Patents by Inventor Ayad Al-Shaikh

Ayad Al-Shaikh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8123860
    Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: February 28, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Randhir P. S. Thakur, Alfred W. Mak, Ming Xi, Walter Benjamin Glenn, Ahmad A. Khan, Ayad A. Al-Shaikh, Avgerinos V. Gelatos, Salvador P. Umotoy
  • Publication number: 20090056626
    Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
    Type: Application
    Filed: October 30, 2008
    Publication date: March 5, 2009
    Inventors: RANDHIR P.S. THAKUR, Alfred W. Mak, Ming Xi, Walter Benjamin Glenn, Ahmad A. Khan, Ayad A. Al-Shaikh, Avgerinos V. Gelatos, Salvador P. Umotoy
  • Publication number: 20070095285
    Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
    Type: Application
    Filed: December 19, 2006
    Publication date: May 3, 2007
    Inventors: Randhir Thakur, Alfred Mak, Ming Xi, Walter Glenn, Ahmad Khan, Ayad Al-Shaikh, Avgerinos Gelatos, Salvador Umotoy
  • Patent number: 7175713
    Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: February 13, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Randhir P. S. Thakur, Alfred W. Mak, Ming Xi, Walter Benjamin Glenn, Ahmad A. Khan, Ayad A. Al-Shaikh, Avgerinos V. Gelatos, Salvador P. Umotoy
  • Publication number: 20030172872
    Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
    Type: Application
    Filed: January 27, 2003
    Publication date: September 18, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Randhir P.S. Thakur, Alfred W. Mak, Ming Xi, Walter Benjamin Glenn, Ahmad A. Khan, Ayad A. Al-Shaikh, Avgerinos V. Gelatos, Salvador P. Umotoy
  • Patent number: 6221221
    Abstract: Apparatus providing a low impedance RF return current path between a shield member and a pedestal in a semiconductor wafer processing chamber. The return path reduces RF voltage drop between the shield member and the pedestal during processing. The return path comprises a conductive strap connected to the pedestal and a conductive bar attached to the strap. A toroidal spring makes multiple parallel electrical connections between the conductive bar and the shield member. A support assembly, attached to a collar on the chamber wall, supports the conductive bar.
    Type: Grant
    Filed: November 16, 1998
    Date of Patent: April 24, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Ayad Al-Shaikh, Michael Rosenstein, Bradley O. Stimson, Jianming Fu, Praburam Gopalraja