Patents by Inventor Atsushi Suzuki

Atsushi Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12221690
    Abstract: A part includes a base material, a colored layer, an intermediate layer, and a water-repellent-surface layer. The colored layer contains 35 at % to 99 at % of C, 0 at % to less than 40 at % of Cr, 0 at % to less than 15 at % of N, and more than 0 at % to less than 15 at % of O. The intermediate layer contains at least one metal atom selected from Cr, Zr, and Si; and an oxygen atom. The intermediate layer exhibits a sputtering time of 0.5 minutes or more to 9 minutes or less.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: February 11, 2025
    Assignee: Toto Ltd.
    Inventors: Yuya Suzuki, Saori Ukigai, Hironori Hatono, Atsushi Teramoto, Yuichi Takamatsu, Hana Ishii
  • Publication number: 20250042225
    Abstract: A compressor module includes: an evaporator configured to evaporate a refrigerant of a vapor compression refrigeration cycle; a liquid storage configured to store the refrigerant in a liquid phase; a compressor configured to suction and compress the refrigerant; and a flow passage forming member to which the evaporator, the liquid storage and the compressor are installed. The flow passage forming member forms at least a portion of a flow passage of the refrigerant. The compressor is positioned on a lower side of the flow passage forming member, and the flow passage of the refrigerant includes a suction-side refrigerant flow passage, through which the refrigerant in a gas-phase to be suctioned into the compressor flows. The suction-side refrigerant flow passage has a rising portion that rises upward as the rising portion approaches the compressor.
    Type: Application
    Filed: October 23, 2024
    Publication date: February 6, 2025
    Inventors: Yuki SUGIYAMA, Takahiro MAEDA, Atsushi YAMADA, Satoshi SUZUKI, Masayuki TAKEUCHI, Masaki UCHIYAMA
  • Patent number: 12219247
    Abstract: Provided is an imaging device that includes an imaging unit that performs an imaging operation, a data generator that generates first power supply voltage data corresponding to a first power supply voltage and a flag generation section that generates a flag signal for the first power supply voltage by comparing the first power supply voltage data and first reference data. The first power supply voltage is supplied to the imaging unit.
    Type: Grant
    Filed: June 20, 2023
    Date of Patent: February 4, 2025
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Naoki Kawazu, Keita Sasaki, Takumi Oka, Yuichi Motohashi, Atsushi Suzuki
  • Publication number: 20250033919
    Abstract: A media processing apparatus includes a slit insertable a sheet bundle of multiple sheets, a sheet-bundle holder, a liquid applier, a press binder, and a controller. The sheet-bundle holder holds the sheet bundle and detects the thickness of the sheet bundle. The liquid applier applies liquid to the sheet bundle. The press binder presses and binds the sheet bundle to perform press-binding process. The controller causes the sheet-bundle holder to hold the sheet bundle and detect the thickness of the sheet bundle, determines whether to cause the liquid applier to apply liquid to the sheet bundle based on the thickness of the sheet bundle, causes the liquid applier to apply the liquid to the sheet bundle when it is determined that the thickness of the sheet bundle is equal or larger than a prescribed thickness, and causes the press binder to press and bind the sheet bundle.
    Type: Application
    Filed: July 22, 2024
    Publication date: January 30, 2025
    Applicant: Ricoh Company, Ltd.
    Inventors: Satoshi Hirata, Yuusuke Shibasaki, Yusuke Hirono, Atsushi Shinoda, Shuuto Tohkaishi, Shingo Yoshizawa, Suzuka Fujita, Naofumi Yoshida, Ryota Takayama, Takahiro Watanabe, Takuya Morinaga, Yuji Suzuki, Kanako Fujisaki, Jun Yamada, Wataru Nozaki
  • Patent number: 12211676
    Abstract: A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.
    Type: Grant
    Filed: January 29, 2021
    Date of Patent: January 28, 2025
    Assignee: Tokyo Electron Limited
    Inventors: Ayuta Suzuki, Hidefumi Matsui, Atsushi Kubo
  • Publication number: 20250030814
    Abstract: Provided is a non-statutory computer-readable medium storing thereon a medical program for implementing various kinds of processing in a terminal device used together with a medical examination device including an imaging camera, in order to play a video live and record the video, while maintaining usability of the medical examination device including the imaging camera, the video being generated by imaging by the medical examination device. The medical program, when executed, causes a processor of the terminal device to perform: playing video data live and displaying the video data on a display unit of the terminal device, the video data being captured and simultaneously transmitted in real time by the medical examination device; and controlling start/stop of recording of the video data that is currently played live based on a predetermined operation.
    Type: Application
    Filed: June 16, 2022
    Publication date: January 23, 2025
    Applicant: Kowa Company, Ltd.
    Inventors: Takahiro SUZUKI, Atsushi KAKUUCHI
  • Patent number: 12205892
    Abstract: A semiconductor device having a novel structure is provided. The semiconductor device includes a silicon substrate and a device provided above the silicon substrate. The device includes a transistor and a conductor. The transistor includes a metal oxide in a channel formation region. Conductivity is imparted to the silicon substrate. The conductor is electrically connected to each of a drain of the transistor and the silicon substrate through an opening provided in the device. Heat of the drain of the transistor can be efficiently released through the silicon substrate.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: January 21, 2025
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Akio Suzuki, Atsushi Miyaguchi, Shunpei Yamazaki
  • Patent number: 12186839
    Abstract: A metal laminating and modeling method includes a first inclination angle modeling step including a first inclination step of setting a table on which the metal layers are to be formed at a first table inclination angle and setting a welding torch at a first torch inclination angle and a first welding step of forming a weld bead that becomes a part of the modeled object by arc welding with the welding torch and a second inclination angle modeling step including a second inclination step of inclining the table at a second table inclination angle that is larger than the first table inclination angle and setting the welding torch at a second torch inclination angle and a second welding step of forming the weld bead.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: January 7, 2025
    Assignees: MITSUBISHI HEAVY INDUSTRIES COMPRESSOR CORPORATION, Yamazaki Mazak Corporation
    Inventors: Yasunori Sakai, Kazuhiro Ishibashi, Yasuyuki Tanaka, Atsushi Suzuki, Seigo Ouchi
  • Publication number: 20240429046
    Abstract: The present invention provides a method for producing a heteroepitaxial wafer heteroepitaxially growing a 3C-SiC single crystal film on a single crystal silicon substrate, the method including: with using a reduced-pressure CVD apparatus, a first step of removing a native oxide film on a surface of the single crystal silicon substrate by hydrogen baking; a second step of nucleation of SiC on the single crystal silicon substrate on a condition of pressure of 13332 Pa or lower and a temperature of 300° C. or higher and 950° C. or lower and a third step of forming the 3C-SiC single crystal film by growing a SiC single crystal on condition of pressure of 13332 Pa or lower and a temperature of 800° C. or higher and lower than 1200° C., while supplying a source gas containing carbon and silicon into the reduced-pressure CVD apparatus.
    Type: Application
    Filed: June 30, 2022
    Publication date: December 26, 2024
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Toshiki MATSUBARA, Atsushi SUZUKI, Tatsuo ABE, Keitaro TSUCHIYA, Yukari SUZUKI, Tsuyoshi OHTSUKI
  • Publication number: 20240408689
    Abstract: An additive manufacturing method includes cutting a cutting region in a workpiece to heat the workpiece so that a temperature of an additive manufacturing region which is in the cutting region becomes a preheating lower limit temperature or above, and adding melted metal to the additive manufacturing region whose temperature has been a preheating lower limit temperature or above.
    Type: Application
    Filed: August 23, 2024
    Publication date: December 12, 2024
    Applicant: Yamazaki Mazak Corporation
    Inventors: Seigo OUCHI, Atsushi SUZUKI, Kazuhiro ISHIBASHI
  • Publication number: 20240400478
    Abstract: Provided is a method capable of producing (E)-1,1,1,4,4,4-hexafluoro-2-butene at a high yield. The method for producing (E)-1,1,1,4,4,4-hexafluoro-2-butene includes vaporizing 1,2,3,4-tetrachlorobutane and reacting the 1,2,3,4-tetrachlorobutane vaporized in the vaporizing, with chlorine gas and hydrogen fluoride gas in the gas phase in the presence of a solid catalyst to yield (E)-1,1,1,4,4,4-hexafluoro-2-butene.
    Type: Application
    Filed: August 10, 2022
    Publication date: December 5, 2024
    Applicant: Resonac Corporation
    Inventors: Hiroshi KOBAYASHI, Motoya YAMAGAMI, Atsushi SUZUKI
  • Publication number: 20240392878
    Abstract: The disclosure provides a steering dust seal which seals a gap between a shaft hole of a column hole provided in a dashboard and a steering shaft. The steering dust seal includes an annular mounting portion attached to an inner peripheral surface of the shaft hole, an annular bumper facing the steering shaft in a non-contact state, a bellows connecting the mounting portion and the bumper, and a seal lip extending from the bumper to contact with the steering shaft. A lip included in the seal lip is covered over its entire circumference with a resin-made sliding portion having a friction coefficient preventing abnormal noise from occurring due to a stick-slip phenomenon between the rotating steering shaft and the sliding portion.
    Type: Application
    Filed: October 25, 2022
    Publication date: November 28, 2024
    Applicant: NOK CORPORATION
    Inventor: Atsushi SUZUKI
  • Publication number: 20240395563
    Abstract: An epitaxial wafer production method, including forming a gettering epitaxial film containing silicon and carbon on a silicon substrate under reduced pressure using a reduced pressure CVD apparatus, and forming a silicon epitaxial film on the gettering epitaxial film. This provides a low-cost, low-contamination carbon-containing epitaxial wafer, and a method for producing such an epitaxial wafer.
    Type: Application
    Filed: September 27, 2022
    Publication date: November 28, 2024
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Atsushi SUZUKI, Yasushi MIZUSAWA, Toshiki MATSUBARA, Tatsuo ABE, Tsuyoshi OHTSUKI
  • Patent number: 12154789
    Abstract: A method for precise plasma etching of micropatterns on a silicon substrate containing silicon or additionally having a silicon oxide film. An etching method for plasma-etching a silicon substrate having silicon or a silicon oxide film using a halogen fluoride having a nitrogen (N2) content of 1 vol % or less as an etching gas. Also disclosed is a method for producing a semiconductor using the etching method.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: November 26, 2024
    Assignee: Resonac Corporation
    Inventor: Atsushi Suzuki
  • Publication number: 20240388814
    Abstract: To further reduce the pixel size. An imaging device includes: a plurality of pixels; and a holding unit that holds a signal output from the pixel. The pixel includes: a conversion unit that converts radiation or light into charges; a charge storage unit that stores the charges; a reset unit that resets the charges stored in the charge storage unit; a first amplification unit that amplifies a signal based on the charges stored in the charge storage unit; a second amplification unit that amplifies the signal amplified by the first amplification unit and outputs the signal such that the signal is held in the holding unit; a first capacitor connected between an output portion of the first amplification unit and an input portion of the second amplification unit; and a voltage control unit that controls a voltage at an input portion of the second amplification unit.
    Type: Application
    Filed: March 15, 2022
    Publication date: November 21, 2024
    Inventor: ATSUSHI SUZUKI
  • Patent number: 12149839
    Abstract: Suppressing a dead period at the time of mode switching. A solid-state imaging device includes: a plurality of pixels (300) that each outputs a luminance change of incident light; and a detection circuit (305) that outputs an event signal based on the luminance change output from each of the pixels, in which each of the pixels includes: a photoelectric conversion element (311) that generates a charge according to an incident light amount; a logarithmic conversion circuit (312, 313) that is connected to the photoelectric conversion element and converts a photocurrent flowing out of the photoelectric conversion element into a voltage signal corresponding to a logarithmic value of the photocurrent; and a first transistor (318) having a drain connected to a sense node of the logarithmic conversion circuit.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: November 19, 2024
    Assignee: Sony Semiconductor Solutions Corporation
    Inventors: Tsutomu Imoto, Yusuke Ikeda, Atsumi Niwa, Atsushi Suzuki, Shinichirou Etou, Kenichi Takamiya, Takuya Maruyama, Ren Hiyoshi
  • Patent number: 12149861
    Abstract: An imaging device capable of reporting more reliably an occurrence of trouble is provided. The imaging device of the present disclosure includes an imaging sensor configured to generate image data, a diagnosis circuit configured to perform diagnosis processing for the imaging sensor and an output circuit configured to output a flag signal corresponding to a result of the diagnosis processing, wherein the flag signal is set to a ground level signal in response to the result of the diagnosis processing indicating an error.
    Type: Grant
    Filed: April 13, 2023
    Date of Patent: November 19, 2024
    Assignee: Sony Semiconductor Solutions Corporation
    Inventors: Naoki Kawazu, Masaki Murozuka, Yuichi Motohashi, Atsushi Suzuki
  • Patent number: 12140894
    Abstract: The history record unit, in the non-volatile storage device, records recovery history information showing a history of the recovery process. The suspension control unit, when the recovery process' frequency specified based on the recovery history information exceeds a first reference frequency, restricts execution of the specific suspension process which is in response to a satisfaction of the suspension condition. Further, the suspension control unit, when the recovery process' frequency specified based on the recovery history information is lower than a second reference frequency, which is lower than the first reference frequency, under a situation where the specific suspension process' execution is restricted, cancels the restricting of the specific suspension process' execution.
    Type: Grant
    Filed: March 24, 2023
    Date of Patent: November 12, 2024
    Assignee: KYOCERA DOCUMENT SOLUTIONS INC.
    Inventor: Atsushi Suzuki
  • Publication number: 20240345598
    Abstract: To provide an apparatus and a method that efficiently determines a best path on which a moving apparatus such as a walking robot can travel safely. The apparatus includes a path planning unit that determines a travel path of the moving apparatus such as a walking robot, and the path planning unit is configured to calculate a path cost for each of a plurality of path candidates by applying a cost calculation algorithm in which a path that enables more stable traveling has a lower cost and to determine the path candidate having the path cost that has been calculated to be the lowest cost as the travel path that is best. The path planning unit sets a plurality of sampling points in a path, calculates a cost corresponding to each sampling point by applying the cost calculation algorithm in which the cost becomes higher as the difference between landing heights of the left and right legs at each sampling point becomes larger, and calculates an addition value of the costs of the sampling points as the path cost.
    Type: Application
    Filed: February 21, 2022
    Publication date: October 17, 2024
    Inventor: ATSUSHI SUZUKI
  • Publication number: 20240348948
    Abstract: Switching is performed between a global shutter method and a local shutter method. A pixel control unit 30 performs local shutter and global shutter on a pixel. The image generation unit 40 generates a first frame, which is an image based on the first image signal, and a second frame, which is an image based on the second image signal. The self-position estimation unit 50 generates a surrounding map from the first frame. The object detection unit 60 detects a target object from the second frame and generates target object information.
    Type: Application
    Filed: October 12, 2022
    Publication date: October 17, 2024
    Inventors: Kei Nakagawa, Atsushi Suzuki, Youji Sakioka, Yusuke Minagawa