Abstract: The present invention relates to a vehicle emergency safety device using a selfie stick, the device comprising: a support which comprises a plurality of poles with different diameters, including first, second, third, and fourth poles, wherein the poles are successively nested in the first pole with the largest diameter and withdrawn therefrom up to a desired length in a telescopic manner; two fixing brackets installed in the lower portion of the support; a joint part installed in the upper portion of the support; a cradle which is installed in the upper portion of the joint part and can be rotated 360 degrees by a second adjusting screw; and a flashing light inserted into and fixed to the cradle.

Abstract: Embodiments of the present disclosure provide an optical assembly for high speed optical communications by combining a cover assembly including a lens and a cover post with a body assembly including a lens, reflection prism and body hole, which takes only a few passive optical alignments for providing aligned optical elements that have required multiple complex and sophisticated processes.

Abstract: Embodiments according to the present disclosure relate to an optical transmitting device and an optical receiving device which can minimize the alignment error between the light source and the photodetector on the substrate, miniaturize the devices, and require no separate guide member reducing manufacturing costs, while satisfying the design requirements for sub-miniaturization, and performing optical transmission and reception more efficiently.

Abstract: A substrate includes a pattern forming region and a peripheral region. A first strain relaxed buffer layer is disposed on the pattern forming region of the substrate. A second strain relaxed buffer layer is disposed on the peripheral region of the substrate. A first insulating film pattern is disposed on the substrate. At least a portion of the first insulating film pattern is disposed within the first strain relaxed buffer layer. An upper surface of the first insulating film pattern is covered with the first strain relaxed buffer layer. A second insulating film pattern is disposed on the substrate. At least a portion of the second insulating film pattern is disposed within the second strain relaxed buffer layer. An upper surface of the second insulating film pattern is covered with the second strain relaxed buffer layer. A gate electrode is disposed on the first strain relaxed buffer layer.

Abstract: The present invention relates to a vehicle emergency safety device using a selfie stick, the device comprising: a support which comprises a plurality of poles with different diameters, including first, second, third, and fourth poles, wherein the poles are successively nested in the first pole with the largest diameter and withdrawn therefrom up to a desired length in a telescopic manner; two fixing brackets installed in the lower portion of the support; a joint part installed in the upper portion of the support; a cradle which is installed in the upper portion of the joint part and can be rotated 360 degrees by a second adjusting screw; and a flashing light inserted into and fixed to the cradle.

Abstract: Embodiments of the present disclosure provide an optical assembly for high speed optical communications by combining a cover assembly including a lens and a cover post with a body assembly including a lens, reflection prism and body hole, which takes only a few passive optical alignments for providing aligned optical elements that have required multiple complex and sophisticated processes.

Abstract: Embodiments according to the present disclosure relate to an optical transmitting device and an optical receiving device which can minimize the alignment error between the light source and the photodetector on the substrate, miniaturize the devices, and require no separate guide member reducing manufacturing costs, while satisfying the design requirements for sub-miniaturization, and performing optical transmission and reception more efficiently.

Abstract: A substrate includes a pattern forming region and a peripheral region. A first strain relaxed buffer layer is disposed on the pattern forming region of the substrate. A second strain relaxed buffer layer is disposed on the peripheral region of the substrate. A first insulating film pattern is disposed on the substrate. At least a portion of the first insulating film pattern is disposed within the first strain relaxed buffer layer. An upper surface of the first insulating film pattern is covered with the first strain relaxed buffer layer. A second insulating film pattern is disposed on the substrate. At least a portion of the second insulating film pattern is disposed within the second strain relaxed buffer layer. An upper surface of the second insulating film pattern is covered with the second strain relaxed buffer layer. A gate electrode is disposed on the first strain relaxed buffer layer.

Abstract: An optical transceiver device includes a baseplate including a set position for mounting an optical element, an alignment plate including a mounting unit, a first and a second reference hole. The device includes an optical-fiber fixing block configured to fixedly mount at least one of a lens unit and an optical fiber optically linked with the optical element and to include a first and a second post, and a housing for enclosing the optical-fiber fixing block and alignment plate. The second post is inserted into the second reference hole in a looser manner than inserting the first post into the first reference hole, and the set position is determined by a first baseline passing through the first and the second reference hole and by a second baseline intersecting with the first baseline and positioned on opposite side of the second reference hole with respect to the first reference hole.

Abstract: The present invention relates to a composition for treatment or metastasis suppression of cancers which includes a p34 expression inhibitor or activity inhibitor as an active ingredient. According to the present invention, the p34 protein knock-down causes monoubiquitination of PTEN and accordingly nuclear localization of PTEN is induced, as a result, an Akt pathway which is related to survival, proliferation, invasive properties and metastatic properties of tumors is inhibited, and thus there is an effect of significantly reducing clonogenic potential and tumor forming potential of various cancer cells which simultaneously express PTEN and NEDD4-1. Consequently, the p34 gene expression inhibitor or p34 protein activity inhibitor according to the present invention can be effectively used as a treatment agent or a metastasis suppression agent for cancers.

Abstract: An optical transceiver device includes a baseplate including a set position for mounting an optical element, an alignment plate including a mounting unit, a first and a second reference hole. The device includes an optical-fiber fixing block configured to fixedly mount at least one of a lens unit and an optical fiber optically linked with the optical element and to include a first and a second post, and a housing for enclosing the optical-fiber fixing block and alignment plate. The second post is inserted into the second reference hole in a looser manner than inserting the first post into the first reference hole, and the set position is determined by a first baseline passing through the first and the second reference hole and by a second baseline intersecting with the first baseline and positioned on opposite side of the second reference hole with respect to the first reference hole.

Abstract: A method for fabricating a semiconductor device is provided, which includes forming a first mask pattern and a second mask pattern on a first layer, forming a block mask that covers the second mask pattern on the first layer, forming first spacers on side walls of the first mask pattern, exposing the second mask pattern through removal of the first mask pattern and the block mask, forming a third mask pattern and a fourth mask pattern through etching of the first layer using the first spacers and the second mask pattern as etch masks, and forming second spacers and third spacers on side walls of the third mask pattern and side walls of the fourth mask pattern, respectively.

Abstract: A method for fabricating a semiconductor device is provided, which includes forming a first mask pattern and a second mask pattern on a first layer, forming a block mask that covers the second mask pattern on the first layer, forming first spacers on side walls of the first mask pattern, exposing the second mask pattern through removal of the first mask pattern and the block mask, forming a third mask pattern and a fourth mask pattern through etching of the first layer using the first spacers and the second mask pattern as etch masks, and forming second spacers and third spacers on side walls of the third mask pattern and side walls of the fourth mask pattern, respectively.

Abstract: A method of forming patterns of a semiconductor device includes sequentially forming first to third mask layers on a substrate including a first region and a second region, etching the third mask layer formed in the first region to form first mask elements of a first mask pattern, etching the third mask layer formed in the second region to form second mask elements of a second mask pattern, forming a first spacer film covering the second mask elements, forming a second spacer film on the first spacer film to fully fill at least one trench between the second mask elements and on the first mask elements, removing portions of the first and second spacer films to expose the upper surfaces of the first and second mask elements, etching the second mask layer, etching the first mask layer, and etching the substrate.

Abstract: Disclosed is a thermal treatment system which enables a uniform temperature distribution and a uniform concentration distribution of reaction gas in an entire reaction space for a thermal treatment process, a method of performing a thermal treatment, and a method of manufacturing a CIGS solar cell using the same, wherein the thermal treatment system may include a reaction chamber with a reaction space, an external chamber surrounding the reaction chamber, a door chamber provided to open or close the reaction space of the reaction chamber, and an air flow adjusting apparatus for circulation of an flow inside the reaction space of the reaction chamber, wherein the air flow adjusting apparatus includes a driving axis, an air flow suction unit connected with the driving axis, and an air flow discharging unit connected with the air flow suction unit.

Abstract: A structure for aligning an optical element includes a baseplate including a set position for mounting at least one optical element, a first reference hole, and a second reference hole spaced by a first distance from the first reference hole. The set position is determined by a first baseline that passes the first reference hole and the second reference hole and a second baseline that intersects with the first baseline at a second distance from the first reference hole on an opposite side to the second reference hole with respect to the first reference hole. The second distance is shorter than the first distance.

Abstract: The present invention relates to a composition for treatment or metastasis suppression of cancers which includes a p34 expression inhibitor or activity inhibitor as an active ingredient. According to the present invention, the p34 protein knock-down causes monoubiquitination of PTEN and accordingly nuclear localization of PTEN is induced, as a result, an Akt pathway which is related to survival, proliferation, invasive properties and metastatic properties of tumors is inhibited, and thus there is an effect of significantly reducing clonogenic potential and tumor forming potential of various cancer cells which simultaneously express PTEN and NEDD4-1. Consequently, the p34 gene expression inhibitor or p34 protein activity inhibitor according to the present invention can be effectively used as a treatment agent or a metastasis suppression agent for cancers.

Abstract: Disclosed is a thermal treatment system which enables a uniform temperature distribution and a uniform concentration distribution of reaction gas in an entire reaction space for a thermal treatment process, a method of performing a thermal treatment, and a method of manufacturing a CIGS solar cell using the same, wherein the thermal treatment system may include a reaction chamber with a reaction space, an external chamber surrounding the reaction chamber, a door chamber provided to open or close the reaction space of the reaction chamber, and an air flow adjusting apparatus for circulation of an flow inside the reaction space of the reaction chamber, wherein the air flow adjusting apparatus includes a driving axis, an air flow suction unit connected with the driving axis, and an air flow discharging unit connected with the air flow suction unit.

Abstract: The present disclosure provides an AC-direct-type LED-lighting device including compensation circuit for AC input compensation, including a compensation inductor and first compensation capacitor parallelly connected to one terminal of AC input and a second compensation capacitor connected in series; rectifying unit for rectifying output from second compensation capacitor terminals to obtain direct current; and LED array driven by the rectifying unit output, wherein capacities of the first and second compensation capacitors and the compensation inductor and LED array output voltage are determined to cause 0.9 or larger cosine value of a phase, with respect to the AC input voltage, of resulting current obtained by dividing AC input voltage by sum of (i) parallel value of an equivalent impedance Re of the rectifying unit and LED array and an impedance of the second compensation capacitor and (ii) parallel value of impedances of the compensation inductor and first compensation capacitor.

Abstract: A structure for aligning an optical element includes a baseplate including a set position for mounting at least one optical element, a first reference hole, and a second reference hole spaced by a first distance from the first reference hole. The set position is determined by a first baseline that passes the first reference hole and the second reference hole and a second baseline that intersects with the first baseline at a second distance from the first reference hole on an opposite side to the second reference hole with respect to the first reference hole. The second distance is shorter than the first distance.