Patents by Inventor Bart Jozef Janssen

Bart Jozef Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230377835
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Application
    Filed: July 24, 2023
    Publication date: November 23, 2023
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • Publication number: 20230298853
    Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.
    Type: Application
    Filed: May 22, 2023
    Publication date: September 21, 2023
    Applicant: FEI Company
    Inventors: Bart BUIJSSE, Bart Jozef JANSSEN
  • Patent number: 11756762
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Grant
    Filed: February 3, 2022
    Date of Patent: September 12, 2023
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • Publication number: 20230274908
    Abstract: A charged particle beam microscope system is operated in a transmission imaging mode. During the operation, the charged particle beam microsystem directs a charged particle beam to the sample to produce images. A time series of beam tilts is applied in a pattern to the charged particle beam directed to the sample to produce a sequence of images. At least some of the images in the sequence of images are captured while the charged particle beam is transitioning between one beam tilt in the time series of beam tilts and a sequentially adjacent beam tilt in the time series of beam tilts. The pattern is configured to induce image changes between the images in the sequence of images that are indicative of optical aberrations in the charged particle beam microscope system.
    Type: Application
    Filed: February 28, 2022
    Publication date: August 31, 2023
    Applicant: FEI Company
    Inventors: Erik Franken, Bart Jozef Janssen
  • Patent number: 11742175
    Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: August 29, 2023
    Assignee: FEI Company
    Inventors: Erik Michiel Franken, Bart Jozef Janssen
  • Patent number: 11694874
    Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.
    Type: Grant
    Filed: July 13, 2021
    Date of Patent: July 4, 2023
    Assignee: FEI Company
    Inventors: Bart Buijsse, Bart Jozef Janssen
  • Publication number: 20230020957
    Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 19, 2023
    Applicant: FEI Company
    Inventors: Bart BUIJSSE, Bart Jozef JANSSEN
  • Patent number: 11551906
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected within a predetermined time window.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: January 10, 2023
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • Publication number: 20230005705
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected withing a predetermined time window.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • Publication number: 20230005702
    Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Erik Michiel FRANKEN, Bart Jozef JANSSEN
  • Patent number: 11417498
    Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: August 16, 2022
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Pleun Dona
  • Publication number: 20220208510
    Abstract: An apparatus includes an electron source coupled to provide an electron beam, a beam deflector arranged to provide a pulsed electron beam from the electron beam, a detector arranged to receive the pulsed electron beam after transmitting through a sample, and a controller coupled to control at least the beam deflector and the detector, the controller coupled to or including code that, when executed by the controller, causes the apparatus to establish the pulsed electron beam with pulse characteristics based on control of at least the beam deflector, wherein an illumination window is formed based on the pulse characteristics, the illumination window being a time frame when the sample is illuminated with a pulse of the pulsed electron beam, and to form a detection window for the detector and synchronize the detection window in relation to the illumination window, wherein detection events occurring in the detection window form the basis of an image, wherein the detection window determines a time frame when the de
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen
  • Publication number: 20220157557
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Application
    Filed: February 3, 2022
    Publication date: May 19, 2022
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • Patent number: 11297276
    Abstract: A method and system for acquiring data from a pixelated image sensor for detecting charged particles. The method includes reading a pixel voltage of one or more of the multiple pixels multiple times without resetting the image sensor and digitizing the pixel into a first number of bits. The camera outputs a digitized compressed pixel voltage in a second, less, number of bits. The maximum range of the digitized compressed pixel voltage is less than a maximum range of the pixel voltage.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: April 5, 2022
    Assignee: FEI Company
    Inventors: Henricus Gerardus Roeven, Rob Braan, Bart Jozef Janssen, Jeroen Keizer
  • Publication number: 20220103771
    Abstract: A method and system for acquiring data from a pixelated image sensor for detecting charged particles. The method includes reading a pixel voltage of one or more of the multiple pixels multiple times without resetting the image sensor and digitizing the pixel into a first number of bits. The camera outputs a digitized compressed pixel voltage in a second, less, number of bits. The maximum range of the digitized compressed pixel voltage is less than a maximum range of the pixel voltage.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Applicant: FEI Company
    Inventors: Henricus Gerardus ROEVEN, Rob BRAAN, Bart Jozef JANSSEN, Jeroen KEIZER
  • Patent number: 11257656
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: February 22, 2022
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • Publication number: 20210319975
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Application
    Filed: April 8, 2020
    Publication date: October 14, 2021
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • Patent number: 10937625
    Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 2, 2021
    Assignee: FEI Company
    Inventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt
  • Publication number: 20210020400
    Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 21, 2021
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Pleun Dona
  • Patent number: 10825647
    Abstract: A method of using a Transmission Charged Particle Microscope, comprising: Providing a specimen on a specimen holder; Using an illumination system to direct a beam of charged particles from a source onto said specimen; Using an imaging system to direct charged particles that are transmitted through the specimen onto a detector, further comprising the following actions: In an acquisition step, lasting a time interval T, using said detector in particle counting mode to register spatiotemporal data relating to individual particle detection incidences, and to output said spatiotemporal data in raw form, without assembly into an image frame; In a subsequent rendering step, assembling a final image from said spatiotemporal data, while performing a mathematical correction operation.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Lingbo Yu, Erik Michiel Franken