Abstract: The invention consists of a fixed focal length objective lens forming an image of an object with a plurality of lens elements and an aperture stop (114), wherein the aperture stop (114) defines an aperture stop proximity space (118) and at least one field proximity space (120, 122). The objective lens comprises at least three aspherical surfaces (124, 126, 128, 130) of a lens element. Either two aspherical surfaces (128, 130) are positioned in the aperture stop proximity space (118) and at least one aspherical surface (124, 126) is positioned in a field proximity space (120, 122). Or at least one aspherical surface (128, 130) is positioned in the aperture stop proximity space (118) and two aspherical surfaces (124, 126) are positioned in a field proximity space (120, 122). This distribution of aspherical surfaces provides for means of optimally correction aberrations leading to a very high level of aberration correction.

Abstract: The invention consists of a fixed focal length objective lens forming an image of an object with a plurality of lens elements and an aperture stop (114), wherein the aperture stop (114) defines an aperture stop proximity space (118) and at least one field proximity space (120, 122). The objective lens comprises at least three aspherical surfaces (124, 126, 128, 130) of a lens element. Either two aspherical surfaces (128, 130) are positioned in the aperture stop proximity space (118) and at least one aspherical surface (124, 126) is positioned in a field proximity space (120, 122). Or at least one aspherical surface (128, 130) is positioned in the aperture stop proximity space (118) and two aspherical surfaces (124, 126) are positioned in a field proximity space (120, 122). This distribution of aspherical surfaces provides for means of optimally correction aberrations leading to a very high level of aberration correction.

Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

Abstract: A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

Abstract: A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.

Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

Abstract: A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.

Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

Abstract: A macro lens system includes, in this order from an object side: a positive first lens group; a negative second lens group; a positive third lens group; a positive fourth lens group; a positive fifth lens group; and a negative sixth lens group. The first lens group is constituted by three lenses. The second lens group, the fourth lens group, and the fifth lens group are independently moved in the direction of the optical axes thereof when focusing from an object at infinity to an object at a most proximate distance.

Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

Abstract: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength ?0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.

Abstract: An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.

Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

Abstract: An optical system for imaging an object on an image acquisition unit. The optical system, from the object, comprises a first lens unit, a second lens unit, a third lens unit and a fourth lens unit in the direction of the image acquisition unit. The first lens unit comprises at least one lens group with negative refractive power. The second lens unit comprises at least one lens group with positive refractive power and the third lens unit comprises at least one lens group with negative refractive power. The second lens unit and the third lens unit overall comprise at least three lens groups. From the first lens unit in the direction of an image acquisition unit, the first lens group, the second lens group and then the third lens group are arranged. The three lens groups have a movable design for adjusting the focal length of the optical system.

Abstract: A macro lens system includes, in this order from an object side: a positive first lens group; a negative second lens group; a positive third lens group; a positive fourth lens group; a positive fifth lens group; and a negative sixth lens group. The first lens group is constituted by three lenses. The second lens group, the fourth lens group, and the fifth lens group are independently moved in the direction of the optical axes thereof when focusing from an object at infinity to an object at a most proximate distance.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective includes: a first objective part to image the pattern provided in the object plane to a first intermediate image, wherein all of the elements in the first objective part having optical power to image the pattern provided in the object plane to the first intermediate image are refractive elements; a second objective part that comprises at least one concave mirror to image the first intermediate image to a second intermediate image; and a third objective part to image the second intermediate image to the image plane, wherein all of the elements in the third objective part having optical power to image the second intermediate image to the image plane are refractive elements. An aperture stop is positioned in the third objective part and there are no more than four lenses in the third objective part between the aperture stop and the image plane.

Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.