Abstract: Systems and methods for active control of radial etch uniformity are described. One of the methods includes generating a radio frequency (RF) signal having a fundamental frequency and generating another RF signal having a harmonic frequency. The harmonic frequency, or a phase, or a parameter level, or a combination thereof of the other RF signal are controlled to control harmonics of RF plasma sheath within a plasma chamber to achieve radial etch uniformity.

Abstract: Provided is a display device for providing a media resource. The display device includes a communicator and a controller. The communicator collects background media resource database (DB) information. The controller extracts text information from each of media resources included in a background media resource DB, acquires one or more feature words based on the extracted text information, generates a feature word weight matrix of the background media resource DB which includes a respective weight of each acquired feature word, calculates a clustering similarity between each media resource included in the background media resource DB and a current media resource, which is being watched by a user, by using the feature word weight matrix, and provides a media resource recommendation list which includes one or more media resources based on the clustering similarity.

Abstract: The present invention relates to an air purification apparatus for a coal-fired electric power plant, and more specifically to an air purification apparatus for a coal-fired electric power plant, which, first, can filter out wastes of contaminated smoke by using limewater, which, second, can filter out fine dust and carbon dioxide included in the smoke, which, third, can convert waste gas including carbon monoxide in a state in which only smoke remains into carbon dioxide by reacting oxygen with the waste gas and purify the smoke into clean air by allowing a sodium hydroxide solution to absorb the carbon dioxide, and which, fourth, can eliminate humidity from the clean air by passing the clean air through a moisture condenser a plurality of times and discharge clean air in a pure smoke state from the power plant.

Abstract: A method of operating an electronic apparatus includes displaying, on a display, a virtual channel list including at least one virtual channel; and in response to an external input of selecting one virtual channel from the virtual channel list, reproducing at least one content corresponding to at least one content identifier among a plurality of content identifiers included in a content list corresponding to the selected virtual channel. In the method, a type of at least one content among a plurality of contents corresponding to the plurality of content identifiers is different from a type of at least one content among the rest of the plurality of contents.

Abstract: Provided is a display device for providing a media resource. The display device includes a communicator and a controller. The communicator collects background media resource database (DB) information. The controller extracts text information from each of media resources included in a background media resource DB, acquires one or more feature words based on the extracted text information, generates a feature word weight matrix of the background media resource DB which includes a respective weight of each acquired feature word, calculates a clustering similarity between each media resource included in the background media resource DB and a current media resource, which is being watched by a user, by using the feature word weight matrix, and provides a media resource recommendation list which includes one or more media resources based on the clustering similarity.

Abstract: An apparatus for calculating a speculative bit error rate includes a data decoder operable to iteratively decode received data to yield decoded data, and a speculative bit error calculator operable to calculate a bit error rate based on the decoded data and the received data while the data decoder is decoding the received data. The bit error rate is updated with each decoding iteration in the data decoder.

Abstract: An apparatus for etching a dielectric layer contained by a substrate is provided. An etch reactor comprises a top electrode and a bottom electrode. An etch gas source supplies an etch gas into the etch reactor. A first Radio Frequency (RF) source generates a first RF power with a first frequency and supplies the first RF power into the etch reactor, whereas the first frequency is between 100 kilo Hertz (kHz) and 600 kHz. A second RF source generates a second RF power with a second frequency and supplies the second RF power into the etch reactor, whereas the second frequency is at least 10 mega Hertz (MHz).

Abstract: A method for forming etched features in a low-k dielectric layer disposed below the photoresist mask in a plasma processing chamber is provided. Features are etched into the low-k dielectric layer through the photoresist mask. The photoresist mask is stripped, wherein the stripping comprising at least one cycle, wherein each cycle comprises a fluorocarbon stripping phase, comprising flowing a fluorocarbon stripping gas into the plasma processing chamber, forming a plasma from the fluorocarbon stripping gas, and stopping the flow of the fluorocarbon stripping gas into the plasma processing chamber and a reduced fluorocarbon stripping phase, comprising flowing a reduced fluorocarbon stripping gas that has a lower fluorocarbon flow rate than the fluorocarbon stripping gas into the plasma processing chamber, forming the plasma from the reduced fluorocarbon stripping gas, and stopping the flow of the reduced fluorocarbon stripping gas.

Abstract: A display apparatus and a control method thereof which retrieves a frame of a recorded image corresponding to a frame of a processed image to set the retrieved frame as a key frame and displays the key frame corresponding to a position selected by the user includes an image reception unit, an image processing unit, a display unit, a storage unit, and a controller. The display apparatus may quickly and accurately determine a position of a scene from a recorded TV program, retrieve the scene, and edit the program.

Abstract: Provided are an electronic apparatus based on touch control and a method for using the apparatus. The apparatus comprises a touch sensing module for receiving touch input from a user and generating a touch signal; an indexer for storing an index list of time information and offset information of video frames of video data; and a controller for determining a video frame localization mode according to touch velocity, touch length and touch direction of the touch input, calculating time information of a video frame to be displayed and a frame rate, and outputting control signals of a pusher, a decoder and a frame buffer controller.

Abstract: A method for etching features in a low-k dielectric layer disposed below an organic mask is provided by an embodiment of the invention. Features are etched into the low-k dielectric layer through the organic mask. A fluorocarbon layer is deposited on the low-k dielectric layer. The fluorocarbon layer is cured. The organic mask is stripped.

Abstract: An image device capable of reverse play with minimal time delay, and a method thereof. The image device includes a buffer to store a greater number of pictures than constitute a single group of pictures (GOP), and a controller to operate the buffer to store decoded pictures. Accordingly, problems such as cutoff of pictures or time delays are minimized when performing reverse play.

Abstract: A method for etching features in a dielectric layer is provided. A mask is formed over the dielectric layer. A protective silicon-containing coating is formed on exposed surfaces of the mask. The features are etched through the mask and protective silicon-containing coating. The features may be partially etched before the protective silicon-containing coating is formed.

Abstract: An apparatus for etching a dielectric layer contained by a substrate is provided. An etch reactor comprises a top electrode and a bottom electrode. An etch gas source supplies an etch gas into the etch reactor. A first Radio Frequency (RF) source generates a first RF power with a first frequency and supplies the first RF power into the etch reactor, whereas the first frequency is between 100 kilo Hertz (kHz) and 600 kHz. A second RF source generates a second RF power with a second frequency and supplies the second RF power into the etch reactor, whereas the second frequency is at least 10 mega Hertz (MHz).

Abstract: A method for forming etched features in a low-k dielectric layer disposed below the photoresist mask in a plasma processing chamber is provided. Features are etched into the low-k dielectric layer through the photoresist mask. The photoresist mask is stripped, wherein the stripping comprising at least one cycle, wherein each cycle comprises a fluorocarbon stripping phase, comprising flowing a fluorocarbon stripping gas into the plasma processing chamber, forming a plasma from the fluorocarbon stripping gas, and stopping the flow of the fluorocarbon stripping gas into the plasma processing chamber and a reduced fluorocarbon stripping phase, comprising flowing a reduced fluorocarbon stripping gas that has a lower fluorocarbon flow rate than the fluorocarbon stripping gas into the plasma processing chamber, forming the plasma from the reduced fluorocarbon stripping gas, and stopping the flow of the reduced fluorocarbon stripping gas.

Abstract: A method for etching features in a low-k dielectric layer disposed below an organic mask is provided by an embodiment of the invention. Features are etched into the low-k dielectric layer through the organic mask. A fluorocarbon layer is deposited on the low-k dielectric layer. The fluorocarbon layer is cured. The organic mask is stripped.

Abstract: A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.

Abstract: An apparatus for etching a dielectric layer contained by a substrate is provided. An etch reactor comprises a top electrode and a bottom electrode. An etch gas source supplies an etch gas into the etch reactor. A first Radio Frequency (RF) source generates a first RF power with a first frequency and supplies the first RF power into the etch reactor, whereas the first frequency is between 100 kilo Hertz (kHz) and 600 kHz. A second RF source generates a second RF power with a second frequency and supplies the second RF power into the etch reactor, whereas the second frequency is at least 10 mega Hertz (MHz).

Abstract: A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the substance deposited thereupon wherein the substance comprises a transition metal ternary compound, a transition metal quaternary compound, and combinations thereof; reacting the substance with a process gas comprising a fluorine-containing gas and optionally an additive gas to form a volatile product; and removing the volatile product from the substrate to thereby remove the substance from the substrate.

Abstract: A process for the removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance having a dielectric constant greater than silicon dioxide from a substrate by reacting the substance with a reactive agent that comprises at least one member from the group consisting a halogen-containing compound, a boron-containing compound, a hydrogen-containing compound, nitrogen-containing compound, a chelating compound, a carbon-containing compound, a chlorosilane, a hydrochlorosilane, or an organochlorosilane to form a volatile product and removing the volatile product from the substrate to thereby remove the substance from the substrate.