Abstract: Disclosed herein are a processing chamber and a method for processing a SiC substrate. The processing chamber includes a gas showerhead; a susceptor disposed below the gas showerhead, the gas showerhead configured to flow a process gas toward the susceptor; a protective region disposed below the susceptor; and a heating assembly having a front side facing directly a backside of the susceptor. The heat assembly further includes a plurality of lamps. Both the backside of the susceptor and the front side of the heating assembly are exposed to the protective region. The lamps are also exposed to the protective region. The processing chamber includes a chamber body formed by a lid shielded by a lid liner, an upper side section shielded by a side liner, a lower side section, and a bottom section. The lid includes cooling channels. The upper side section also includes cooling channels.

Abstract: Disclosed herein are a warpage control method and system for warpage control included in a processing chamber. The warpage control method includes heating a substrate by a heating assembly comprising a plurality of independently controllable heating zones, measuring a backside temperature of a susceptor based on radiation at a first wavelength, measuring a topside temperature of the substrate based on radiation at a second wavelength, measuring a curvature of the substrate based on radiation at a third wavelength, and controlling the heating assembly based on the backside temperature, the topside temperature, and the curvature. The warpage control system includes a first thermal sensor and an warp sensor disposed above a substrate, a second thermal sensor disposed below the substrate, a heating assembly, and a controller coupled with the heating assembly, the first thermal sensor, the second thermal sensor, and the warp sensor for controlling the warpage of the substrate.

Abstract: Disclosed herein are a reflector apparatus for a heating assembly, and a method for operating the heating assembly. The reflector apparatus includes a base that has a first side having openings for radiation to pass through, a second side opposite to the first side, and a side wall extending between the first side and the second side. The reflector apparatus further includes a first reflector pocket disposed between the first side and the second side of the base and having a first reflector portion. The first reflector portion may include a wavy section having a Fresnel shape. A first reflector cooling chamber encases the first reflector portion and the wavy section. The method includes operating a heating lamp disposed in a reflector pocket at a power of at least 600 W and circulating a coolant within a reflector cooling chamber to cool the heating lamp.

Abstract: Embodiments are directed to a remote plasma system. In an example, a remote plasma system includes a first tube, a second tube, a first isolation component coupled between a first end of the first tube and a first end of the second tube, a second isolation component coupled between a second end of the first tube and a second end of the second tube, and a first capacitive element coupled to the first isolation component. In one example, the second tube and the first tube together can have a circular or oval shape. In one example, a first magnetic core is surrounding a portion of the first tube proximate the first isolation component, a second magnetic core is surrounding a portion of the first tube proximate the second isolation component, a third magnetic core is surrounding a portion of the second tube proximate the first isolation component, and a fourth magnetic core is surrounding a portion of the second tube proximate the second isolation component.

Abstract: Systems and methods of predicting performance of one or more wind turbines are provided. Exemplary methods include entering data inputs and analyzing and estimating the data inputs. The data inputs include nacelle position information and/or wind condition information. A wake model is determined based on the analysis and estimating of the data inputs. Wind turbine behavior predictions are generated including predicted power outputs of the wind turbines and predicted effects of waking on the predicted power outputs. The data inputs can be adjusted to improve the wind turbine behavior predictions, and the wake model can be corrected by machine learning. By focusing on an observable quantity—power—based on other observable quantities like wind speed, yaw error, nacelle position, disclosed embodiments enable optimization to start immediately after the hardware and software are installed, and as the controller operates more in the field, additional training and validation data are collected.

Abstract: A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit.

Abstract: Systems and methods are described for automated, user-configurable, unique, hyper personalized and specific to the engagement, objective and/or transaction, rules based human and machine workflow management system. Systems, machine learning, artificial intelligence, and/or natural language processing can be used to identify, review, score, filter, display and categorize various forms of content, communications and collaborations. Human and machine review participants can be automatically provided content for review in a specific subject matter or topic. Distributed ledgers, centralized databases, and/or other computerized machine technologies, can help provide secure attribution and authentication of content as well as management of content review, publishing, editing, collaboration, and compensation contracts. User-configurable transparent scoring of all human, machine and organizations activities provide basis for communications, engagement, collaboration, compensation and terms.

Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.

Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.

Abstract: Systems and methods are described for automated, user-configurable, unique, hyper personalized and specific to the engagement, objective and/or transaction, rules based human and machine workflow management system. Systems, machine learning, artificial intelligence, and/or natural language processing can be used to identify, review, score, filter, display and categorize various forms of content, communications and collaborations. Human and machine review participants can be automatically provided content for review in a specific subject matter or topic. Distributed ledgers, centralized databases, and/or other computerized machine technologies, can help provide secure attribution and authentication of content as well as management of content review, publishing, editing, collaboration, and compensation contracts. User-configurable transparent scoring of all human, machine and organizations activities provide basis for communications, engagement, collaboration, compensation and terms.

Abstract: A reactor for chemical vapor deposition is equipped with an IR radiation compensating susceptor assembly that supports one or more semiconductor substrates above linear IR heater lamps arranged in a parallel array. A set of primary IR radiation reflectors beneath the lamps directs IR radiation back toward the susceptor in a pattern selected to provide uniform IR irradiation of the susceptor assembly to thereby uniformly heat the substrates. Secondary IR shield reflectors may be provided in selected patterns on the underside of the susceptor assembly as a fine tuning measure to direct IR radiation away from the assembly in a controlled pattern. The combined IR radiation reflectors have an IR signature that compensates for any non-uniform heating profile created by the linear IR heater lamp array. The heating profile of the lamp array might also be tailored in order to reduce the amount of compensation required to be supplied by the IR reflectors.

Abstract: Apparatus for qualification and repair of multi-filament tow are provided herein. In some embodiments, an apparatus in for inspecting and repairing a multi-filament tow includes a first spool having a multi-filament tow wound on the first spool; a first tow tensioner following the first spool to impart a predetermined tension on the multi-filament tow; a de-sizing chamber comprising a heater to heat the multi-filament tow to a first temperature suitable for removing a coating on the multi-filament tow; an inspection chamber configured to inspect the multi-filament tow for defects; a repair chamber configured to repair the defects in the multi-filament tow; a second tow tensioner following the repair chamber to impart a predetermined tension on the multi-filament tow; and a second spool following the second tow tensioner to collect the multi-filament tow.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: A reactor for chemical vapor deposition is equipped with an IR radiation compensating susceptor assembly that supports one or more semiconductor substrates above linear IR heater lamps arranged in a parallel array. A set of primary IR radiation reflectors beneath the lamps directs IR radiation back toward the susceptor in a pattern selected to provide uniform IR irradiation of the susceptor assembly to thereby uniformly heat the substrates. Secondary IR shield reflectors may be provided in selected patterns on the underside of the susceptor assembly as a fine tuning measure to direct IR radiation away from the assembly in a controlled pattern. The combined IR radiation reflectors have an IR signature that compensates for any non-uniform heating profile created by the linear IR heater lamp array. The heating profile of the lamp array might also be tailored in order to reduce the amount of compensation required to be supplied by the IR reflectors.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: A fastener system and method for supporting and retaining modular insulating quartz liners with gas apertures in close proximity to corresponding apertures in diffusers of gas showerheads. Tubular fasteners have a head, a tubular shank and a foot that extend through a liner plate nozzle into a diffuser plate. A keyway in the gas diffuser, aligned and coaxial with a diffuser nozzle, allows the foot to reach an arcuate concourse through a keyway where it can be locked by bayonet turning. The keyway is machined into the diffuser by EDM and is an inversion of the fastener tip geometry rotated about the axis of the tubular shank. Each fastener and nozzle set form a coaxial path for distributing processing gas to substrates through liner and diffuser plates from a plenum in showerheads of a MOCVD reactor.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.