Abstract: Radiation curable compositions useful as coatings for wood, metal, glass, fabric paper, fiber and plastics are made from copolymers of p-acetoxystyrene and another monomer which is an alkadiene or an allyl ester of a polymerizable ethylenically unsaturated acid blended with ethylenically unsaturated compounds.

Abstract: Negative photoresist compositions are made from copolymers of 4-acetoxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.

Abstract: A substituted polybenzimidazole polymer is disclosed wherein sulfoalkyl derivatives of polybenzimidazole are produced by the reaction of a polybenzimidazole polymer with a sultone. Beta sultones may be directly reacted with the polybenzimidazole polymer to produce a sulfoethyl derivative of polybenzimidazole. However, when gamma, delta or eta sultones are used, the polybenzimidazole polymer preferably is first reacted with an alkali hydride to produce the polyanion of polybenzimidazole. The polybenzimidazole polyanion is then reacted with the sultone to produce a sulfoalkyl derivative of polybenzimidazole polymer. These derivatives may find great use as ion exchange devices or for reverse osmosis or ultrafiltration devices.