Patents by Inventor Atsushi Takahashi

Atsushi Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12076834
    Abstract: The eddy current sensor for measuring the film thickness of a conductive film formed on a substrate includes a core made of a magnetic material that has a base portion, and outer legs provided to the base portion at both end portions in a first direction of the base portion respectively, an excitation coil that is arranged on the core and forms an eddy current in the conductive film, and a detection coil that is arranged on the core and detects the eddy current formed in the conductive film. The length of the base portion in the first direction is not less than the length of the base portion in a second direction that is substantially orthogonal to the first direction.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: September 3, 2024
    Assignee: EBARA CORPORATION
    Inventors: Atsushi Abe, Katsuhide Watanabe, Taro Takahashi
  • Patent number: 12066071
    Abstract: A sintered friction material, in which a content of a copper component is 0.5 mass % or less, is provided. The sintered friction material includes a titanate and a metal material other than copper, as a matrix. A content of the metal material other than copper is 10.0 volume % to 34.0 volume %. A method for manufacturing a sintered friction material is provided. The method includes a mixing step of mixing raw materials containing a titanate and a metal material other than copper, a molding step of molding the raw materials mixed in the mixing step, and a sintering step of sintering, at 900° C. to 1300° C., a molded product molded in the molding step. In the sintered friction material, the titanate and the metal material other than copper form a matrix, and a content of the metal material other than copper is 10.0 volume % to 34.0 volume %.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: August 20, 2024
    Assignee: AKEBONO BRAKE INDUSTRY CO., LTD.
    Inventors: Marina Nihei, Hideaki Takahashi, Masanori Kato, Katsuhiro Onodera, Atsushi Ueno, Eri Takada
  • Publication number: 20240274492
    Abstract: A temperature adjustment device includes: a placement portion having a placement surface on which an object to be controlled temperature thereof is placed; a bottom portion facing the placement portion; a first support portion sandwiched between the placement portion and the bottom portion and supporting a center portion of the placement portion; a heat source portion disposed between the placement portion and the bottom portion and is allowed to heat and cool the object via the placement portion; a heat radiation portion disposed between the heat source portion and the bottom portion and exchanging heat with the heat source portion; and a second support portion disposed between the placement portion and the bottom portion and disposed close to the axis, wherein the second support portion supports an end portion of the heat radiation portion so as to separate the heat radiation portion from the bottom portion.
    Type: Application
    Filed: February 5, 2024
    Publication date: August 15, 2024
    Applicants: KELK Ltd., TOKYO SEIMITSU CO., LTD.
    Inventors: Atsushi Kobayashi, Wataru Omuro, Takashi Motoyama, Takenori Takahashi, Shuhei Nishikawa
  • Publication number: 20240258111
    Abstract: This disclosure relates to methods and compositions for treating a wafer having a pattern disposed on a surface of the wafer.
    Type: Application
    Filed: February 6, 2024
    Publication date: August 1, 2024
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Keeyoung Park
  • Publication number: 20240258497
    Abstract: Electrodes and a secondary battery having high capacity density and being excellent in terms of rapid charging and rapid discharging are provided. The battery includes a positive electrode and a negative electrode. The positive electrode includes a current collector, a first layer overlapping with the current collector, and a second layer overlapping with the first layer. The first layer contains a first active material with a first particle diameter and the second layer contains a second active material with a second particle diameter. The first particle diameter is smaller than the second particle diameter. It is preferable that the second active material include a surface portion and an inner portion, the surface portion be a region within a depth of 10 nm or less from a surface of the second active material to the inner portion, and that the surface portion and the inner portion be topotaxy.
    Type: Application
    Filed: May 16, 2022
    Publication date: August 1, 2024
    Inventors: Shunpei YAMAZAKI, Tetsuya KAKEHATA, Teppei OGUNI, Tatsuyoshi TAKAHASHI, Kazuya SHIMADA, Yohei MOMMA, Atsushi KAWATSUKI
  • Patent number: 12049262
    Abstract: A steer-by-wire steering system, including a steering device including a dual-system steering motor including a main system and a sub system, wherein a power supply to the main system is conducted selectively by a main power source and a backup power source, and a power supply to the sub system is conducted by only the main power source, wherein, in a normal power-supply situation in which the power supply to the main system and to the sub system is conducted by the main power source, a controller controls the sub system to operate in accordance with the main system, and wherein, in a backup power-supply situation in which the power supply to the main system is conducted by the backup power source, the controller controls the main system not to operate or to operate while limiting the power supply to the main system and controls the sub system independently.
    Type: Grant
    Filed: June 29, 2022
    Date of Patent: July 30, 2024
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, JTEKT CORPORATION
    Inventors: Atsushi Satou, Yosuke Yamashita, Masaharu Yamashita, Toshihiro Takahashi, Tokuaki Hibino, Yuji Fujita, Yugo Nagashima, Kazuma Hasegawa, Yuuta Kajisawa, Kenichi Abe
  • Publication number: 20240242420
    Abstract: An information processing apparatus includes a processor configured to: generate multiple two-dimensional (2D) projection images from three-dimensional (3D) model data that displays product manufacturing information about a shape of a product, the 2D projection images obtained through projection of the product in multiple directions; and generate 2D drawing data where the 2D projection images are placed, in a manner that satisfies a preset layout rule, on multiple sheet regions of a number and of a sheet size determined in accordance with the preset layout rule.
    Type: Application
    Filed: October 26, 2023
    Publication date: July 18, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Junichi MATSUNOSHITA, Tomonari TAKAHASHI, Yuzuru SUZUKI, Atsushi OGIHARA, Yasuyuki TANAKA, Yumi SEKIGUCHI, Ryosuke HIGASHIKATA
  • Patent number: 12036933
    Abstract: A power switching control system, includes a switching unit configured to switch connection and disconnection between loads set with operation priorities and powers supplying powers to the loads, the loads and the powers being connected to a power supply path; a power failure detection unit detecting a power failure caused by an abnormality on a power supply side or a load side; and a control unit controlling the switching unit. When the power failure detection unit detects the power failure, and remaining capacities, charging rates, or voltages of the plurality of powers are less than, or equal to or less than predetermined thresholds, the control unit disconnects the loads from the power supply path by the switching unit in an order from one of the loads with a lowest operation priority of the operation priorities to gradually decrease supply currents from the powers to the loads.
    Type: Grant
    Filed: September 12, 2022
    Date of Patent: July 16, 2024
    Assignee: YAZAKI CORPORATION
    Inventor: Atsushi Takahashi
  • Publication number: 20240234097
    Abstract: An etching method includes (a) adsorbing a silylating agent having a C—F bond to at least a portion of an etching target film including a silicon-containing film; and (b) etching the etching target film.
    Type: Application
    Filed: December 28, 2023
    Publication date: July 11, 2024
    Applicant: Tokyo Electron Limited
    Inventor: Atsushi TAKAHASHI
  • Patent number: 12017452
    Abstract: An object of the present invention is to bring a print head into a liquid ejectable state while reducing waste ink. The present invention is a printing apparatus including: a tank in which liquid is stored; a print head that comprises an ejection port surface on which an ejection port is formed, the ejection port ejecting the liquid which is supplied from the tank; a cap mechanism that caps the ejection port surface of the print head; a timer that counts a time during which the ejection port surface is capped; and a circulation unit configured to circulate the liquid in a circulation path including the tank and the print head, and in a case where the timer counts a predetermined time, the circulation unit circulates the liquid.
    Type: Grant
    Filed: October 8, 2021
    Date of Patent: June 25, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takuya Fukasawa, Takatoshi Nakano, Atsushi Takahashi, Yoshinori Nakagawa
  • Publication number: 20240199954
    Abstract: An oxidation inhibitor which contains a polyalkylene imine compound as an active ingredient; an oxidation inhibitory activity enhancing agent which contains a polyalkylene imine compound as an active ingredient; an oxidation inhibition method which includes making a polyalkylene imine compound and an oxidation inhibiting substance coexist in an oxidation inhibition object; and a method for enhancing oxidation inhibitory activity of an oxidation inhibiting substance, which includes making a polyalkylene imine compound and an oxidation inhibiting substance coexist.
    Type: Application
    Filed: February 21, 2022
    Publication date: June 20, 2024
    Applicant: TOHOKU UNIVERSITY
    Inventors: Atsushi TAKAHASHI, Suguru KATORI, Kousuke HIROMORI, Naomi KITAKAWA
  • Publication number: 20240183594
    Abstract: A flow switching device is provided at a refrigeration cycle apparatus. The flow switching device includes a plurality of plates; and a first inlet, a second inlet and a flow passage connecting between the first inlet and the second inlet. The flow passage have an anisotropic flow passage configured to have a forward flow resistance for a forward flow, the forward flow being a refrigerant flow from the first inlet to the second inlet, and a backward flow resistance for an inverse flow, the inverse flow being a refrigerant flow from the second inlet to the first inlet, the forward flow resistance being different from the backward flow resistance. A part of the anisotropic flow passage is at a plate, on which neither the first inlet nor the second the inlet is formed, of the plurality of plates.
    Type: Application
    Filed: June 18, 2021
    Publication date: June 6, 2024
    Inventors: Atsushi MORITA, Tsuyoshi MAEDA, Satoru YANACHI, Atsushi TAKAHASHI
  • Patent number: 11999167
    Abstract: Provided are an inkjet printing apparatus and a recovery method capable of suppressing ink thickening in the ejection openings in the suction process for the ejection openings. A vacuum wiper is moved being in contact with the ejection opening surface of the print head to perform a vacuum wiping process for the arrayed ejection openings sequentially. Ink is circulated in flow paths including the flow paths communicating with the ejection openings for which the vacuum wiping process has been finished.
    Type: Grant
    Filed: March 30, 2023
    Date of Patent: June 4, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshinori Nakagawa, Takatoshi Nakano, Atsushi Takahashi, Takuya Fukasawa
  • Publication number: 20240165960
    Abstract: Ink is circulated through a circulation flow path between a print head and an ink tank. Detection operation for detecting an ink ejection state in an ejection opening in the print head is performed. The ink circulation and the detection operation are simultaneously performed by performing the detection operation in response to a start of the ink circulation.
    Type: Application
    Filed: January 29, 2024
    Publication date: May 23, 2024
    Inventors: Takuya Fukasawa, Yuhei Oikawa, Takatoshi Nakano, Yoshinori Nakagawa, Atsushi Takahashi
  • Publication number: 20240153744
    Abstract: An etching method includes: (a) providing a substrate having an etching target film and a mask on the etching target film to a substrate support in a plasma processing apparatus including a chamber, the substrate support, a plasma generator supplied with source power, and a bias electrode supplied with bias power; and (b) forming a recess by etching the etching target film. In (b), the source power and the bias power are periodically supplied in a cycle that includes a first period and a second period. In the first period, the etching target film is etched, and in the second period, the second processing gas is adsorbed onto the etching target film.
    Type: Application
    Filed: November 3, 2023
    Publication date: May 9, 2024
    Applicant: Tokyo Electron Limited
    Inventors: Atsushi TAKAHASHI, Maju TOMURA, Ryo MATSUBARA
  • Publication number: 20240112922
    Abstract: In one exemplary embodiment, there is provided an etching method. The method includes (a) preparing a substrate, the substrate comprising a silicon-containing film and a mask, the silicon-containing film including a recess, the mask being provided on the silicon-containing film and including an opening that exposes the recess; (b) forming a carbon-containing film on a side wall of the silicon-containing film, the side wall defining the recess; and (c) by using a plasma generated from a processing gas, forming a protective film containing tungsten on the carbon-containing film and etching the silicon-containing film in the recess, the processing gas including a fluorine-containing gas and a tungsten-containing gas.
    Type: Application
    Filed: October 2, 2023
    Publication date: April 4, 2024
    Inventors: Ryo MATSUBARA, Atsushi TAKAHASHI, Yuta NAKANE, Noboru SAITO
  • Publication number: 20240112918
    Abstract: A plasma processing system includes: first and second processing chambers having respective first and second substrate supports; a transport chamber connected to the first and second processing chambers, and having a transport device; and a controller that executes processing of (a) disposing a substrate including a silicon-containing film having a recess portion and a mask on the silicon-containing film on the first substrate support of the first processing chamber, (b) forming a carbon-containing film on a side wall of the silicon-containing film defining the recess portion in the first processing chamber, (c) transporting the substrate from the first processing chamber to the second processing chamber via the transport chamber and disposing the substrate on the second substrate support, and (d) etching a bottom portion of the recess portion where the carbon-containing film is formed by using a plasma formed from a first processing gas in the second processing chamber.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 4, 2024
    Inventors: Noboru SAITO, Yuta NAKANE, Atsushi TAKAHASHI, Shinya ISHIKAWA, Satoshi OHUCHIDA, Maju TOMURA
  • Publication number: 20240109523
    Abstract: A vehicle brake device includes a first electric motor, a first electrically powered cylinder device, a first electromagnetic valve, and a first pressure sensor serving as first elements, a second electric motor, a second electrically powered cylinder device, a second electromagnetic valve, and a second pressure sensor serving as second elements, and a circuit board in which a first sector in which a first circuit for controlling the first element is formed and a second sector in which a second circuit for controlling the second element is formed are arranged side by side. In the vehicle brake device, the first element controlled only by the first circuit is disposed so as to face the first sector, and the second element controlled only by the second circuit is disposed so as to face the second sector.
    Type: Application
    Filed: October 26, 2021
    Publication date: April 4, 2024
    Applicant: ADVICS CO., LTD.
    Inventors: Tsuyoshi OTAKE, Atsushi TAKAHASHI
  • Patent number: 11945232
    Abstract: An inkjet printing apparatus is provided with a tank that stores ink, a print head that performs print operation by ejecting ink supplied from the tank, a circulation unit that establishes a circulating state to circulate ink in a circulation path if print operation is performed and establishes a stopped state to stop circulation of ink if print operation is terminated, and a deaeration unit that performs deaeration operation to deaerate ink inside the circulation path. The apparatus includes an estimation unit that estimates a dissolved gas amount in ink inside the circulation path based on dissolved gas amounts increased in the circulating state and in the stopped state, respectively, and a control unit that causes the deaeration unit to execute deaeration operation after completion of print operation if the dissolved gas amount estimated by the estimation unit exceeds a predetermined threshold.
    Type: Grant
    Filed: December 22, 2022
    Date of Patent: April 2, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takatoshi Nakano, Yoshinori Nakagawa, Atsushi Takahashi, Takuya Fukasawa
  • Patent number: D1039403
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: August 20, 2024
    Assignee: SONY CORPORATION
    Inventors: Kazuya Takahashi, Tatsumi Ito, Naohisa Sakamoto, Shinji Tashiro, Yoichi Katsumoto, Atsushi Nakamura