Patents by Inventor Bart Jozef Janssen
Bart Jozef Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230377835Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: ApplicationFiled: July 24, 2023Publication date: November 23, 2023Applicant: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Publication number: 20230298853Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.Type: ApplicationFiled: May 22, 2023Publication date: September 21, 2023Applicant: FEI CompanyInventors: Bart BUIJSSE, Bart Jozef JANSSEN
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Patent number: 11756762Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: GrantFiled: February 3, 2022Date of Patent: September 12, 2023Assignee: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Publication number: 20230274908Abstract: A charged particle beam microscope system is operated in a transmission imaging mode. During the operation, the charged particle beam microsystem directs a charged particle beam to the sample to produce images. A time series of beam tilts is applied in a pattern to the charged particle beam directed to the sample to produce a sequence of images. At least some of the images in the sequence of images are captured while the charged particle beam is transitioning between one beam tilt in the time series of beam tilts and a sequentially adjacent beam tilt in the time series of beam tilts. The pattern is configured to induce image changes between the images in the sequence of images that are indicative of optical aberrations in the charged particle beam microscope system.Type: ApplicationFiled: February 28, 2022Publication date: August 31, 2023Applicant: FEI CompanyInventors: Erik Franken, Bart Jozef Janssen
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Patent number: 11742175Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.Type: GrantFiled: June 30, 2021Date of Patent: August 29, 2023Assignee: FEI CompanyInventors: Erik Michiel Franken, Bart Jozef Janssen
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Patent number: 11694874Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.Type: GrantFiled: July 13, 2021Date of Patent: July 4, 2023Assignee: FEI CompanyInventors: Bart Buijsse, Bart Jozef Janssen
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Publication number: 20230020957Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.Type: ApplicationFiled: July 13, 2021Publication date: January 19, 2023Applicant: FEI CompanyInventors: Bart BUIJSSE, Bart Jozef JANSSEN
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Patent number: 11551906Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected within a predetermined time window.Type: GrantFiled: June 30, 2021Date of Patent: January 10, 2023Assignee: FEI CompanyInventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
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Publication number: 20230005705Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected withing a predetermined time window.Type: ApplicationFiled: June 30, 2021Publication date: January 5, 2023Applicant: FEI CompanyInventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
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Publication number: 20230005702Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.Type: ApplicationFiled: June 30, 2021Publication date: January 5, 2023Applicant: FEI CompanyInventors: Erik Michiel FRANKEN, Bart Jozef JANSSEN
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Patent number: 11417498Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.Type: GrantFiled: July 15, 2020Date of Patent: August 16, 2022Assignee: FEI CompanyInventors: Bart Jozef Janssen, Pleun Dona
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Publication number: 20220208510Abstract: An apparatus includes an electron source coupled to provide an electron beam, a beam deflector arranged to provide a pulsed electron beam from the electron beam, a detector arranged to receive the pulsed electron beam after transmitting through a sample, and a controller coupled to control at least the beam deflector and the detector, the controller coupled to or including code that, when executed by the controller, causes the apparatus to establish the pulsed electron beam with pulse characteristics based on control of at least the beam deflector, wherein an illumination window is formed based on the pulse characteristics, the illumination window being a time frame when the sample is illuminated with a pulse of the pulsed electron beam, and to form a detection window for the detector and synchronize the detection window in relation to the illumination window, wherein detection events occurring in the detection window form the basis of an image, wherein the detection window determines a time frame when the deType: ApplicationFiled: December 28, 2021Publication date: June 30, 2022Applicant: FEI CompanyInventors: Bart Jozef Janssen, Gerard van Veen
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Publication number: 20220157557Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: ApplicationFiled: February 3, 2022Publication date: May 19, 2022Applicant: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Patent number: 11297276Abstract: A method and system for acquiring data from a pixelated image sensor for detecting charged particles. The method includes reading a pixel voltage of one or more of the multiple pixels multiple times without resetting the image sensor and digitizing the pixel into a first number of bits. The camera outputs a digitized compressed pixel voltage in a second, less, number of bits. The maximum range of the digitized compressed pixel voltage is less than a maximum range of the pixel voltage.Type: GrantFiled: September 30, 2020Date of Patent: April 5, 2022Assignee: FEI CompanyInventors: Henricus Gerardus Roeven, Rob Braan, Bart Jozef Janssen, Jeroen Keizer
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Publication number: 20220103771Abstract: A method and system for acquiring data from a pixelated image sensor for detecting charged particles. The method includes reading a pixel voltage of one or more of the multiple pixels multiple times without resetting the image sensor and digitizing the pixel into a first number of bits. The camera outputs a digitized compressed pixel voltage in a second, less, number of bits. The maximum range of the digitized compressed pixel voltage is less than a maximum range of the pixel voltage.Type: ApplicationFiled: September 30, 2020Publication date: March 31, 2022Applicant: FEI CompanyInventors: Henricus Gerardus ROEVEN, Rob BRAAN, Bart Jozef JANSSEN, Jeroen KEIZER
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Patent number: 11257656Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: GrantFiled: April 8, 2020Date of Patent: February 22, 2022Assignee: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Publication number: 20210319975Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: ApplicationFiled: April 8, 2020Publication date: October 14, 2021Applicant: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Patent number: 10937625Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.Type: GrantFiled: November 21, 2019Date of Patent: March 2, 2021Assignee: FEI CompanyInventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt
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Publication number: 20210020400Abstract: The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.Type: ApplicationFiled: July 15, 2020Publication date: January 21, 2021Applicant: FEI CompanyInventors: Bart Jozef Janssen, Pleun Dona
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Patent number: 10825647Abstract: A method of using a Transmission Charged Particle Microscope, comprising: Providing a specimen on a specimen holder; Using an illumination system to direct a beam of charged particles from a source onto said specimen; Using an imaging system to direct charged particles that are transmitted through the specimen onto a detector, further comprising the following actions: In an acquisition step, lasting a time interval T, using said detector in particle counting mode to register spatiotemporal data relating to individual particle detection incidences, and to output said spatiotemporal data in raw form, without assembly into an image frame; In a subsequent rendering step, assembling a final image from said spatiotemporal data, while performing a mathematical correction operation.Type: GrantFiled: January 23, 2019Date of Patent: November 3, 2020Assignee: FEI CompanyInventors: Bart Jozef Janssen, Lingbo Yu, Erik Michiel Franken