Patents by Inventor Bon-Woong Koo

Bon-Woong Koo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120003760
    Abstract: An ion implantation system and method are disclosed in which glitches in voltage are minimized by modifications to the power system of the implanter. These power supply modifications include faster response time, output filtering, improved glitch detection and removal of voltage blanking. By minimizing glitches, it is possible to produce solar cells with acceptable dose uniformity without having to pause the scan each time a voltage glitch is detected. For example, by shortening the duration of a voltage to about 20-40 milliseconds, dose uniformity within about 3% can be maintained.
    Type: Application
    Filed: June 15, 2011
    Publication date: January 5, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Piotr Lubicki, Bon-Woong Koo
  • Patent number: 8072149
    Abstract: A dual unbalanced indirectly heated cathode (IHC) ion chamber is disclosed. The cathodes have different surface areas, thereby affecting the amount of heat radiated by each. In the preferred embodiment, one cathode is of the size and dimension typically used for IHC ionization, as traditionally used for hot mode operation. The second cathode, preferably located on the opposite wall of the chamber, is of a smaller size. This smaller cathode is still indirectly heated by a filament, but due to its smaller size, radiates less heat into the source chamber, allowing the ion source to operate in cold mode, thereby preserving the molecular structure of the target molecules. In both modes, the unused cathode is preferably biased so as to be at the same potential as the IHC, thus allowing it to act as a repeller.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: December 6, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Jeong-Ha Cho, Bon-Woong Koo, Byung-Yeal Yoon, Yong-Tae Kim, Jeong-Ho Yoon
  • Publication number: 20110240877
    Abstract: An ion source is provided that utilizes a cooling plate and a gap interface to control the temperature of an ion source chamber. The gap interface is defined between the cooling plate and a wall of the chamber. A coolant gas is supplied to the interface at a given pressure where the pressure determines thermal conductivity from the cooling plate to the chamber to control the temperature of the interior of the chamber.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 6, 2011
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor Benveniste, Bon-Woong Koo, Shardul Patel, Frank Sinclair
  • Publication number: 20110240878
    Abstract: An ion source is provided that utilizes the same dopant gas supplied to the chamber to generate the desired process plasma to also provide temperature control of the chamber walls during high throughput operations. The ion source includes a chamber having a wall that defines an interior surface. A liner is disposed within the chamber and has at least one orifice to supply the dopant gas to an inside of the chamber. A gap is defined between at least a portion of the interior surface of the chamber wall and the liner. A first conduit is configured to supply dopant gas to the gap where the dopant gas has a flow rate within the gap. A second conduit is configured to remove the dopant gas from the gap, wherein the flow rate of the dopant gas within the gap acts as a heat transfer media to regulate the temperature of the interior of the chamber.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 6, 2011
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor Benveniste, Bon-Woong Koo, Shardul Patel, Frank Sinclair
  • Publication number: 20110240876
    Abstract: An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 6, 2011
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Frank Sinclair, Costel Biloiu, Bon-Woong Koo, Victor Benveniste, Shardul Patel
  • Patent number: 8003498
    Abstract: Several examples of a method for processing a substrate are disclosed. In a particular embodiment, the method may include: introducing a plurality of first particles to a first region of the substrate so as to form at least one crystal having a grain boundary in the first region without forming another crystal in a second region, the second region adjacent to the first region; and extending the grain boundary of the at least one crystal formed in the first region to the second region after stopping the introducing the plurality of first particles.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: August 23, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Jonathan G. England, Frank Sinclair, John (Bon-Woong) Koo, Rajesh Dorai, Ludovic Godet
  • Patent number: 8003956
    Abstract: An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an aperture. A work piece positioned downstream of the ion source for receiving the extracted ions in the form of an ion beam. A bleed gas channel disposed between the ion source and the work piece. The bleed gas channel supplying a gas used to neutralize the space charge effect associated with the ion beam.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: August 23, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: D. Jeffrey Lischer, John (Bon-Woong) Koo, Peter F. Kurunczi, Shardul Patel, Wilhelm P. Platow
  • Patent number: 7888636
    Abstract: Techniques for measuring energy contamination using time-of-flight (TOF) sensor are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for detecting energy contamination in an ion beam using time-of-flight comprising directing an ion beam towards an entrance of a sensor, wherein the ion beam may include charged particles and neutral particles, blocking the ion beam periodically from entering the sensor and allowing a pulse of the ion beam to enter the sensor periodically using a gate mechanism, separating the charged particles and the neutral particles of the ion beam pulse based at least in part upon different transit times over a distance caused by variations in at least one of mass and energy associated with the charged particles and the neutral particles, and detecting at least one of the charged particles and the neutral particles separately at a detector based at least in part upon the different transit times.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: February 15, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon Woong Koo, Jonathan Gerald England
  • Patent number: 7888662
    Abstract: In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced intothe source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: February 15, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Costel Biloiu, Craig R. Chaney, Eric R. Cobb, Bon-Woong Koo, Wilhelm P. Platow
  • Patent number: 7878145
    Abstract: A plasma ion implantation system includes a process chamber, a source for producing a plasma in the process chamber, a platen for holding a substrate in the process chamber and a pulse source for generating implant pulses for accelerating ions from the plasma into the substrate. In one aspect, the system includes a plasma monitor configured to measure ion mass and energy in the process chamber and an analyzer configured to determine an operating condition of the system in response to the measured mass and energy. In another aspect, the system includes a data acquisition unit configured to acquire samples of the implant pulses and analyzer configured to determine an operating condition of the system based on the acquired samples.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: February 1, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ziwei Fang, Sung-Cheon Ko, Edmund J. Winder, Daniel Distaso, Ludovic Godet, Bon Woong Koo, Jay T. Scheuer
  • Patent number: 7820988
    Abstract: An apparatus and method for ion implantation that include destabilizing the ion beam as it passes through magnetic field, preferably a dipole magnetic field is disclosed. By introducing a bias voltage at certain points within the magnetic field, electrons from the plasma are drawn toward the magnet, thereby causing the ion beam to expand due to space charge effects. The bias voltage can be introduced into the magnet in a region where the magnetic field has only one component. Alternatively, the bias voltage can be in a region wherein the magnetic field has two components.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: October 26, 2010
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor M. Benveniste, Antonella Cucchetti, Bon-Woong Koo
  • Publication number: 20100200768
    Abstract: Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
    Type: Application
    Filed: February 12, 2009
    Publication date: August 12, 2010
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: JAMES BUFF, SVETLANA RADOVANOV, BON-WOONG KOO, WILHELM PLATOW, FRANK SINCLAIR, JEFFREY D. LISCHER, CRAIG CHANEY, STEVEN BORICHEVSKY, ERIC R. COBB, MAYUR JAGTAP, KENNETH PURSER, VICTOR M. BENVENISTE, SHARDUL S. PATEL
  • Publication number: 20100155619
    Abstract: In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamber, thereby reducing the effects of unwanted filament growth in the cathode assembly and extending the manufacturing life of the ion source.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Applicant: Varian Semiconductor Equipment Associates Inc.
    Inventors: John Bon-Woong Koo, David J. Twiss, Chris Campbell, Frank Sinclair, Alexander S. Perel, Craig R. Chaney, Wilhelm P. Platow, Eric R. Cobb
  • Publication number: 20100148088
    Abstract: Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
    Type: Application
    Filed: February 18, 2010
    Publication date: June 17, 2010
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Svetlana Radovanov, Bon-Woong Koo, Frank Sinclair, Victor M. Benveniste
  • Publication number: 20100140077
    Abstract: An ion source that utilizes exited and/or atomic gas injection is disclosed. In an ion beam application, the source gas can be used directly, as it is traditionally supplied. Alternatively or additionally, the source gas can be altered by passing it through a remote plasma source prior to being introduced to the ion source chamber. This can be used to create excited neutrals, heavy ions, metastable molecules or multiply charged ions. In another embodiment, multiple gasses are used, where one or more of the gasses are passed through a remote plasma generator. In certain embodiments, the gasses are combined in a single plasma generator before being supplied to the ion source chamber. In plasma immersion applications, plasma is injected into the process chamber through one or more additional gas injection locations. These injection locations allow the influx of additional plasma, produced by remote plasma sources external to the process chamber.
    Type: Application
    Filed: December 4, 2008
    Publication date: June 10, 2010
    Inventors: Bon-Woong Koo, Victor Benveniste, Christopher A. Rowland, Craig R. Chaney, Frank Sinclair, Neil J. Bassom
  • Patent number: 7723707
    Abstract: Techniques for plasma injection for space charge neutralization of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a plasma injection system for space charge neutralization of an ion beam. The plasma injection system may comprise a first array of magnets and a second array of magnets positioned along at least a portion of an ion beam path, the first array being on a first side of the ion beam path and the second array being on a second side of the ion beam path, the first side opposing the second side. At least two adjacent magnets in the first array of magnets may have opposite polarity. The plasma injection system may also comprise a plasma source configured to generate a plasma in a region associated with a portion of the ion beam path by colliding at least some electrons with a gas.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: May 25, 2010
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor M. Benveniste, Gordon Angel, Bon-Woong Koo, Kourosh Saadatmand
  • Patent number: 7700925
    Abstract: Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: April 20, 2010
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Svetlana Radovanov, Bon Woong Koo, Frank Sinclair, Victor M. Benveniste
  • Publication number: 20100084581
    Abstract: An apparatus and method for ion implantation that include destabilizing the ion beam as it passes through magnetic field, preferably a dipole magnetic field is disclosed. By introducing a bias voltage at certain points within the magnetic field, electrons from the plasma are drawn toward the magnet, thereby causing the ion beam to expand due to space charge effects. The bias voltage can be introduced into the magnet in a region where the magnetic field has only one component. Alternatively, the bias voltage can be in a region wherein the magnetic field has two components.
    Type: Application
    Filed: October 2, 2008
    Publication date: April 8, 2010
    Inventors: Victor M. Benveniste, Antonella Cucchetti, Bon-Woong Koo
  • Publication number: 20100084980
    Abstract: Apparatus and method for improving the plasma uniformity in a plasma based system are described. The apparatus may include a plurality of electrical conductors, to which one or more types of electrical potentials may be applied. The conductors may be arranged in an array and may preferably be positioned near the plasma. By applying the bias voltages to the various electrically conductors, the plasma can be manipulated. For example, the conductors may extract or confine the electrons in the plasma, thereby locally adjusting the plasma density near the conductors. In the process, uniformity of the plasma density or ion concentration in the plasma may be improved. In a further embodiment, a magnetic field is included in the same direction as the electric field created by the bias voltage so as to better confine the charged particles.
    Type: Application
    Filed: October 2, 2008
    Publication date: April 8, 2010
    Inventor: Bon-Woong Koo
  • Publication number: 20100084582
    Abstract: An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an aperture. A work piece positioned downstream of the ion source for receiving the extracted ions in the form of an ion beam. A bleed gas channel disposed between the ion source and the work piece. The bleed gas channel supplying a gas used to neutralize the space charge effect associated with the ion beam.
    Type: Application
    Filed: October 3, 2008
    Publication date: April 8, 2010
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: D. Jeffrey LISCHER, John (Bon-Woong) KOO, Peter F. KURUNCZI, Shardul PATEL, Wilhelm P. PLATOW