Patents by Inventor Atsushi Tsuchiya

Atsushi Tsuchiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6434509
    Abstract: Relative vector between an observation receiver located at an object and a reference receiver are divided into long period variation components not dependent on object displacements and short period variation components dependent on object displacements, and the short period variation component are represented by x, y and z axis components of unit vectors from the reference receiver toward the satellite. Then, carrier phases between at least three GPS satellites and the receivers are measured, and these measurement data are passed through a band pass filter to extract short period phase components corresponding to the short period variation components of the relative vectors. Next, at least three receiver to receiver single differences between the receivers and the GPS satellites are found for the short period phase components, and axial components of the short period variation components of the relative vectors are found by computation based on said at least three receiver to receiver single differences.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: August 13, 2002
    Assignee: Hitachi Zosen Corporation
    Inventors: Atsushi Tsuchiya, Teruyuki Kato, Yukihiro Terada, Masao Kinoshita, Hideshi Kakimoto, Hiroshi Isshiki
  • Publication number: 20020038920
    Abstract: The present invention provides an injection molding method for providing a molded product with excellent transcription and an excellent gloss level. In this method, immediately after a resin is filled in a cavity (1), a carbon dioxide gas is injected or the skin layer is moved back to form a space (13) between the resin and the die surface (1), so that growth of the skin layer is hold down, and at the same time the carbon dioxide is dissolved in the skin layer for lowering the glass transition point of skin layer. Then the skin layer is again closely cohered to a surface of the die by increasing the resin pressure and cooling the molded product for solidifying behind the holding pressure. With this method, products with excellent transcription and with an excellent surface gloss level can be obtained.
    Type: Application
    Filed: August 10, 2001
    Publication date: April 4, 2002
    Inventors: Atsushi Tsuchiya, Hirofumi Tateyama
  • Patent number: 6366854
    Abstract: The present invention is a method for measuring a distance between a GPS receiver installed in a floating body and a GPS satellite, subjecting this measured distance data to a moving averaging process, removing from the measured distance data, distance data corresponding to a distance to a satellite orbit to determine a variance of the GPS receiver, removing wind wave-induced noise from the data, then determining three linear equations that use three-dimensional coordinates of the GPS receiver as unknown numbers, based on variances relative to GPS satellites and an azimuth and an elevation of each GPS satellite, and then solving these simultaneous equations to determine displacement of the GPS receiver corresponding to its variation component quantities on three-dimensional coordinate axes.
    Type: Grant
    Filed: June 20, 2000
    Date of Patent: April 2, 2002
    Assignee: Hitachi Zosen Corporation
    Inventors: Atsushi Tsuchiya, Teruyuki Kato, Yukihiro Terada, Masao Kinoshita, Hideshi Kakimoto, Hiroshi Isshiki
  • Patent number: 5449411
    Abstract: A microwave plasma processing apparatus is provided with a vacuum chamber, a substrate holder for mounting a substrate to be processed, a reactive gas feed port, a cleaning gas feed port, a plasma generation device for generating a processing plasma from the reactive gas and a cleaning plasma from the cleaning gas, and a high-frequency electric field application device for applying an electric field having a frequency that allows ions in the cleaning plasma to follow changes in the electric field. The high-frequency electric field application device is activated to apply the electric field to the cleaning plasma so as to remove substances that have been deposited on the surfaces of the vacuum chamber and substrate holder due to the processing of the substrate by the processing plasma, thereby cleaning up the vacuum chamber and substrate holder.
    Type: Grant
    Filed: October 19, 1993
    Date of Patent: September 12, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Takuya Fukuda, Junji Sato, Fumiyuki Kanai, Atsushi Tsuchiya
  • Patent number: 4875932
    Abstract: An apparatus for measuring a flow rate of a fluid such as a gas, having a by-pass passage, a measurement passage, a cantilever-shaped pressure-receiving plate in the measurement passage and a deflection detector for measuring an amount of deflection of the pressure-receiving plate.
    Type: Grant
    Filed: December 16, 1988
    Date of Patent: October 24, 1989
    Assignee: Cosmo Instruments Co., Ltd.
    Inventors: Yoshichika Uchiyama, Atsushi Tsuchiya