Patents by Inventor Atsushi Yusa

Atsushi Yusa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4589003
    Abstract: A solid state image sensor including a substrate, an epitaxial layer grown on the substrate, an opaque bottom electrode applied on the epitaxial layer, a photoconductor film deposited on the bottom electrode, a transparent surface electrode applied on the photoconductor film, a reading-out SIT formed in the epitaxial layer and a resetting MOS-FET also formed in the epitaxial layer. A gate diffusion region of the reading-out SIT is connected to the bottom electrode and a source region of resetting MOS-FET is also connected to the bottom electrode. A source electrode connected to the source region of the reading-out SIT is extended under the bottom surface, while an insulating layer is interposed therebetween to form a capacitance. Charge carriers stored in the gate region of the reading-out SIT can be read-out to derive a large output voltage due to the amplifying function of the reading-out SIT.
    Type: Grant
    Filed: November 29, 1983
    Date of Patent: May 13, 1986
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Hidetoshi Yamada, Atsushi Yusa, Takashi Mizusaki, Jun-ichi Nishizawa
  • Patent number: 4565677
    Abstract: A purifier for purifying a raw material gas for use in manufacturing semiconductor devices is formed by a hydrogenated amorphous substance of an element selected from a group consisting of Si, Ge, P and As whose hydride gas is used as the raw material gas. This purifier is used for purifying the raw material gas to be purified in such a manner that the raw material gas is brought into contact with the purifier comprising the hydrogenated amorphous substance which is maintained at a temperature a little lower than the decomposition temperature of the raw material gas to efficiently remove the small amount of oxygen from the raw material gas.
    Type: Grant
    Filed: June 20, 1984
    Date of Patent: January 21, 1986
    Assignee: Olympus Optical Company Limited
    Inventor: Atsushi Yusa
  • Patent number: 4480636
    Abstract: In an endoscope for displaying an image of an object on a monitor screen, a static induction transistor (SIT) image sensor having a number of light receiving elements is arranged at a light emitting side of an image guide bundle. In order to eliminate dead spots appearing in the displayed image due to broken fibers in the image guide bundle, pixel signals of light receiving elements corresponding to the dead spots are formed by interpolation with the aid of pixel signals derived from light receiving elements adjacent to the relevant light receiving elements to be interpolated. As an interpolation function, for example, an average of the pixel signals derived from the adjacent light receiving elements is used. The addresses of the light receiving elements corresponding to the dead spots are stored previously in a PROM during a manufacturing stage. In this manner, the interpolated image of the object having an excellent image quality can be displayed on the monitor.
    Type: Grant
    Filed: July 6, 1982
    Date of Patent: November 6, 1984
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Kouichi Karaki, Kenichi Oinoue, Takashi Tsukaya, Katsumi Terada, Masafumi Yamasaki, Atsushi Yusa, Kazuo Nakamura
  • Patent number: 4150168
    Abstract: A method of manufacturing high-purity silicon rods by subjecting a silicon compound to pyrolysis on a plurality of rod-shaped high-purity silicon carrier members which have been red-heated by directly passing an electric current therethrough thereby depositing high-purity silicon thereon, characterized in that monosilane supplied into a pyrolysis container is subjected to pyrolysis or thermal decomposition on said red-heated carrier members while insulating the radiant heat between said red-heated carrier members along the overall length thereof.
    Type: Grant
    Filed: March 2, 1978
    Date of Patent: April 17, 1979
    Assignee: Kabushiki Kaisha Komatsu Seisakusho
    Inventors: Yoshifumi Yatsurugi, Atsushi Yusa, Nagao Takahashi
  • Patent number: 4147814
    Abstract: A method of manufacturing high-purity silicon rods having a uniform sectional shape by thermally decomposing monosilane on a plurality of rod-shaped silicon carrier members which have been red-heated by directly passing an electric current therethrough, said silicon carrier members being thermally insulated from one another, characterized in that monosilane is supplied into a pyrolysis container through multi-stage monosilane supply ports located in parallel with the axes of said silicon carrier members held vertically within the pyrolysis container, and that the amount of supply of monosilane through the upper supply ports is increased as compared with that through the lower supply ports in response to the increase of the diameter of each of said silicon rods.
    Type: Grant
    Filed: March 2, 1978
    Date of Patent: April 3, 1979
    Assignee: Kabushiki Kaisha Komatsu Seisakusho
    Inventors: Yoshifumi Yatsurugi, Atsushi Yusa, Nagao Takahashi