Patents by Inventor Barry C. Arkles

Barry C. Arkles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210140036
    Abstract: A method for deposition of a thin film onto a substrate is provided. The method includes providing a source precursor containing on or more of elements constituting the thin film, generating a transient species from the source precursor, and depositing a thin film onto the substrate from the transient species. The transient species being a reactive intermediate that has a limited lifetime in a condensed phase at or above room temperature.
    Type: Application
    Filed: January 19, 2021
    Publication date: May 13, 2021
    Inventors: Barry C. ARKLES, Alain E. KALOYEROS
  • Patent number: 11001599
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: May 11, 2021
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Patent number: 10995244
    Abstract: Materials containing the reaction products of a cyclic azasilane with water and a compound or polymer containing an isocyanate or epoxy functional group and methods for their synthesis are provided. Stable mixtures containing a cyclic azasilane and a compound or polymer containing an isocyanate or epoxy functional group according to invention are stored under anhydrous conditions. The invention also provides a novel class of materials, mono and bis(cycloaza)disiloxanes comprising one or two cyclic structures bridged by an Si—O—Si bond.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: May 4, 2021
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Barry C. Arkles, Youlin Pan
  • Patent number: 10961624
    Abstract: A thin film deposition process is provided. The process includes, in a single cycle, providing a precursor in the vapor phase with or without a carrier gas to a reaction zone containing a substrate, such that a monolayer of the precursor is adsorbed to a surface of the substrate and the adsorbed monolayer subsequently undergoes conversion to a discrete atomic or molecular layer of a thin film, without any intervening pulse of or exposure to other chemical species or co-reactants.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: March 30, 2021
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Barry C. Arkles, Alain E. Kaloyeros
  • Patent number: 10933008
    Abstract: Silicon-based cannabidiol derivatives and methods for their synthesis are provided, in which the derivatives contain a cannabidiol molecule and at least one silicon-based group containing Si—O—Si bonds. The derivatives are useful in cosmetic and topical compositions, have potential beneficial topical properties, and enhance solubility and compatibility in cosmetic formulations containing the silicon-based materials. Silicone elastomers infused with compositions containing the silicon-based cannabidiol derivatives and trisiloxanes are also provided.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: March 2, 2021
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Barry C. Arkles, Jonathan D. Goff, Taewoo Min, Youlin Pan, Tatyana Abel-Roberman
  • Patent number: 10875968
    Abstract: A new class of cyclotrisiloxanes having hydridosiloxanylalkyl substituents on one, two, or three of the ring silicon atoms and a method for their preparation are provided. These compounds undergo living anionic ring-opening polymerization to generate unique polymer structures.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: December 29, 2020
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Jonathan D. Goff, Barry C. Arkles
  • Publication number: 20200337983
    Abstract: Compositions and methods for reshaping keratin-rich substrates while forming adherent flexible films contain emulsified or soluble mixtures of silanols and hemiaminals or the reaction products of silanols and hemiaminals including silylated hemiaminals. A method for treating split-ends in hair is also described.
    Type: Application
    Filed: March 9, 2020
    Publication date: October 29, 2020
    Inventors: Barry C. ARKLES, Jonathan D. GOFF, Alison Ane PHILLIPS, Kerry Campbell DEMELLA
  • Publication number: 20200318236
    Abstract: A thin film deposition process is provided. The process includes, in a single cycle, providing a precursor in the vapor phase with or without a carrier gas to a reaction zone containing a substrate, such that a monolayer of the precursor is adsorbed to a surface of the substrate and the adsorbed monolayer subsequently undergoes conversion to a discrete atomic or molecular layer of a thin film, without any intervening pulse of or exposure to other chemical species or co-reactants.
    Type: Application
    Filed: January 9, 2020
    Publication date: October 8, 2020
    Inventors: Barry C. ARKLES, Alain E. KALOYEROS
  • Publication number: 20200317699
    Abstract: A new class of compounds known as chalcogenosilacyclopentanes is described. These compounds are five-membered ring structures containing a silicon-selenium or silicon-tellurium bond, as shown in Formulas (I) and (II). In these compounds, the substituents on the silicon and on the ring carbons may be hydrogen, alkyl, alkoxy, aromatic, or ether groups. The chalcogenosilacyclopentane compounds undergo ring-opening reactions with hydroxyl and other protic functionalities and may be used to prepare substrates that are amenable to thin film deposition techniques such as ALD and CVD.
    Type: Application
    Filed: March 23, 2020
    Publication date: October 8, 2020
    Inventors: Barry C. ARKLES, Richard J. LIBERATORE, Youlin PAN
  • Patent number: 10669294
    Abstract: A new class of cyclotrisiloxanes having alkyl ether substituents on one, two, or three of the ring silicon atoms and a method for their preparation are provided. These compounds undergo living anionic ring-opening polymerization to generate unique polymer structures. A new class of hydridosilylethylcyclotrisiloxanes is also described.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: June 2, 2020
    Assignee: Gelest Technologies, Inc.
    Inventors: Jonathan D. Goff, Barry C. Arkles
  • Publication number: 20200115498
    Abstract: A heterofunctional poly(alkyleneoxide) according to the invention contains a first polymer terminus containing a protected, unprotected, or derivatized amine or aminoalkyl functionality and a second polymer terminus containing an unsaturated functionality. Reaction products, derivatives, and methods of making these materials are also described.
    Type: Application
    Filed: December 12, 2019
    Publication date: April 16, 2020
    Inventors: Barry C. ARKLES, Jonathan D. GOFF, Ferdinand GONZAGA
  • Publication number: 20200010488
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Publication number: 20200002583
    Abstract: Materials containing the reaction products of a cyclic azasilane with water and a compound or polymer containing an isocyanate or epoxy functional group and methods for their synthesis are provided. Stable mixtures containing a cyclic azasilane and a compound or polymer containing an isocyanate or epoxy functional group according to invention are stored under anhydrous conditions. The invention also provides a novel class of materials, mono and bis(cycloaza)disiloxanes comprising one or two cyclic structures bridged by an Si—O—Si bond.
    Type: Application
    Filed: September 6, 2019
    Publication date: January 2, 2020
    Inventors: Barry C. ARKLES, Youlin PAN
  • Patent number: 10513637
    Abstract: Materials containing the reaction products of a cyclic azasilane with water and a compound or polymer containing an isocyanate or epoxy functional group and methods for their synthesis are provided. Stable mixtures containing a cyclic azasilane and a compound or polymer containing an isocyanate or epoxy functional group according to invention are stored under anhydrous conditions. The invention also provides a novel class of materials, mono and bis(cycloaza)disiloxanes comprising one or two cyclic structures bridged by an Si—O—Si bond.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: December 24, 2019
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan
  • Patent number: 10487242
    Abstract: A stabilized mixture containing an alkyltrialkoxysilane hydrolysate solution and an amine functional silicone emulsion is provided. The stabilized mixture may be utilized in a masonry treatment product or a cellulosic or wood treatment product, such as to provide waterproofing properties, or in a hair care treatment product for improving hair combability. A method of preparing the mixture involves hydrolyzing an alkoxysilane to form an aqueous solution containing alkylsilanetriols and/or oligomeric alkylsilanetriol condensates; and stabilizing the solution by adding an amine functional silicone.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: November 26, 2019
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Jonathan D. Goff
  • Patent number: 10479806
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: November 19, 2019
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Publication number: 20190315929
    Abstract: A new class of cyclotrisiloxanes having hydridosiloxanylalkyl substituents on one, two, or three of the ring silicon atoms and a method for their preparation are provided. These compounds undergo living anionic ring-opening polymerization to generate unique polymer structures.
    Type: Application
    Filed: April 4, 2019
    Publication date: October 17, 2019
    Inventors: Jonathan D. GOFF, Barry C. ARKLES
  • Publication number: 20190315780
    Abstract: A new class of cyclotrisiloxanes having alkyl ether substituents on one, two, or three of the ring silicon atoms and a method for their preparation are provided. These compounds undergo living anionic ring-opening polymerization to generate unique polymer structures. A new class of hydridosilylethylcyclotrisiloxanes is also described.
    Type: Application
    Filed: April 4, 2019
    Publication date: October 17, 2019
    Inventors: Jonathan D. GOFF, Barry C. ARKLES
  • Patent number: 10392530
    Abstract: Compositions which undergo cure by irradiation with UV, visible light or electron beam only after activation by hydroxylated surfaces or exposure to moisture are based on mixtures of cyclic thiasilanes and unsaturated silanes, siloxanes or hydrocarbons.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: August 27, 2019
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Jonathan D. Goff
  • Publication number: 20190112709
    Abstract: An integrated system for synthesis of a film-forming precursor, consumption of the precursor and formation of a thin film on a substrate is provided. The integrated system includes a raw material source, a precursor synthesis chamber in communication with the raw material source, a thin film processing chamber in communication with the precursor synthesis chamber for supplying the precursor from the precursor synthesis chamber to the thin film processing chamber in a controlled manner for consumption of the precursor to form the thin film on the substrate, a monitoring system for monitoring of the thin film formation in the thin film processing chamber and/or the precursor synthesis in the precursor synthesis chamber, and a controller for controlling a rate of the precursor synthesis, precursor consumption and/or thin film formation. The rate of precursor synthesis is synchronized with the rate of precursor consumption for formation of the thin film.
    Type: Application
    Filed: June 11, 2018
    Publication date: April 18, 2019
    Inventors: Barry C. ARKLES, Alain E. KALOYEROS, Eric Anthony ROBERTSON, III