Abstract: A method provides a gate structure for a plurality of components of a semiconductor device. A silicate layer is provided. In one aspect, the silicate layer is provided on a channel of a CMOS device. A high dielectric constant layer is provided on the silicate layer. The method also includes providing a work function metal layer on the high dielectric constant layer. A low temperature anneal is performed after the high dielectric constant layer is provided. A contact metal layer is provided on the work function metal layer.

Abstract: A computing cell and method for performing a digital XNOR of an input signal and weights are described. The computing cell includes at least one pair of FE-FETs and a plurality of selection transistors. The pair(s) of FE-FETs are coupled with a plurality of input lines and store the weight. Each pair of FE-FETs includes a first FE-FET that receives the input signal and stores a first weight and a second FE-FET that receives the input signal complement and stores a second weight. The selection transistors are coupled with the pair of FE-FETs.

Abstract: A field effect transistor includes a fin having a stack of nanowire-like channel regions including at least first and a second nanowire-like channel regions, source and drain electrodes on opposite sides of the fin, a dielectric separation region including a dielectric material between the first and second nanowire-like channel regions, and a gate stack extending along a pair of sidewalls of the stack of nanowire-like channel regions. The dielectric separation region extending completely from a surface of the second nanowire-like channel region facing the first nanowire-like channel region to a surface of the first nanowire-like channel region facing the second nanowire-like channel region. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The metal layer of the gate stack does not extend between the first and second nanowire-like channel regions.

Abstract: A CMOS system on chip including a series of partial gate-all-around field effect transistors. Each partial GAA FET includes a fin having a stack of channel regions, source and drain regions on opposite sides of the fin, a dielectric separation region including a dielectric material between first and second channel regions, a gate stack on the fin, and a pair of sidewall spacers on opposite sides of the gate stack. A portion of the dielectric separation region has a length from an outer edge of the dielectric separation region to an inner edge of a respective sidewall spacer. The length of the portion of the dielectric separation region of one of the partial GAA FETs is different than the length of the portion of the dielectric separation region of another one of the partial GAA FETs.

Abstract: A CMOS circuit includes a partial GAA nFET and a partial GAA pFET. The nFET and the pFET each include a fin including a stack of nanowire-like channel regions and a dielectric separation region extending completely between first and second nanowire-like channel regions of the stack. The nFET and the pFET each also include a source electrode and a drain electrode on opposite sides of the fin, and a gate stack extending along a pair of sidewalls of the stack of nanowire-like channel regions. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The metal layer does not extend between the first and second nanowire-like channel regions. The channel heights of the nanowire-like channel regions of the partial GAA nFET and the partial GAA pFET are different.

Abstract: A weight cell including first and second bi-directional memory elements each configured to switch between a first resistance state and a second resistance state different than the first resistance state. A first input line is connected to a first terminal of the first bi-directional memory element, and a second input line is connected to the first terminal of the second bi-directional memory element. A first diode in forward bias connects the second terminal of the first bi-directional memory element to a first output line, a second diode in reverse bias connects the second terminal of the second bi-directional memory element to a second output line, a third diode in reverse bias connects the second terminal of the first bi-directional memory element to the second output line, and a fourth diode in forward bias connects the second terminal of the second bi-directional memory element to the first output line.

Abstract: Methods of forming a semiconductor device are provided. The methods may include forming a plurality of fin-shaped channels on a substrate, forming a gate structure crossing over the plurality of fin-shaped channels and forming a source/drain adjacent a side of the gate structure. The source/drain may cross over the plurality of fin-shaped channels and may be electrically connected to the plurality of fin-shaped channels. The methods may also include forming a metallic layer on an upper surface of the source/drain and forming a conductive contact on the metallic layer opposite the source/drain. The conductive contact may have a first length in a longitudinal direction of the metallic layer that is less than a second length of the metallic layer in the longitudinal direction of the metallic layer.

Abstract: A method for providing a semiconductor device is described. The method provides a plurality of fins. A first portion of each of the plurality of fins is covered by a mask. A second portion of each of the plurality of fins is exposed by the mask. The method also performs an anneal in a volume-increasing ambient, such as hydrogen, at anneal temperature(s) above one hundred degrees Celsius and not more than six hundred degrees Celsius. The second portion of each of the fins is exposed during the anneal such that the second portion of each of the fins undergoes a volume expansion.

Abstract: A field effect transistor (FET) for an nFET and/or a pFET device including a substrate and a fin including at least one channel region decoupled from the substrate. The FET also includes a source electrode and a drain electrode on opposite sides of the fin, and a gate stack extending along a pair of sidewalls of the channel region of the fin. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The FET also includes an oxide separation region separating the channel region of the fin from the substrate. The oxide separation region includes a dielectric material that includes a portion of the gate dielectric layer of the gate stack. The oxide separation region extends completely from a surface of the channel region facing the substrate to a surface of the substrate facing the channel region.

Abstract: A method for providing a semiconductor device and the device so formed are described. A doped semiconductor layer is deposited on a semiconductor underlayer. At least a portion of the semiconductor underlayer is exposed. A dopant for the doped semiconductor layer is selected from a p-type dopant and an n-type dopant. An ultraviolet-assisted low temperature (UVLT) anneal of the doped semiconductor layer is performed in an ambient. The ambient is selected from an oxidizing ambient and a nitriding ambient. The oxidizing ambient is used for the n-type dopant. The nitriding ambient is used for the p-type dopant. A sacrificial layer is formed by the doped semiconductor layer during the UVLT anneal. The dopant is driven into the portion of the semiconductor underlayer from the doped semiconductor layer by the UVLT anneal, thereby forming a doped semiconductor underlayer. The sacrificial layer is then removed.

Abstract: A hardware cell and method for performing a digital XNOR of an input signal and weights are described. The hardware cell includes input lines, a plurality of pairs of magnetic junctions, output transistors and at least one selection transistor coupled with the output transistors. The input lines receive the input signal and its complement. The magnetic junctions store the weight. Each magnetic junction includes a reference layer, a free layer and a nonmagnetic spacer layer between the reference layer and the free layer. The free layer has stable magnetic states and is programmable using spin-transfer torque and/or spin-orbit interaction torque. The first magnetic junction of a pair receives the input signal. The second magnetic junction of the pair receives the input signal complement. The output transistors are coupled with the magnetic junctions such that each pair of magnetic junctions forms a voltage divider. The output transistors form a sense amplifier.

Abstract: A method provides a gate structure for a plurality of components of a semiconductor device. A silicate layer is provided. In one aspect, the silicate layer is provided on a channel of a CMOS device. A high dielectric constant layer is provided on the silicate layer. The method also includes providing a work function metal layer on the high dielectric constant layer. A low temperature anneal is performed after the high dielectric constant layer is provided. A contact metal layer is provided on the work function metal layer.

Abstract: A hardware device and method for performing a multiply-accumulate operation are described. The device includes inputs lines, weight cells and output lines. The input lines receive input signals, each of which is has a magnitude and a phase and can represent a complex value. The weight cells couple the input lines with the output lines. Each of the weight cells has an electrical admittance corresponding to a weight. The electrical admittance is programmable and capable of being complex valued. The input lines, the weight cells and the output lines form a crossbar array. Each of the output lines provides an output signal. The output signal for an output line is a sum of an input signal for each of the input lines connected to the output line multiplied by the electrical admittance of each of the weight cells connecting the input lines to the output line.

Abstract: A memory device and method for providing the memory device are described. The memory device includes word lines, a first plurality of bit lines, a second plurality of bit lines and selectorless memory cells. Each selectorless memory cell is coupled with a word line, a first bit line of the first plurality of bit lines and a second bit line of the second plurality of bit lines. The selectorless memory cell includes first and second magnetic junctions. The first and second magnetic junctions are each programmable using a spin-orbit interaction torque. The word line is coupled between the first and second magnetic junctions. The first and second bit lines are coupled with the first and second magnetic junctions, respectively. The selectorless memory cell is selected for a write operation based on voltages in the word line, the first bit line and the second bit line.

Abstract: A field effect transistor (FET) for an nFET and/or a pFET device including a substrate and a fin including at least one channel region decoupled from the substrate. The FET also includes a source electrode and a drain electrode on opposite sides of the fin, and a gate stack extending along a pair of sidewalls of the channel region of the fin. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The FET also includes an oxide separation region separating the channel region of the fin from the substrate. The oxide separation region includes a dielectric material that includes a portion of the gate dielectric layer of the gate stack. The oxide separation region extends completely from a surface of the channel region facing the substrate to a surface of the substrate facing the channel region.

Abstract: A neuromorphic architecture for providing variable precision in a neural network, through programming. Logical pre-synaptic neurons are formed as configurable sets of physical pre-synaptic artificial neurons, logical post-synaptic neurons are formed as configurable sets of physical post-synaptic artificial neurons, and the logical pre-synaptic neurons are connected to the logical post-synaptic neurons by logical synapses each including a set of physical artificial synapses. The precision of the weights of the logical synapses may be varied by varying the number of physical pre-synaptic artificial neurons in each of the logical pre-synaptic neurons, and/or by varying the number of physical post-synaptic artificial neurons in each of the logical post-synaptic neurons.

Abstract: A neuromorphic multi-bit digital weight cell configured to store a series of potential weights for a neuron in an artificial neural network. The neuromorphic multi-bit digital weight cell includes a parallel cell including a series of passive resistors in parallel and a series of gating transistors. Each gating transistor of the series of gating transistors is in series with one passive resistor of the series of passive resistors. The neuromorphic cell also includes a series of programming input lines connected to the series of gating transistors, an input terminal connected to the parallel cell, and an output terminal connected to the parallel cell.

Abstract: Exemplary embodiments provide for fabricating a nanosheet stack structure having one or more sub-stacks.

Abstract: A semiconductor device including: a substrate; a first active layer on the substrate and including a first channel between a source and a drain; a second active layer stacked on the first active layer, the second active layer including a second channel between the source and the drain; a first gate corresponding to the first channel; and a second gate electrically separated from the first gate and corresponding to the second channel.

Abstract: A finFET device can include a source/drain contact recess having an optimal depth beyond which an incremental decrease in a spreading resistance value for a horizontal portion of a source/drain contact in the recess provided by increased depth may be less than an incremental increase in total resistance due to the increase in the vertical portion of the source/drain contact at the increased depth.