Abstract: A method, non-transitory computer readable medium and a system that includes a fuzzy logic module arranged to apply a fuzzy logic algorithm for calculating, in response to received echoes that are received by a receiver, confidence levels of origins of received echoes; wherein the received echoes are reflected or scattered from the origins; and a volume calculator that is arranged to calculate a volume of the content in response to (a) estimated locations of the origins, and (b) the confidence levels of the origins.

Abstract: A method and a system for automatically mapping obstacles within a bin that stores content, the system may include: a location estimator that is arranged to calculate, in response to detection signals, an estimated shape of an upper surface of the content; wherein the detection signals are generated by a receiver in response to radiation signals reflected or scattered from multiple points within the bin; and an obstacle detector that is arranged to detect at least one obstacle point that belongs to an obstacle in response to (a) the estimated shape of the upper surface of the content, and (b) an expected shape attribute of the upper surface of the content.

Abstract: A system for measuring the height of bin contents includes transmitters for transmitting pulses of wave energy towards the upper surface of the contents and receivers for receiving echoes of the pulses and producing corresponding signals. The transmitters and receivers are distributed aerially above the contents. The system also includes a processing apparatus, for using the received signals to map the upper surface, that includes correlators that correlate pulse waveforms with the signals, and a beamformer. In one embodiment, the beamformer computes, from the signals considered as corresponding to echoes, of pulses from fewer synthetic transmitters, received at a synthetic receiver array, respective directions of arrival of the signals.

Abstract: A method and a system for automatically mapping obstacles within a bin that stores content, the system may include a location estimator that is arranged to calculate, in response to detection signals, multiple estimates of shapes of the upper surface of the content at different time periods; wherein the detection signals are generated by a receiver in response to radiation signals reflected or scattered within the bin; and an obstacle detector that is arranged to detect an obstacle in response to relationships between the multiple estimates of shapes of the upper surface of the content.

Abstract: A method, non-transitory computer readable medium and a system that includes a confidence level module arranged to calculate, in response to detection signals, estimated upper surface points and to associate a non-binary confidence level with each estimated upper surface point; wherein the detection signals are generated by a receiver in response to an irradiation of at least a portion of the upper surface of the content with radiation pulses transmitted by a transmitter; and an estimator that is arranged to calculate an estimate of the upper surface based upon the estimated upper surface points and the non-binary confidence level associated with each estimated upper surface point.

Abstract: A computer creates a recipe for a manufacturing tool based on design data. The computer obtains the design data, which includes basic elements and hierarchical levels corresponding to the basic elements. The computer selects one or more basic elements of interest and generates one or more sets of simple array cells corresponding to a level of interest. The computer uses the sets of simple array cells to identify periodical areas in level-of-interest coordinates to enable automated recipe creation. The periodical areas are identified with respect to one or more basic elements.

Abstract: A method and system are presented for evaluating a variation of a parameter of a pattern. The method includes processing data indicative of an aerial intensity image of at least a portion of a patterned article, and determining values of a certain functional of the aerial image intensity for predetermined regions within the at least portion of the patterned article. The values of the aerial image intensity functional are indicative of a variation of at least one parameter of the pattern within the at least portion of the patterned article or are indicative of a variation of at least one parameter of a pattern manufactured by utilizing the patterned article.

Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

Abstract: A method and system are presented for evaluating a variation of a parameter of a pattern, the method includes: processing data indicative of an aerial intensity image of at least a portion of a patterned article, and determining values of a certain functional of the aerial image intensity for predetermined regions within said at least portion of the patterned article, said values of the aerial image intensity functional being indicative of a variation of at least one parameter of the pattern within said at least portion of the patterned article or of a variation of at least one parameter of a pattern manufactured by utilizing the patterned article.

Abstract: A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.