Patents by Inventor Ashok Kulkarni

Ashok Kulkarni has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210060656
    Abstract: The present invention disclosed an efficient, continuous flow process for the synthesis metal nanowires by using a continuous stirred tank reactor (CSTRs) in series for varying the aspect ratio of metal nanowires and nanorods formed by feeding affixed quantities of metal salt and polymeric surfactant with a reducing solvent like glycol to an axially mixed reactor.
    Type: Application
    Filed: September 6, 2018
    Publication date: March 4, 2021
    Inventors: Amol Arvind KULKARNI, Jaydeep Bipin DESHPANDE, Prachi Ashok KATE
  • Publication number: 20200404357
    Abstract: A passive tag for communication can include a passive array having an antenna assembly and at least one resonator coupled to the antenna assembly. The passive tag can also include a body that covers the passive array, where the body includes at least one touch point, where each of the at least one touch point corresponds to one of the at least one resonators of the passive array. The body and the passive array can be without a power source and a transistor. The passive array can be configured to receive a first communication signal. The passive array can further be configured to backscatter a second communication signal using the first communication signal.
    Type: Application
    Filed: June 24, 2019
    Publication date: December 24, 2020
    Inventors: Ajinkya Kulkarni, Ashok Gundumalla
  • Patent number: 10503078
    Abstract: Techniques are provided that can select defects based on criticality of design pattern as well as defect attributes for process window qualification (PWQ). Defects are sorted into categories based on process conditions and similarity of design. Shape based grouping can be performed on the random defects. Highest design based grouping scores can be assigned to the bins, which are then sorted. Particular defects can be selected from the bins. These defects may be reviewed.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: December 10, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Jagdish Chandra Saraswatula, Saibal Banerjee, Ashok Kulkarni
  • Patent number: 10389697
    Abstract: Technologies are described herein for managing the activation of software containers, for throttling of requests directed to tenants executing in a software container, and for priming the execution of software containers. The activation of software containers and tenants may be managed by maintaining an activation queue for storing requests to activate software containers or tenants on a host computer. Requests may be retrieved from the queue and utilized to determine whether a software container or a tenant is to be activated on a host. “Bounce” or hot swap tenant activations may be performed. Tenant activation requests might also be throttled by denying the requests or by postponing the requests until a later time. A software container might also be configured to throttle incoming requests to tenants executing therein. The execution of a software container might also be primed by replaying previously recorded network traffic to the software container.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: August 20, 2019
    Assignee: Amazon Technologies, Inc.
    Inventors: Vijay Ravindra Kulkarni, Kevin Michael Beranek, Keian Christopher, Chris Hasz, Samuel Leonard Moniz, Kyle Bradley Peterson, Ajit Ashok Varangaonkar, Jun Xu
  • Patent number: 10359371
    Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: July 23, 2019
    Assignee: KLA-Tencor Corp.
    Inventors: Brian Duffy, Ashok Kulkarni, Michael Lennek, Allen Park
  • Publication number: 20190072858
    Abstract: Techniques are provided that can select defects based on criticality of design pattern as well as defect attributes for process window qualification (PWQ). Defects are sorted into categories based on process conditions and similarity of design. Shape based grouping can be performed on the random defects. Highest design based grouping scores can be assigned to the bins, which are then sorted. Particular defects can be selected from the bins. These defects may be reviewed.
    Type: Application
    Filed: February 23, 2018
    Publication date: March 7, 2019
    Inventors: Jagdish Chandra SARASWATULA, Saibal BANERJEE, Ashok KULKARNI
  • Patent number: 10181185
    Abstract: Methods and systems for detecting anomalies in images of a specimen are provided. One system includes one or more computer subsystems configured for acquiring images generated of a specimen by an imaging subsystem. The computer subsystem(s) are also configured for determining one or more characteristics of the acquired images. In addition, the computer subsystem(s) are configured for identifying anomalies in the images based on the one or more determined characteristics without applying a defect detection algorithm to the images or the one or more characteristics of the images.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: January 15, 2019
    Assignee: KLA-Tencor Corp.
    Inventors: Allen Park, Lisheng Gao, Ashok Kulkarni, Saibal Banerjee, Ping Gu, Songnian Rong, Kris Bhaskar
  • Patent number: 10127651
    Abstract: Criticality of a detected defect can be determined based on context codes. The context codes can be generated for a region, each of which may be part of a die. Noise levels can be used to group context codes. The context codes can be used to automatically classify a range of design contexts present on a die without needing certain information a priori.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: November 13, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Ashok Kulkarni, Saibal Banerjee, Santosh Bhattacharyya, Bjorn Brauer
  • Patent number: 10074167
    Abstract: Noise induced by pattern-of-interest (POI) image registration and POI vicinity design patterns in intra-die inspection is reduced. POI are grouped into alignment groups by co-occurrence of proximate registration targets. The alignment groups are registered using the co-occurrence of proximate registration targets. Registration by voting is performed, which can measure a degree that each of the patterns-of-interest is an outlier. POI are grouped into at least one vicinity group with same vicinity design effects.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: September 11, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Saibal Banerjee, Ashok Kulkarni, Shaoyu Lu
  • Patent number: 10043261
    Abstract: Methods and systems for generating simulated output for a specimen are provided. One method includes acquiring information for a specimen with one or more computer systems. The information includes at least one of an actual optical image of the specimen, an actual electron beam image of the specimen, and design data for the specimen. The method also includes inputting the information for the specimen into a learning based model. The learning based model is included in one or more components executed by the one or more computer systems. The learning based model is configured for mapping a triangular relationship between optical images, electron beam images, and design data, and the learning based model applies the triangular relationship to the input to thereby generate simulated images for the specimen.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: August 7, 2018
    Assignee: KLA-Tencor Corp.
    Inventors: Kris Bhaskar, Jing Zhang, Grace Hsiu-Ling Chen, Ashok Kulkarni, Laurent Karsenti
  • Patent number: 9965848
    Abstract: Shape primitives are used for inspection of a semiconductor wafer or other workpiece. The shape primitives can define local topological and geometric properties of a design. One or more rules are applied to the shape primitives. The rules can indicate presence of a defect or the likelihood of a defect being present. A rule execution engine can search for an occurrence of the shape primitives covered by the at least one rule.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: May 8, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Saibal Banerjee, Ashok Kulkarni, Jagdish Saraswatula, Santosh Bhattacharyya
  • Publication number: 20170206650
    Abstract: Criticality of a detected defect can be determined based on context codes. The context codes can be generated for a region, each of which may be part of a die. Noise levels can be used to group context codes. The context codes can be used to automatically classify a range of design contexts present on a die without needing certain information a priori.
    Type: Application
    Filed: November 21, 2016
    Publication date: July 20, 2017
    Inventors: Ashok Kulkarni, Saibal Banerjee, Santosh Bhattacharyya, Bjorn Brauer
  • Publication number: 20170200265
    Abstract: Methods and systems for generating simulated output for a specimen are provided. One method includes acquiring information for a specimen with one or more computer systems. The information includes at least one of an actual optical image of the specimen, an actual electron beam image of the specimen, and design data for the specimen. The method also includes inputting the information for the specimen into a learning based model. The learning based model is included in one or more components executed by the one or more computer systems. The learning based model is configured for mapping a triangular relationship between optical images, electron beam images, and design data, and the learning based model applies the triangular relationship to the input to thereby generate simulated images for the specimen.
    Type: Application
    Filed: January 9, 2017
    Publication date: July 13, 2017
    Inventors: Kris Bhaskar, Jing Zhang, Grace Hsiu-Ling Chen, Ashok Kulkarni, Laurent Karsenti
  • Publication number: 20170200264
    Abstract: Methods and systems for detecting anomalies in images of a specimen are provided. One system includes one or more computer subsystems configured for acquiring images generated of a specimen by an imaging subsystem. The computer subsystem(s) are also configured for determining one or more characteristics of the acquired images. In addition, the computer subsystem(s) are configured for identifying anomalies in the images based on the one or more determined characteristics without applying a defect detection algorithm to the images or the one or more characteristics of the images.
    Type: Application
    Filed: January 9, 2017
    Publication date: July 13, 2017
    Inventors: Allen Park, Lisheng Gao, Ashok Kulkarni, Saibal Banerjee, Ping Gu, Songnian Rong, Kris Bhaskar
  • Publication number: 20170186151
    Abstract: Shape primitives are used for inspection of a semiconductor wafer or other workpiece. The shape primitives can define local topological and geometric properties of a design. One or more rules are applied to the shape primitives. The rules can indicate presence of a defect or the likelihood of a defect being present. A rule execution engine can search for an occurrence of the shape primitives covered by the at least one rule.
    Type: Application
    Filed: November 18, 2016
    Publication date: June 29, 2017
    Inventors: Saibal Banerjee, Ashok Kulkarni, Jagdish Saraswatula, Santosh Bhattacharyya
  • Publication number: 20170161888
    Abstract: Noise induced by pattern-of-interest (POI) image registration and POI vicinity design patterns in intra-die inspection is reduced. POI are grouped into alignment groups by co-occurrence of proximate registration targets. The alignment groups are registered using the co-occurrence of proximate registration targets. Registration by voting is performed, which can measure a degree that each of the patterns-of-interest is an outlier. POI are grouped into at least one vicinity group with same vicinity design effects.
    Type: Application
    Filed: November 18, 2016
    Publication date: June 8, 2017
    Inventors: Saibal Banerjee, Ashok Kulkarni, Shaoyu Lu
  • Publication number: 20170059491
    Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.
    Type: Application
    Filed: August 22, 2016
    Publication date: March 2, 2017
    Inventors: Brian Duffy, Ashok Kulkarni, Michael Lennek, Allen Park
  • Patent number: 9419908
    Abstract: Systems and methods are disclosed for managing congestion in a data network. In a data network, various data flows are transmitted between source and destination nodes. One or more computing devices of the network may be configured to detecting congestion in a first path and provide an indication of the congestion, directly or indirectly, to a destination device. A switch associated with the path is designated for performing rebalancing of the flow based at least in part on a control message generated in response to an instruction received, either directly or indirectly, from a source device. Reassignment of the congested flow to a new path can help alleviate congestion and improve network performance.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: August 16, 2016
    Assignee: Cisco Technology, Inc.
    Inventor: Ajay Ashok Kulkarni
  • Patent number: 9360863
    Abstract: Various embodiments for determining parameters for wafer inspection and/or metrology are provided.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: June 7, 2016
    Assignee: KLA-Tencor Corp.
    Inventors: Govind Thattaisundaram, Mohan Mahadevan, Ajay Gupta, Chien-Huei Adam Chen, Ashok Kulkarni, Jason Kirkwood, Kenong Wu, Songnian Rong
  • Patent number: 9355208
    Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes determining locations of all instances of a weak geometry in a design for a wafer. The locations include random, aperiodic locations. The weak geometry includes one or more features that are more prone to defects than other features in the design. The method also includes scanning the wafer with a wafer inspection system to thereby generate output for the wafer with one or more detectors of the wafer inspection system. In addition, the method includes detecting defects in at least one instance of the weak geometry based on the output generated at two or more instances of the weak geometry in a single die on the wafer.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: May 31, 2016
    Assignee: KLA-Tencor Corp.
    Inventors: Eugene Shifrin, Ashok Kulkarni, Kris Bhaskar, Graham Michael Lynch, John Raymond Jordan, III, Chwen-Jiann Fang