Patents by Inventor Bawa Singh

Bawa Singh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4395323
    Abstract: The present invention provides, in a sputtering apparatus, an anode means interposed between the cathode and the substrate (upon which material is to be deposited) which acts to intercept electrons so that they do not impinge on the substrate and which is formed to permit the material dislodged from the cathode (by impinging ions) to pass beyond the anode and be deposited on the substrate. While the present invention can be usefully employed without the aid of a magnetic field, in a preferred embodiment, the present invention is made part of a planar magnetron.
    Type: Grant
    Filed: April 17, 1981
    Date of Patent: July 26, 1983
    Assignee: Denton Vacuum Inc.
    Inventors: Richard A. Denton, Bawa Singh