Patents by Inventor Boris Habets

Boris Habets has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment calculation
    Patent number: 8440475
    Abstract: Alignment data from an exposure tool suitable for exposing a plurality of semiconductor wafers are provided, the alignment data including alignment values applied by the exposure tool to respective ones of the plurality of semiconductor wafers at a plurality of measured positions.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: May 14, 2013
    Assignee: Qimonda AG
    Inventors: Boris Habets, Michiel Kupers, Wolfgang Henke
  • Systems and methods of alternative overlay calculation
    Patent number: 7783444
    Abstract: Methods and systems of alternative overlay calculation and of calculating overlay stability based on alternative overlay settings in a fabrication unit, and a computer readable medium are disclosed being capable of calculating alternative overlay error values based on alignment model parameters, alternative alignment model parameters, and overlay error values for a plurality of measurement positions.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: August 24, 2010
    Assignee: Qimonda AG
    Inventors: Boris Habets, Michiel Kupers
  • Alignment Calculation
    Publication number: 20100030360
    Abstract: Alignment data from an exposure tool suitable for exposing a plurality of semiconductor wafers are provided, the alignment data including alignment values applied by the exposure tool to respective ones of the plurality of semiconductor wafers at a plurality of measured positions.
    Type: Application
    Filed: August 1, 2008
    Publication date: February 4, 2010
    Inventors: Boris Habets, Michiel Kupers, Wolfgang Henke
  • Systems and Methods of Alternative Overlay Calculation
    Publication number: 20090248337
    Abstract: Methods and systems of alternative overlay calculation and of calculating overlay stability based on alternative overlay settings in a fabrication unit, and a computer readable medium are disclosed being capable of calculating alternative overlay error values based on alignment model parameters, alternative alignment model parameters, and overlay error values for a plurality of measurement positions.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 1, 2009
    Inventors: Boris Habets, Michiel Kupers
  • Method and system for determining deformations on a substrate
    Publication number: 20080182344
    Abstract: A method and system determines deformations in a substrate in the manufacturing of semiconductor devices. At least one property of vertical deformations of the substrate is measured at a plurality of locations on the substrate. Afterward, an automatic computation of horizontal deformations is determined based on the measured properties of vertical deformations with a model for the deformation behavior of the substrate.
    Type: Application
    Filed: January 30, 2007
    Publication date: July 31, 2008
    Inventors: Steffen Mueller, Alfred Kersch, Boris Habets, Michael Stadtmueller, Thomas Hecht