Abstract: Systems and methods are described for automated, user-configurable, unique, hyper personalized and specific to the engagement, objective and/or transaction, rules based human and machine workflow management system. Systems, machine learning, artificial intelligence, and/or natural language processing can be used to identify, review, score, filter, display and categorize various forms of content, communications and collaborations. Human and machine review participants can be automatically provided content for review in a specific subject matter or topic. Distributed ledgers, centralized databases, and/or other computerized machine technologies, can help provide secure attribution and authentication of content as well as management of content review, publishing, editing, collaboration, and compensation contracts. User-configurable transparent scoring of all human, machine and organizations activities provide basis for communications, engagement, collaboration, compensation and terms.

Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.

Abstract: A gas booster for increasing a pressure of a gas includes a gas cylinder and a drive. The gas cylinder defines a chamber having an inlet and an outlet. A piston is actuatable within the gas cylinder to draw gas into the chamber through the inlet at a first pressure and to push the gas out of the chamber through the outlet at a second pressure that is higher than the first pressure. The drive includes an electric motor coupled to the piston of the gas cylinder by a mechanical connection to actuate the piston.

Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.

Abstract: Systems and methods are described for automated, user-configurable, unique, hyper personalized and specific to the engagement, objective and/or transaction, rules based human and machine workflow management system. Systems, machine learning, artificial intelligence, and/or natural language processing can be used to identify, review, score, filter, display and categorize various forms of content, communications and collaborations. Human and machine review participants can be automatically provided content for review in a specific subject matter or topic. Distributed ledgers, centralized databases, and/or other computerized machine technologies, can help provide secure attribution and authentication of content as well as management of content review, publishing, editing, collaboration, and compensation contracts. User-configurable transparent scoring of all human, machine and organizations activities provide basis for communications, engagement, collaboration, compensation and terms.

Abstract: A reactor for chemical vapor deposition is equipped with an IR radiation compensating susceptor assembly that supports one or more semiconductor substrates above linear IR heater lamps arranged in a parallel array. A set of primary IR radiation reflectors beneath the lamps directs IR radiation back toward the susceptor in a pattern selected to provide uniform IR irradiation of the susceptor assembly to thereby uniformly heat the substrates. Secondary IR shield reflectors may be provided in selected patterns on the underside of the susceptor assembly as a fine tuning measure to direct IR radiation away from the assembly in a controlled pattern. The combined IR radiation reflectors have an IR signature that compensates for any non-uniform heating profile created by the linear IR heater lamp array. The heating profile of the lamp array might also be tailored in order to reduce the amount of compensation required to be supplied by the IR reflectors.

Abstract: Apparatus for qualification and repair of multi-filament tow are provided herein. In some embodiments, an apparatus in for inspecting and repairing a multi-filament tow includes a first spool having a multi-filament tow wound on the first spool; a first tow tensioner following the first spool to impart a predetermined tension on the multi-filament tow; a de-sizing chamber comprising a heater to heat the multi-filament tow to a first temperature suitable for removing a coating on the multi-filament tow; an inspection chamber configured to inspect the multi-filament tow for defects; a repair chamber configured to repair the defects in the multi-filament tow; a second tow tensioner following the repair chamber to impart a predetermined tension on the multi-filament tow; and a second spool following the second tow tensioner to collect the multi-filament tow.

Abstract: A gas booster for increasing a pressure of a gas includes a gas cylinder and a drive. The gas cylinder defines a chamber having an inlet and an outlet. A piston is actuatable within the gas cylinder to draw gas into the chamber through the inlet at a first pressure and to push the gas out of the chamber through the outlet at a second pressure that is higher than the first pressure. The drive includes an electric motor coupled to the piston of the gas cylinder by a mechanical connection to actuate the piston.

Abstract: A method and system are described for a gas booster, preferably for use with hydrogen. A linear actuator can provide compression in first and second compression vessels. The liner of the compression vessels can be placed in compressive stress so that any cracks that form do not spread. Compressive stress can be applied using, at least, a shrink fit process or a wire wrapping process. The compressive stress will help the inner liner to resist fatigue and cracking due to pressure cycling and corrosion by materials being compressed in the compression vessels. This also protects the chamber jacket from wear and tear.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: A reactor for chemical vapor deposition is equipped with an IR radiation compensating susceptor assembly that supports one or more semiconductor substrates above linear IR heater lamps arranged in a parallel array. A set of primary IR radiation reflectors beneath the lamps directs IR radiation back toward the susceptor in a pattern selected to provide uniform IR irradiation of the susceptor assembly to thereby uniformly heat the substrates. Secondary IR shield reflectors may be provided in selected patterns on the underside of the susceptor assembly as a fine tuning measure to direct IR radiation away from the assembly in a controlled pattern. The combined IR radiation reflectors have an IR signature that compensates for any non-uniform heating profile created by the linear IR heater lamp array. The heating profile of the lamp array might also be tailored in order to reduce the amount of compensation required to be supplied by the IR reflectors.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: A fastener system and method for supporting and retaining modular insulating quartz liners with gas apertures in close proximity to corresponding apertures in diffusers of gas showerheads. Tubular fasteners have a head, a tubular shank and a foot that extend through a liner plate nozzle into a diffuser plate. A keyway in the gas diffuser, aligned and coaxial with a diffuser nozzle, allows the foot to reach an arcuate concourse through a keyway where it can be locked by bayonet turning. The keyway is machined into the diffuser by EDM and is an inversion of the fastener tip geometry rotated about the axis of the tubular shank. Each fastener and nozzle set form a coaxial path for distributing processing gas to substrates through liner and diffuser plates from a plenum in showerheads of a MOCVD reactor.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

Abstract: Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.

Abstract: A method and system of streaming media content is disclosed. The method and system includes a process step and structures for inputting the live feed into a first audio card having an output. Another process step and structures are provided for inputting the output of the first audio card into a FIFO buffer having an output. Another process step and structures are provided for inputting the output of the FIFO buffer into a virtual audio card having an output. Another process step and structures are provided for inserting additional content into a second audio card by replacing content to be substituted where the additional content and the content to be replaced do not have to be of the same duration. Another process step and structures are provided for mixing the output from the first audio card and the additional content by the second audio card to provide a mixed output. Another process step and structures are provided for inputting the mixed output of the second audio card into an encoder having an output.