Patents by Inventor Ayan Majumdar

Ayan Majumdar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11450539
    Abstract: Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: September 20, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas B. Baumgarten, Nir Merry
  • Publication number: 20220241108
    Abstract: Devices, systems and methods for controlling a patient's body temperature by endovascular heat exchange and/or surface heat exchange.
    Type: Application
    Filed: February 18, 2022
    Publication date: August 4, 2022
    Inventors: John William Jacobsen, Ayan Majumdar, Sean W. Yip, Jeremy Thomas Dabrowiak
  • Patent number: 11337851
    Abstract: Devices, systems and methods for controlling a patient's body temperature by endovascular heat exchange and/or surface heat exchange.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: May 24, 2022
    Assignee: ZOLL Circulation, Inc.
    Inventors: John William Jacobsen, Ayan Majumdar, Sean W Yip, Jeremy Thomas Dabrowiak
  • Patent number: 11282724
    Abstract: A factory interface for an electronic device processing system includes a factory interface chamber, an inert gas supply conduit, an exhaust conduit and an inert gas recirculation system. The inert gas supply conduit supplies an inert gas into the factory interface chamber. The exhaust conduit exhausts the inert gas from the factory interface chamber. The inert gas recirculation system recirculates the inert gas exhausted from the factory interface chamber back into the factory interface chamber.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: March 22, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas Baumgarten, Nir Merry
  • Patent number: 11018036
    Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: May 25, 2021
    Assignee: Applied Materials, Inc.
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Publication number: 20190362997
    Abstract: A factory interface for an electronic device processing system includes a factory interface chamber, an inert gas supply conduit, an exhaust conduit and an inert gas recirculation system. The inert gas supply conduit supplies an inert gas into the factory interface chamber. The exhaust conduit exhausts the inert gas from the factory interface chamber. The inert gas recirculation system recirculates the inert gas exhausted from the factory interface chamber back into the factory interface chamber.
    Type: Application
    Filed: August 7, 2019
    Publication date: November 28, 2019
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas Baumgarten, Nir Merry
  • Publication number: 20190133820
    Abstract: Devices, systems and methods for controlling a patient's body temperature by endovascular heat exchange and/or surface heat exchange.
    Type: Application
    Filed: August 1, 2018
    Publication date: May 9, 2019
    Inventors: John William Jacobsen, Ayan Majumdar, Sean W. Yip, Jeremy Thomas Dabrowiak
  • Patent number: 10199256
    Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
    Type: Grant
    Filed: September 27, 2014
    Date of Patent: February 5, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Patent number: 10192765
    Abstract: Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: January 29, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas Baumgarten, Nir Merry
  • Publication number: 20180366355
    Abstract: Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.
    Type: Application
    Filed: August 24, 2018
    Publication date: December 20, 2018
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas B. Baumgarten, Nir Merry
  • Publication number: 20180350637
    Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Application
    Filed: August 13, 2018
    Publication date: December 6, 2018
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Patent number: 10115616
    Abstract: Methods, apparatus, and assemblies are provided for an adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: October 30, 2018
    Assignee: Applied Materials, Inc.
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Publication number: 20170316967
    Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.
    Type: Application
    Filed: July 19, 2017
    Publication date: November 2, 2017
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Patent number: 9441792
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: September 13, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Patent number: 9202738
    Abstract: Systems, apparatus and methods including pneumatic end effectors for transporting substrates between system components of electronic device manufacturing systems are provided. In one aspect, an end effector has a base adapted to be connected to a robotic component, and one or more pneumatic suction elements positioned on the base. Applying a pneumatic source to the pneumatic suction element draws a substrate into contact with contact pads of the end effector. Methods and systems, as well as numerous other aspects are disclosed.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: December 1, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Daniel Greenberg, Ayan Majumdar
  • Publication number: 20150090294
    Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150090295
    Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150090341
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Application
    Filed: September 26, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Publication number: 20150086316
    Abstract: Systems, apparatus and methods including pneumatic end effectors for transporting substrates between system components of electronic device manufacturing systems are provided. In one aspect, an end effector has a base adapted to be connected to a robotic component, and one or more pneumatic suction elements positioned on the base. Applying a pneumatic source to the pneumatic suction element draws a substrate into contact with contact pads of the end effector. Methods and systems, as well as numerous other aspects are disclosed.
    Type: Application
    Filed: September 25, 2014
    Publication date: March 26, 2015
    Inventors: Daniel Greenberg, Ayan Majumdar
  • Publication number: 20150045961
    Abstract: Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.
    Type: Application
    Filed: August 11, 2014
    Publication date: February 12, 2015
    Inventors: Sushant S. Koshti, Dean C. Hruzek, Ayan Majumdar, John C. Menk, Helder T. Lee, Sangram Patil, Sanjay Rajaram, Douglas Baumgarten