Abstract: A method of plating treatment for forming a plated coating on the surface of a workpiece except on a region thereof comprises the steps of placing a masking member made of water swelling rubber in abutment against or in close proximity to the region of the workpiece where no plating is desired, immersing, in this state, the masking member in water to cause the water swelling rubber to undergo volumetric self-swelling, and immersing the workpiece in a plating solution with the swelled masking member pressed against the particular region of the workpiece.

Abstract: A through type film capacitor comprising a capacitor unit, a through terminal extending axially of the capacitor unit, and an earthing terminal plate connected to one electrode of the capacitor unit. The capacitor unit includes a dielectric film in bellows form having inner and outer surfaces thereof coated with electrodes and fixed in an axially compressed form.

Abstract: A structure of a copper conductor is obtained by oxidizing copper film formed on the surface of a substrate, and by heat treating the same in a reducing atmosphere, whereby only the surface layer portion of the oxidized copper film is reduced to become copper. The copper film of a conductor is formed on the surface of the substrate with the oxidized copper film interposed therebetween. As a result, an adhesion of the copper film to the surface of the substrate is enhanced.

Abstract: A chip inductor having a pair of terminal electrodes formed on the surface of a magnetic core which holds a winding therearound. The terminal electrodes have films which are made from a nickel alloy having a relatively high resistivity and a relatively low magnetic permeability. Such nickel alloys includes, for example, nickel-chromium alloy, nickel-phosphorus alloy and nickel-copper alloy.

Abstract: A method of metallizing a ceramic material by forming a metal thin film through electroless plating, chemically etching the metal thin film after heat treatment and metallizing the surface of the ceramic material through electroless plating after the etching.

Abstract: Thin film electrodes are formed on a chip-type electronic component for connecting to external circuitry.The electronic components is first located so that a first principal plane thereof faces toward a scattering source of an electrode-forming. The first principal plane is covered with a mask except for a pair of edge portions of the first principal plane, which extend a little toward the center of the first principal plane from a pair of first edges. The first edges are respectively defined by the first principal plane and two opposing end planes of the component.A thin film of the electrode material is deposited on each of the edge portions of the first principal plane, on the first edges, and on first portions of the end planes, which extend onto the end planes from the first edges.Then the electronic component is located so that a second principal plane counter to the first principal plane faces toward the scattering source.

Abstract: A thin-film resistor comprising a thin film of a nitride of at least one element belonging to groups III-VI of the periodic table. The thin-film resistor has a metal oxide layer comprising at least one metal oxide selected from the group consisting of manganese oxide, iron oxide, cobalt oxide, nickel oxide, zinc oxide, indium oxide, tin oxide and indium tin oxide interposed between the nitride thin film and an electrode for external connection.

Abstract: A process for metallizing a copper film comprising the step of heat treating a copper film formed by an electroless plating process as opposing electrodes of a ceramic capacitor. The process comprises the steps of placing a ceramic body having a copper film formed on the surface thereof by an electroless plating process within a container sealing the same from the external atmosphere and maintaining constant the internal atmosphere, and heating the container maintaining the surrounding of the container in an inert atmosphere.

Abstract: A monolithic ceramic capacitor comprises a dielectric ceramic element assembly, metal electrodes for external connection and conductive metal oxide layers formed between the ceramic element assembly and the metal electrodes for preventing reduction of metal oxide forming the dielectric ceramic material.

Abstract: A corrosion inhibiting coating for a metal surface, especially useful for electrical conductors, where the surface of the metal is covered with an organic corrosion inhibitor and an exterior layer of an inactive fluoric material thereon.

Abstract: A method for inhibiting oxidation of copper electrodes of a ceramic capacitor, comprising the step of subjecting copper films formed by an electroless plating process or the like and serving as opposed electrodes of a ceramic capacitor to a hydrocarbon halide compound including trichloroethylene, perchloroethylene, freon, chlorobenzene, methyl chloride, methylene chloride, chloroform, carbon tetrachloride, or the like.

Abstract: A process for preventing the oxidation of a copper film formed on a ceramic body, which comprises the steps of forming a copper film on a ceramic body by a dry-plating process, treating the resultant copper film with a deactivating agent comprising at least one volatile hydrocarbon halide monomer by feeding the same into a vacuum chamber of a dry-plating apparatus.

Abstract: A process for metallizing a copper film comprising the step of heat treating a copper film formed by an electroless plating process as opposing electrodes of a ceramic capacitor. The process comprises the steps of placing a ceramic body having a copper film formed on the surface thereof by an electroless plating process within a container sealing the same from the external atmosphere and maintaining constant the internal atmosphere, and heating the container maintaining the surrounding of the container in an inert atmosphere.

Abstract: A method for processing a waste solution used in a chemical plating process and including a heavy metal complex salt, a reducing agent, and a pH adjusting agent. The heavy metal complex salt is decomposed into a heavy metal component and a complexing agent component by applying ultrasonic vibration to the waste solution. The heavy metal component obtained by decomposition is in a powder state. Then the waste solution is filtered, so that the heavy metal component may be separated from the complexing agent component.

Abstract: A structure of a copper conductor is obtained by oxidizing copper film formed on the surface of a substrate, and by heat treating the same in a reducing atmosphere, whereby only the surface layer portion of the oxidized copper film is reduced to become copper. The copper film of a conductor is formed on the surface of the substrate with the oxidized copper film interposed therebetween. As a result, an adhesion of the copper film to the surface of the substrate is enhanced.