Abstract: Methods and systems for measuring degradation includes measuring an initial electrical characteristic of a test device in a ring oscillator that includes multiple oscillator stages and a test stage having a delay stage and the test device. The ring oscillator is operated for a period of time. The electrical characteristic of the test device is measured after operating the ring oscillator. A level of degradation in the test device is determined using a processor based on the measurements of the electrical characteristic of the test device.

Abstract: Embodiments are directed to a system for measuring a degradation characteristic of a plurality of electronic components. The system includes a parallel stress generator communicatively coupled to the plurality of electronic components, and a serial electronic measuring component communicatively coupled to the plurality of electronic components. The parallel stress generator is configured to generate a plurality of stress signals, apply the plurality of stress signals in parallel to the plurality of electronic components and remove the plurality of stress signals from the plurality of electronic components. The serial electronic measuring component is configured to, subsequent to the removal of the plurality of stress signals, sequentially measure the degradation characteristic of each one of the plurality of electronic components in order to determine their degradation resulting from the applied stress signals.

Abstract: A method and circuit of monitoring an effective age of a target circuit are provided. A standby mode is activated in the target circuit. A standby current of a first number of circuit blocks of the target circuit is measured. The measured standby current of the first number of circuit blocks is compared to a first baseline standby current of the first number of circuit blocks. Upon determining that the measured standby current of the first number of circuit blocks is below a first predetermined factor of a baseline standby current of the first number of circuit blocks, the first number of circuit blocks is identified to have a bias temperature instability (BTI) degradation concern.

Abstract: A computer-implemented method for analyzing customer satisfaction is presented. The computer-implemented method may include capturing visual images related to individuals and order consumables, determining, by a processor, at least one measurable metric to predict variations indicating different satisfaction levels, and dynamically refining parameters if the variations exceed one or more thresholds. The computer-implemented method further includes receiving the captured visual images of the individuals and the order consumables by least one camera in communication with the processor.

Abstract: A complementary metal-oxide semiconductor (CMOS) circuit and a method of fabricating the device are described. The circuit includes an n-channel field effect transistor (nFET), the nFET including a high-k dielectric layer on an interlayer. The CMOS circuit also includes a p-channel field effect transistor (pFET), the pFET including the high-k dielectric layer on the interlayer and additionally including an aluminum-based cap layer between the high-k dielectric layer and a pFET work function setting metal. Metal atoms from the cap layer do not intermix with the interlayer.

Abstract: Methods and systems for reducing dark current in a photodiode include heating a photodiode and applying an increasing reverse bias voltage to the heated photodiode to reduce a dark current generated by the photodiode.

Abstract: A method and system are provided for chip testing. The method includes selectively deploying a chip for future use or discarding the chip to prevent the future use, responsive to a stress history of the chip determined using a non-destructive test procedure. The test procedure includes ordering each of a plurality of functional patterns by a respective minimum operating period corresponding thereto. The test procedure further includes ranking each of the plurality of patterns based on at least one preceding available pattern to provide a plurality of pattern ranks. The test procedure also includes calculating a sum by summing the plurality of pattern ranks. The sum calculated during an initial performance of the test procedure is designated as a baseline, and the sum calculated during a subsequent performance of the test procedure is compared to a threshold derived from the baseline to determine the stress history of the chip.

Abstract: A method for gaining access beyond a restricted access gateway includes an access key sequence stored on memory of a device. The access key sequence includes a sequence of key entries and key touch movements. An entered request sequence including keys activated by touch on a keyboard of the device and directions of touch movements made on the keyboard is recorded. With an access controller, it is determined whether the recorded entered request sequence matches the access key sequence. Access beyond the restricted access gateway is granted to functions when the recorded entered request sequence matches the access key sequence.

Abstract: A computer-implemented method for analyzing customer satisfaction is presented. The computer-implemented method may include capturing visual images related to individuals and order consumables, determining, by a processor, at least one measurable metric to predict variations indicating different satisfaction levels, and dynamically refining parameters if the variations exceed one or more thresholds. The computer-implemented method further includes receiving the captured visual images of the individuals and the order consumables by least one camera in communication with the processor.

Abstract: A computer-implemented method for analyzing customer satisfaction is presented. The computer-implemented method may include capturing visual images related to individuals and order consumables, determining, by a processor, at least one measurable metric to predict variations indicating different satisfaction levels, and dynamically refining parameters if the variations exceed one or more thresholds. The computer-implemented method further includes receiving the captured visual images of the individuals and the order consumables by least one camera in communication with the processor.

Abstract: A three plate MIM capacitor structure includes a three plate MIM capacitor, a first wire in a metal layer above/below the three plate MIM, a second wire below/above the three plate MIM, a third wire below/above the three plate MIM, a first via connected to the first test wire, a second via connected to a middle plate of the three plate MIM, and a third via connected to the top and bottom plates of the three plate MIM. The test structure may verify the integrity the MIM capacitor by applying a potential to the first test wire, applying ground potential to both the second test wire and the third test wire, and detecting leakage current across the first wire and the second and third wires or detecting leakage current across the second wire and the third wire.

Abstract: Methods and systems for reducing dark current in a photodiode include heating a photodiode above room temperature. A reverse bias voltage is applied to the heated photodiode to reduce a dark current generated by the photodiode.

Abstract: Methods and systems for measuring degradation includes measuring an initial electrical characteristic of a test device in a ring oscillator that includes multiple oscillator stages, each having a delay stage and one or more fan-out devices, and a test stage having a delay stage and the test device. The ring oscillator is operated for a period of time. The electrical characteristic of the test device is measured after operating the ring oscillator. A level of degradation in the test device is determined using a processor based on the measurements of the electrical characteristic of the test device.

Abstract: Systems for reducing dark current in a photodiode include a heater configured to heat a photodiode above room temperature. A reverse bias voltage source is configured to apply a reverse bias voltage to the heated photodiode to reduce a dark current generated by the photodiode. A control system is configured to trigger the reverse bias voltage source to increase the reverse bias voltage.

Abstract: A three plate MIM capacitor test structure includes a three plate MIM capacitor, a first test wire in a metal layer above/below the three plate MIM, a second test wire below/above the three plate MIM, a third test wire below/above the three plate MIM, a first via connected to the first test wire, a second via connected to a middle plate of the three plate MIM, and a third via connected to the top and bottom plates of the three plate MIM. The test structure may verify the integrity the MIM capacitor by applying a potential to the first test wire, applying ground potential to both the second test wire and the third test wire, and detecting leakage current across the first test wire and the second and third test wires or detecting leakage current across the second test wire and the third test wire.

Abstract: A complementary metal-oxide semiconductor (CMOS) circuit and a method of fabricating the device are described. The circuit includes an n-channel field effect transistor (nFET), the nFET including a high-k dielectric layer on an interlayer. The CMOS circuit also includes a p-channel field effect transistor (pFET), the pFET including the high-k dielectric layer on the interlayer and additionally including an aluminum-based cap layer between the high-k dielectric layer and a pFET work function setting metal. Metal atoms from the cap layer do not intermix with the interlayer.

Abstract: A complementary metal-oxide semiconductor (CMOS) circuit and a method of fabricating the device are described. The circuit includes an n-channel field effect transistor (nFET), the nFET including a high-k dielectric layer on an interlayer. The CMOS circuit also includes a p-channel field effect transistor (pFET), the pFET including the high-k dielectric layer on the interlayer and additionally including an aluminum-based cap layer between the high-k dielectric layer and a pFET work function setting metal. Metal atoms from the cap layer do not intermix with the interlayer.

Abstract: Methods and systems for measuring degradation includes measuring an initial electrical characteristic of a test device in a ring oscillator that includes multiple oscillator stages and a test stage having a delay stage and the test device. The ring oscillator is operated for a period of time. The electrical characteristic of the test device is measured after operating the ring oscillator. A level of degradation in the test device is determined using a processor based on the measurements of the electrical characteristic of the test device.

Abstract: A complementary metal-oxide semiconductor (CMOS) circuit and a method of fabricating the device are described. The circuit includes an n-channel field effect transistor (nFET), the nFET including a high-k dielectric layer on an interlayer. The CMOS circuit also includes a p-channel field effect transistor (pFET), the pFET including the high-k dielectric layer on the interlayer and additionally including an aluminum-based cap layer between the high-k dielectric layer and a pFET work function setting metal. Metal atoms from the cap layer do not intermix with the interlayer.

Abstract: A method and system are provided for chip testing. The method includes selectively deploying a chip for future use or discarding the chip to prevent the future use, responsive to a stress history of the chip determined using a non-destructive test procedure. The test procedure includes ordering each of a plurality of functional patterns by a respective minimum operating period corresponding thereto. The test procedure further includes ranking each of the plurality of patterns based on at least one preceding available pattern to provide a plurality of pattern ranks. The test procedure also includes calculating a sum by summing the plurality of pattern ranks. The sum calculated during an initial performance of the test procedure is designated as a baseline, and the sum calculated during a subsequent performance of the test procedure is compared to a threshold derived from the baseline to determine the stress history of the chip.