filed: March 19, 2014
    Publication date: September 25, 2014
    Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Abraham Palaty, Aswathnarayanaiah Ravi, Ashish Bhatnagar, Young J. Paik, Stacy Meyer, Daniel Martin
  • Publication number: 20140238604
    Abstract: The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring body having a top planar surface and a bottom planar surface, and an outer ring body having a top surface, a bottom surface substantially parallel to the top surface, and an inside surface that extends between the top surface and the bottom surface, the inside surface having a roof covering a portion of the inner ring body when the inner ring body is disposed adjacent the roof, wherein the inner ring body can be flipped into a different position so that a portion of the inner ring body that is not covered by the roof provides a substantially planar surface.
    Type: Application
    Filed: May 6, 2014
    Publication date: August 28, 2014
    Inventors: Sandhya ARUN, Prashanth KODIGEPALLI, Padma GOPALAKRISHNAN, Ashish BHATNAGAR, Dan MARTIN, Christopher Heath John HOSSACK
  • Publication number: 20140167327
    Abstract: A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.
    Type: Application
    Filed: November 22, 2013
    Publication date: June 19, 2014
    Applicant: Applied Materials, Inc.
    Inventors: Ashish BHATNAGAR, Laxman MURUGESH, Padma GOPALAKRISHNAN
  • Publication number: 20140165915
    Abstract: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface, a heating element disposed in the heater body between the first surface and the second surface, and a thermal barrier disposed on the second surface of the heater body, wherein the thermal barrier comprises a first layer and a second layer disposed on the first layer.
    Type: Application
    Filed: October 9, 2013
    Publication date: June 19, 2014
    Inventors: Govinda RAJ, Daniel MARTIN, Robert T. HIRAHARA, Ashish BHATNAGAR, Bopanna VASANTH, Prashanth RAO, Kadthala R. NARENDRNATH
  • Patent number: 8740206
    Abstract: The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring and an outer ring disposed radially outward of the inner ring. The inner ring will correspond to the location where the majority of erosion occurs during use. This inner ring can be flipped and reused until both sides have eroded beyond their service life. Collectively, the two rings generally have the shape of a single piece ring, but the service life of the ring assembly is longer than a conventional single piece ring.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: June 3, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Sandhya Arun, Prashanth Kodigepalli, Padma Gopalakrishnan, Ashish Bhatnagar, Dan Martin, Christopher Heath John Hossack
  • Patent number: 8722389
    Abstract: A system and method for culturing algae are presented. The system and method utilize a fog of growth medium that is delivered to an algal mat generator along with a stream of CO2 to promote growth of algal cells contained in the generator.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: May 13, 2014
    Assignee: U.S. Department of Energy
    Inventors: Keshav C. Das, Benjamin R. Cannon, Ashish Bhatnagar, Senthil Chinnasamy
  • Publication number: 20140099485
    Abstract: Methods for bonding substrates, forming assemblies using the same, along with improved methods for refurbishing said assemblies are disclosed that take advantage of at least one channel formed in an adhesive utilized to join two substrates to improve fabrication, performance and refurbishment of the assemblies. In one embodiment an assembly includes a first substrate secured to a second substrate by an adhesive layer. The assembly includes a channel having at least one side bounded by the adhesive layer and having an outlet exposed to an exterior of the assembly.
    Type: Application
    Filed: August 30, 2013
    Publication date: April 10, 2014
    Inventors: Kadthala Ramaya NARENDRNATH, Gangadhar SHEELAVANT, Monika AGARWAL, Ashish BHATNAGAR
  • Patent number: 8662957
    Abstract: In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: March 4, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Young J. Paik, Christopher R. Mahon, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 8617672
    Abstract: A substrate processing chamber component has a structural body with localized surface regions having annealed microcracks. The annealed microcracks reduce crack propagation and increase fracture resistance. In one method of manufacture, the structural body of the component is formed, and a laser beam is directed onto localized surface regions of the body for a sufficient time to anneal the surface microcracks.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: December 31, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Ashish Bhatnagar, Laxman Murugesh, Padma Gopalakrishnan
  • Publication number: 20130324017
    Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.
    Type: Application
    Filed: May 31, 2013
    Publication date: December 5, 2013
    Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Ravi Aswathnarayanaiah, Abraham Palaty, Young J. Paik, Stacy Meyer, James Klingler, Ashish Bhatnagar
  • Patent number: 8475231
    Abstract: A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 2, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
  • Patent number: 8464594
    Abstract: A gas nozzle measurement apparatus comprises a controllable gas source to provide across a gas plate having gas nozzles, a flow of gas at a constant pressure or constant flow rate, and a sensor plate sized to cover an area comprising at least a portion of the front face of the gas plate. The sensor plate comprises gas flow sensors arranged in locations that correspond to positions of individual gas nozzles of the gas nozzles of the gas plate such that each gas flow sensor can measure a pressure, flow rate, density, or velocity of a gas stream passing through the individual gas nozzle that faces the gas flow sensor, and generate a signal indicative of, or display, the pressure, flow rate, density, or velocity of the gas stream passing through the individual gas nozzle.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: June 18, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Kadthala R. Narendrnath, Ashish Bhatnagar, Daniel L. Martin, Robert T. Hirahara, Gangadhar Sheelavant
  • Publication number: 20130035022
    Abstract: A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.
    Type: Application
    Filed: July 27, 2012
    Publication date: February 7, 2013
    Inventors: Young J. Paik, James Klingler, Stacy Meyer, Christopher R. Mahon, Laxman Murugesh, Ashish Bhatnagar, Padma Gopalakrishnan
  • Patent number: 8225927
    Abstract: A process has been developed that significantly reduces moisture absorption of components, resulting in a component which is less susceptible to moisture and adsorption/absorption effects to the components functionality. In one embodiment, a component having reduced susceptibility to moisture exposure includes a component disposed in an air-tight package, the component having a blocking gas disposed in pores on a surface of the component. In another embodiment, a method for preparing a component having reduced susceptibility to moisture exposure includes driving water from a component in a controlled environment, exposing the component in the controlled environment to a blocking gas, removing the component in the controlled environment, and optionally sealing the component in an air-tight package.
    Type: Grant
    Filed: November 11, 2010
    Date of Patent: July 24, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Kadthala R. Narendrnath, Ashish Bhatnagar
  • Publication number: 20120154974
    Abstract: The present invention generally provides a high efficiency electrostatic chuck including a flex stack having an electrode disposed between two layers of dielectric material. At least one of the layers is a standard or high purity thermoplastic film. The flex stack may have a matte finish on the substrate supporting surface to provide benefits such as improved temperature distribution across the surface of the chuck. The non-substrate supporting or pedestal receiving side of the flex stack may be plasma treated to provide a desired surface finish, which is then bonded to a pedestal using an acrylic or epoxy adhesive resulting in superior bonding strength compared to traditional polymer electrostatic chucks. The electrode may be a sheet electrode on a release liner, which enables ease of manufacturing.
    Type: Application
    Filed: August 19, 2011
    Publication date: June 21, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Ashish Bhatnagar, Monika Agarwal, Padma Gopalakrishnan, Daniel Martin
  • Publication number: 20120028338
    Abstract: The disclosure encompasses, among other aspects, mixed algal populations able to survive and proliferate on culture media that have a high proportion of an industry wastewater. In particular, at least one strain of an alga in the algal population proliferates mixotrophically. Embodiments further encompass methods of cultivating mixed populations of freshwater and marine alga comprising a plurality of genera and species to provide a biomass from which may be extracted lipids, or converted into biodiesel by such procedures as pyrolysis. Lipid material extracted from the algae may be converted to biodiesel or other organic products. Native algal strains were isolated from industrial and in particular agricultural wastewater inoculated with mixed populations derived from environments exposed to such wastewater. Both fresh water and marine algae showed good growth in wastewaters. About 65% of the algal oil obtained from the algal consortium cultured on an industry wastewater could be converted into biodiesel.
    Type: Application
    Filed: April 20, 2010
    Publication date: February 2, 2012
    Inventors: Ashish Bhatnagar, Senthil Chinnasamy, Keshav C. Das
  • Patent number: 8043433
    Abstract: The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-purity, thermoplastic member may include a high-purity, polyaryletherketone having an extremely low level of metallic ions present therein. The high-purity, polyaryletherketone has excellent wear resistance, high temperature resistance, plasma resistance, corrosive chemical resistance, electrical stability, and strength as compared to polyimide films used in electrostatic chucks. The present invention also provides a simplified method of manufacturing the high efficiency electrostatic chuck.
    Type: Grant
    Filed: February 11, 2008
    Date of Patent: October 25, 2011
    Assignee: Applied Materials, Inc.
    Inventor: Ashish Bhatnagar