Patents by Inventor Barbara Foley
Barbara Foley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11877652Abstract: The present disclosure relates to an adjustable table including (i) a base, (ii) a first elongated rod coupled to the base, wherein the first elongated rod includes one or more first through holes, (iii) a second elongated rod configured to translate with respect to the first elongated rod, wherein the second elongated rod includes one or more second through holes, (iv) a table top coupled to the second elongated rod, and (v) a coupling mechanism configured to be positioned between one of the one or more first through holes and one of the one or more second through holes to thereby set a distance between the table top and the base.Type: GrantFiled: August 31, 2022Date of Patent: January 23, 2024Assignee: Water Party, Inc.Inventors: Barbara Foley, Stephen Foley, III, Ryan Foley
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Publication number: 20230064396Abstract: The present disclosure relates to an adjustable table including (i) a base, (ii) a first elongated rod coupled to the base, wherein the first elongated rod includes one or more first through holes, (iii) a second elongated rod configured to translate with respect to the first elongated rod, wherein the second elongated rod includes one or more second through holes, (iv) a table top coupled to the second elongated rod, and (v) a coupling mechanism configured to be positioned between one of the one or more first through holes and one of the one or more second through holes to thereby set a distance between the table top and the base.Type: ApplicationFiled: August 31, 2022Publication date: March 2, 2023Inventors: Barbara Foley, Stephen Foley, III, Ryan Foley
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Patent number: 6965128Abstract: High quality epitaxial layers of monocrystalline materials (26) can be grown overlying monocrystalline substrates (22) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer (24) comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer (28) of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy and epitaxial growth of single crystal silicon onto single crystal oxide materials. A microresonator device is formed overlying the monocrystalline substrate.Type: GrantFiled: February 3, 2003Date of Patent: November 15, 2005Assignee: Freescale Semiconductor, Inc.Inventors: Paige M. Holm, Barbara Foley Barenburg, Joyce K. Yamamoto, Fred V. Richard
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Patent number: 6960467Abstract: The invention relates to a microfluidic device with microchannels that have separated regions which have a member of a specific binding pair member such as DNA or RNA bound to porous polymer, beads or structures fabricated into the microchannel. The microchannels of the invention are fabricated from plastic and are operatively associated with a fluid propelling component and detector.Type: GrantFiled: December 19, 2001Date of Patent: November 1, 2005Assignee: Clinical Micro Sensors, Inc.Inventors: Chan-Long Shieh, Barbara Foley, Huinan Yu, Vi-En Choong
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Publication number: 20040150043Abstract: High quality epitaxial layers of monocrystalline materials (26) can be grown overlying monocrystalline substrates (22) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer (24) comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer (28) of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy and epitaxial growth of single crystal silicon onto single crystal oxide materials. A microresonator device is formed overlying the monocrystalline substrate.Type: ApplicationFiled: February 3, 2003Publication date: August 5, 2004Applicant: MOTOROLA, INC.Inventors: Paige M. Holm, Barbara Foley Barenburg, Joyce K. Yamamoto, Fred V. Richard
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Publication number: 20040043479Abstract: The invention relates generally to methods and apparatus for conducting analyses, particularly microfluidic devices. In preferred aspects, the devices are fabricated using ceramic multilayer technology to form devices in which parallel, independently controlled molecular reactions, such as nucleic acid amplification reactions including the polymerase chain reaction (PCR) can be performed. Additionally, the devices can include and comprise micro-gas chromatographs similarly fabricated from ceramics.Type: ApplicationFiled: November 14, 2002Publication date: March 4, 2004Inventors: Cynthia G. Briscoe, Jeremy W. Burdon, Tony Chan, Barbara Foley Barenburg, Piotr Grodzinski, George Hawkins, Rong-Fong Huang, Peter Kahn, Robert Marcero, Mark W. McGarry, Todd Tuggle, Huinan Yu
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Patent number: 6605454Abstract: A microwave device has a monolithic microwave integrated circuit (MMIC) disposed therein for applying microwave radiation to a microfluidic structure, such as a chamber, defined in the device. The microwave radiation from the MMIC is useful for heating samples introduced into the microfluidic structure and for effecting lysis of cells in the samples. Microfabrication techniques allow the fabrication of MMICs that perform heating and cell lysing of samples having volumes in the microliter to picoliter range.Type: GrantFiled: March 22, 2001Date of Patent: August 12, 2003Assignee: Motorola, Inc.Inventors: Barbara Foley Barenburg, Jeremy Burdon, Yuk-Tong Chan, Xunhu Dai, Sean Gallagher, Piotr Grodzinski, Robert Marrero, Vijay Nair, David Rhine, Thomas Smekal
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Patent number: 6592733Abstract: A capillary electrophoresis device having a substrate layer and a cover layer, with a plurality of electrophoresis channels formed in the substrate layer, includes an optical waveguide system that transmits excitation radiation from a source port into each one of the electrophoresis channels. The optical waveguide system is defined by regions, within either the cover or substrate, that have an index of refraction higher than that of the surrounding material.Type: GrantFiled: November 12, 1999Date of Patent: July 15, 2003Assignee: Motorola, Inc.Inventors: Barbara Foley, Jaymie Sawyer, Cynthia G. Briscoe
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Patent number: 6594414Abstract: A structure for an optical switch includes a reflective layer formed over a high quality epitaxial layer of piezoelectric compound semiconductor materials grown over a monocrystalline substrate, such as a silicon wafer. The piezoelectric layer can be activated to alter the path of light incident on the reflective layer. A compliant substrate is provided for growing the monocrystalline compound semiconductor layer. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying piezoelectric monocrystalline material layer.Type: GrantFiled: July 25, 2001Date of Patent: July 15, 2003Assignee: Motorola, Inc.Inventors: Aroon Tungare, Keryn Lian, Robert Lempkowski, Barbara Foley Barenburg
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Publication number: 20030034535Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.Type: ApplicationFiled: August 15, 2001Publication date: February 20, 2003Applicant: MOTOROLA, INC.Inventors: Barbara Foley Barenburg, Jonathan F. Gorrell, Kenneth D. Cornett
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Publication number: 20030034538Abstract: High quality epitaxial layers of compound semiconductor materials can be grown overlying large silicon wafers by first growing an accommodating buffer layer on a silicon wafer. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline compound semiconductor layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. A composite integrated circuit having a tunable laser is provided. The laser may be mode-locked. Injection-locking may be used to pass optical properties to a slave laser.Type: ApplicationFiled: August 15, 2001Publication date: February 20, 2003Applicant: MOTOROLA, INC.Inventors: Timothy J. Brophy, Barbara Foley Barenburg, Amarildo Vieira, Kerry I. Litvin
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Publication number: 20030034551Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicone oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.Type: ApplicationFiled: August 15, 2001Publication date: February 20, 2003Applicant: MOTOROLA, INC.Inventors: Barbara Foley Barenburg, Timothy Brophy
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Publication number: 20030030062Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.Type: ApplicationFiled: August 9, 2001Publication date: February 13, 2003Applicant: MOTOROLA, INC.Inventors: Paige M. Holm, Barbara Foley Barenburg, Fred Richard, Joyce Yamamoto
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Publication number: 20030026515Abstract: The present invention provides a wavelength-tunable optical device structure which monolithically integrates both active and passive device components on a single substrate. Monolithically-integrated active and passive optical device components may be fabricated by growing high-quality active optical devices, such as optical emitters and optical detectors, on a single substrate and using electro-optical crystalline oxide materials to tune optical devices, such as directional couplers, to transmit radiation having selected wavelengths. In this manner, cost-effective, monolithically-integrated, tunable wavelength multiplexers and/or demultiplexers may be formed.Type: ApplicationFiled: August 1, 2001Publication date: February 6, 2003Applicant: MOTOROLA, INC.Inventors: Barbara Foley Barenburg, Joyce Yamamoto
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Publication number: 20030026311Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.Type: ApplicationFiled: August 6, 2001Publication date: February 6, 2003Applicant: MOTOROLA, INC.Inventors: Barbara Foley Barenburg, Fred Richard, Joyce Yamamoto
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Publication number: 20030025116Abstract: A semiconductor laminate configured for dividing into predetermined parts has a lateral expanse and includes: (a) a monocrystalline substrate substantially coterminous with the lateral expanse; (b) at least one layer including a monocrystalline compound semiconductor material; and (c) at least one intermediate layer substantially separating the substrate and the compound semiconductor material. The at least one compound semiconductor material layer is arrayed to present intervals substantially devoid of the monocrystalline compound semiconductor material that generally establish lateral limits of the predetermined parts.Type: ApplicationFiled: August 1, 2001Publication date: February 6, 2003Applicant: MOTOROLA, INC.Inventors: Robert J. Higgins, Barbara Foley Barenburg, Joseph P. Heck, Jonathan F. Gorrell
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Publication number: 20030022520Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. One way to achieve the formation of a compliant substrate includes first growing an accommodating buffer layer (24) on a silicon wafer (22). The accommodating buffer layer (24) is a layer of monocrystalline oxide spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide (28). The amorphous interface layer (28) dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. Light-assisted deposition techniques are used to form the accommodating buffer layer (24).Type: ApplicationFiled: July 25, 2001Publication date: January 30, 2003Applicant: MOTOROLA, INC.Inventors: Alexander A. Demkov, Zhiyi Yu, Barbara Foley Barenburg
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Publication number: 20030021571Abstract: High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.Type: ApplicationFiled: July 25, 2001Publication date: January 30, 2003Applicant: MOTOROLA, INC.Inventors: Keryn Lian, Aroon V. Tungare, Barbara Foley Barenburg
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Publication number: 20030022414Abstract: A opto-electronic semiconductor structure having an electrochromic switch includes a monocrystalline silicon substrate and an amorphous oxide material overlying the monocrystalline silicon substrate. A monocrystalline perovskite oxide material overlies the amorphous oxide material and a monocrystalline compound semiconductor material overlies the monocrystalline perovskite oxide material. An optical source component that is adapted to transmit radiant energy may be formed within the monocrystalline compound semiconductor material. An electrochromic switch may be optically coupled to the optical source component. An optical detector component that is adapted to receive radiant energy may be formed within the monocrystalline compound semiconductor material. An electrochromic switch may be optically coupled to the optical detector component.Type: ApplicationFiled: July 25, 2001Publication date: January 30, 2003Applicant: MOTOROLA, INC.Inventors: Keryn Lian, Marc Chason, Daniel Gamota, Barbara Foley Barenburg
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Publication number: 20030021520Abstract: A structure for an optical switch includes a reflective layer formed over a high quality epitaxial layer of piezoelectric compound semiconductor materials grown over a monocrystalline substrate, such as a silicon wafer. The piezoelectric layer can be activated to alter the path of light incident on the reflective layer. A compliant substrate is provided for growing the monocrystalline compound semiconductor layer. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying piezoelectric monocrystalline material layer.Type: ApplicationFiled: July 25, 2001Publication date: January 30, 2003Applicant: MOTOROLA, INC.Inventors: Aroon Tungare, Keryn Lian, Robert Lempkowski, Barbara Foley Barenburg