Patents by Inventor Bernardo Kastrup
Bernardo Kastrup has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11875966Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: GrantFiled: August 16, 2021Date of Patent: January 16, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul Smakman, Tamara Druzhinina, Coen Adrianus Verschuren
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Publication number: 20210375581Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: ApplicationFiled: August 16, 2021Publication date: December 2, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bernardo KASTRUP, Johannes Catharinus Hubertus MULKENS, Marinus Aart VAN DEN BRINK, Jozef Petrus Henricus BENSCHOP, Erwin Paul SMAKMAN, Tamara DRUZHININA, Coen Adrianus VERSCHUREN
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Publication number: 20210357570Abstract: A defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: ApplicationFiled: July 30, 2021Publication date: November 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Christophe David FOUQUET, Bernardo KASTRUP, Arie Jeffrey DEN BOEF, Johannes Catharinus Hubertus MULKENS, James Benedict KAVANAGH, James Patrick KOONMEN, Neal Patrick CALLAN
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Patent number: 11094502Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: GrantFiled: December 9, 2016Date of Patent: August 17, 2021Assignee: ASML Netherlands B.V.Inventors: Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul Smakman, Tamara Druzhinina, Coen Adrianus Verschuren
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Patent number: 11080459Abstract: A defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: GrantFiled: February 28, 2020Date of Patent: August 3, 2021Assignee: ASML Netherlands B.V.Inventors: Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Publication number: 20210079519Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.Type: ApplicationFiled: February 21, 2019Publication date: March 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV
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Patent number: 10915689Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.Type: GrantFiled: September 28, 2016Date of Patent: February 9, 2021Assignee: ASML Netherlands B.V.Inventors: Peter Ten Berge, Everhardus Cornelis Mos, Richard Johannes Franciscus Van Haren, Peter Hanzen Wardenier, Erik Jensen, Bernardo Kastrup, Michael Kubis, Johannes Catharinus Hubertus Mulkens, David Frans Simon Deckers, Wolfgang Helmut Henke, Joungchel Lee
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Publication number: 20200218849Abstract: A defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: ApplicationFiled: February 28, 2020Publication date: July 9, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Patent number: 10579772Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: GrantFiled: June 4, 2018Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Publication number: 20190006147Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: ApplicationFiled: December 9, 2016Publication date: January 3, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Bernardo KASTRUP, Johannes Catharinus Hubertus MULKENS, Marinus Aart VAN DEN BRINK, Jozef Petrus Henricus BENSCHOP, Erwin Paul SMAKMAN, Tamara DRUZHININA, Coen Adrianus VERSCHUREN
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Publication number: 20180365369Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: ApplicationFiled: June 4, 2018Publication date: December 20, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Christophe David FOUQUET, Bernardo KASTRUP, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Publication number: 20180307135Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.Type: ApplicationFiled: September 28, 2016Publication date: October 25, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Peter TEN BERGE, Everhardus Cornelis MOS, Richard Johannes Franciscus VAN HAREN, Peter Hanzen WARDENIER, Erik JENSEN, Bernardo KASTRUP, Michael KUBIS, Johannes Catharinus Hubertus MULKENS, Davis Frans Simon DECKERS, Wolfgang Helmut HENKE, Joungchel LEE
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Publication number: 20180299770Abstract: A method including identifying that an area of a first substrate includes a hotspot based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information at the hotspot, and creating first modification information for modifying the patterning device (e.g., the information to be transmitted with the patterning device to a patterning modification tool) based on the first error information to obtain a modified patterning device.Type: ApplicationFiled: September 27, 2016Publication date: October 18, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Peter TEN BERGE, Johannes Catharinus Hubertus MULKENS, Bernardo KASTRUP, Richard Johannes Franciscus VAN HAREN
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Patent number: 9990462Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: GrantFiled: October 31, 2016Date of Patent: June 5, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Publication number: 20170046473Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: ApplicationFiled: October 31, 2016Publication date: February 16, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Christophe David FOUQUET, Bernardo KASTRUP, Arie Jeffrey DEN BOEF, Johannes Catharinus Hubertus MULKENS, James Benedict KAVANAGH, James Patrick KOONMEN, Neal Patrick CALLAN
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Patent number: 9507907Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; and determining or predicting, using the actual value, an existence, a probability of existence, a characteristic, or a combination selected therefrom, of a defect produced from the hot spot with the device manufacturing process.Type: GrantFiled: June 4, 2015Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen, Neal Patrick Callan
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Patent number: 9229336Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.Type: GrantFiled: January 26, 2012Date of Patent: January 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Jozef Maria Finders, Bernardo Kastrup, Sander De Putter
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Publication number: 20150356233Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.Type: ApplicationFiled: June 4, 2015Publication date: December 10, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Christophe David FOUQUET, Bernardo KASTRUP, Arie Jeffrey DEN BOEF, Johannes Catharinus Hubertus MULKENS, James Benedict KAVANAGH, James Patrick KOONMEN, Neal Patrick CALLAN
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Patent number: 8259285Abstract: An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.Type: GrantFiled: December 14, 2006Date of Patent: September 4, 2012Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Patricius Aloysius Jacobus Tinnemans, Wenceslao A. Cebuhar, Ronald P. Albright, Bernardo Kastrup
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Publication number: 20120194797Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.Type: ApplicationFiled: January 26, 2012Publication date: August 2, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Jozef Maria FINDERS, Bernardo Kastrup, Sander De Putter