Patents by Inventor Bum-Gyu Choi

Bum-Gyu Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7910664
    Abstract: Disclosed is a novel radially multi-branched polymer. The radially multi-branched polymer includes a central molecule to which side-branches are bonded in at least three positions and has an average molecular weight of 500 to 100,000, the side-branch being selected from the group consisting of a polyalkylene oxide, a polyacrylate, a polyester, a polyamide and derivatives thereof. The radially multi-branched polymer is used for manufacturing a low dielectric insulating film to provide a low dielectric insulating film having easily controllable micropores.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: March 22, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Jae Ho Cheong, Gwi Gwon Kang, Min Jin Ko, Jung Won Kang, Myung Sun Moon, Byung Ro Kim, Bum Gyu Choi, Dae Ho Kang, Jeong Man Son
  • Patent number: 7834119
    Abstract: The present invention relates to an organic silicate polymer prepared by mixing silane compound with organic solvent to prepare a first mixture, and hydrolyzing and condensing the first mixture by adding water and catalyst, the first mixture being selected from a group consisting of oxidized hydrosilane, cyclic siloxane, a second mixture of oxidized hydrosilane and silane or silane oligomer, and a third mixture of cyclic siloxane and silane or silane oligomer, a composition for forming an insulation film of semiconductor devices prepared by using the organic silicate polymer, a method for preparing an insulation film using the composition, and a semiconductor device comprising the insulation film.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: November 16, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Jung-Won Kang, Min-Jin Ko, Dong-Seok Shin, Gwi-Gwon Kang, Myung-Sun Moon, Hye-Yeong Nam, Bum-Gyu Choi, Young-Duk Kim, Byung-Ro Kim, Won-Jong Kwon, Sang-Min Park
  • Patent number: 7744946
    Abstract: The present invention relates to organic siloxane resins and insulating films using the same. The insulating films are manufactured by using organic siloxane resins, wherein organic siloxane resins are hydrolysis-condensation polymers of silane compounds comprising one or more kinds of hydrosilane compounds. They have superior mechanical properties and a low electric property, and therefore, are properly usable for highly integrated semiconductor devices.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: June 29, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Bum-gyu Choi, Min-jin Ko, Byung-ro Ko, Myung-sun Moon, Jung-won Kang, Hye-yeong Nam, Gwi-gwon Kang
  • Patent number: 7709551
    Abstract: The present invention relates to a coating composition for a film with low refractive index and a film prepared therefrom, and more precisely, a coating composition with low refractive index which contains dispersed porous organic/inorganic hybrid nano-particles or a colloid containing the dispersed nano-particles, a photocurable compound having unsaturated functional groups, photoinitiator or photosensitizer, or an organic siloxane thermosetting compound, and a solvent and a film prepared therefrom. According to the present invention, porous particles have been formed by using a structural regulator in a silane compound at a specific size, in order to be fitted for a film with low refractive index, and then the structural regulator has been eliminated by a simple process before forming the film, resulting in preparation of a film with extremely low refractive index at a low temperature of up to 120° C.
    Type: Grant
    Filed: June 1, 2006
    Date of Patent: May 4, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Jung-Won Kang, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Jeong-Man Son, Dae-Ho Kang
  • Publication number: 20100096590
    Abstract: Disclosed are a novel liquid crystal compound containing a sulfone group, a liquid crystal composition comprising the same, and an optical film using the same liquid crystal composition. More particularly, there are provided a liquid crystal material for a viewing angle compensation film with high quality characteristics, which can improve a contrast ratio measured at a tilt angle to the front and minimize variations in color with viewing angles in a black state, a liquid crystal composition comprising the same liquid crystal material, and a compensation film obtained from the same liquid crystal composition.
    Type: Application
    Filed: January 22, 2008
    Publication date: April 22, 2010
    Inventors: Jae-Ho Cheong, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Publication number: 20100084608
    Abstract: Disclosed is a discotic liquid crystal compound, a liquid crystal composition comprising the same, and an optical film using the same liquid crystal composition. More particularly, there is provided a liquid crystal material of a viewing angle compensation film with high quality characteristics, which can improve a contrast ratio and minimize variations in color with viewing angles in a black state, a liquid crystal composition comprising the same liquid crystal material, and a compensation film obtained from the same liquid crystal composition.
    Type: Application
    Filed: January 22, 2008
    Publication date: April 8, 2010
    Inventors: Jae-Ho Cheong, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Publication number: 20100078594
    Abstract: Disclosed are a biaxial liquid crystal compound, a liquid crystal composition comprising the same, and an optical film using the same liquid crystal composition. More particularly, there is provided a liquid crystal material of a viewing angle compensation film with high quality characteristics, which can improve a contrast ratio and minimize variations in color with viewing angles in a black state, a liquid crystal composition comprising the same liquid crystal material, and a compensation film obtained from the same liquid crystal composition.
    Type: Application
    Filed: January 22, 2008
    Publication date: April 1, 2010
    Inventors: Jae-Ho Cheong, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Patent number: 7682774
    Abstract: Disclosed is a resin composition which comprises a catalyst precursor for electroless plating to form an electromagnetic wave shielding layer. The resin composition comprises an organic polymer resin, a polyfunctional monomer having an ethylenically unsaturated bond, a photoinitiator, a silver organic complex precursor as a catalyst precursor, and an organic solvent. Further disclosed are methods for forming metal patterns using the resin composition and metal patterns formed by the methods. The methods comprise forming a pattern, reducing the pattern, and electroless plating the reduced pattern. A patterned layer of the catalyst formed using the resin composition is highly adhesive, a loss of the catalyst during a wet process is substantially prevented, and an increase in plating rate leads to the formation of a uniform, fine metal pattern after electroless plating. Electromagnetic wave shielding materials comprising the metal pattern can be used in the formation of films for shielding electromagnetic waves.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: March 23, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Min Kyoun Kim, Min Jin Ko, Bum Gyu Choi, Sang Chul Lee, Jeong Im Roh
  • Publication number: 20100059712
    Abstract: Disclosed are a novel fluorene derivative, a liquid crystal composition comprising the same, and an optical film using the same liquid crystal composition. More particularly, there are provided a liquid crystal material for a viewing angle compensation film with high quality characteristics, which can improve a contrast ratio measured at an oblique angle to the front and minimize variations in color with viewing angles in a black state, a liquid crystal composition comprising the same liquid crystal material, and a compensation film obtained from the same liquid crystal composition.
    Type: Application
    Filed: January 22, 2008
    Publication date: March 11, 2010
    Inventors: Jae-Ho Cheong, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Publication number: 20100059710
    Abstract: The present invention relates to a pyran derivative which manifests appropriate refractive anisotropy (optical anisotropy) and liquid crystal transition temperature and excellent dielectric anisotropy, and has excellent compatibility with various liquid crystal compounds, and thus, can be preferably used for the formation of a liquid crystal layer of a liquid crystal display device, its preparation method, a liquid crystal composition and liquid crystal display device comprising the same.
    Type: Application
    Filed: September 9, 2009
    Publication date: March 11, 2010
    Inventors: Bum-Gyu Choi, Min-Jin Ko, Myung-Sun Moon, Jae-Ho Cheong, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Publication number: 20100051867
    Abstract: Disclosed is a novel liquid crystal compound, a liquid crystal composition comprising the same, and an optical film using the same liquid crystal composition. More particularly, there is provided a liquid crystal material of a viewing angle compensation film with high quality characteristics, which can improve a contrast ratio and minimize variations in color with viewing angles in a black state, a liquid crystal composition comprising the same liquid crystal material, and a compensation film obtained from the same liquid crystal composition.
    Type: Application
    Filed: January 22, 2008
    Publication date: March 4, 2010
    Inventors: Jae-Ho Cheong, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Dae-Ho Kang, Ki-Youl Lee, Yun-Bong Kim
  • Patent number: 7648894
    Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.
    Type: Grant
    Filed: January 25, 2008
    Date of Patent: January 19, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Myung-Sun Moon, Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Bum-Gyu Choi, Byung-Ro Kim, Gwi-Gwon Kang, Young-Duk Kim, Sang-Min Park
  • Patent number: 7635524
    Abstract: The present invention relates to a coating composition for a dielectric insulating film comprising a) an organosiloxane polymer, b) first metal ions selected from the group consisting of Rb ions, Cs ions, and a mixture thereof, and c) an organic solvent, in which the first metal ions are comprised at 1 to 200 ppm based on the weight of the composition, a dielectric insulating film prepared therefrom, and an electric or electronic device comprising the same. A dielectric insulating film prepared from the coating composition of the present invention has an improved dielectric constant and superior mechanical strength and electric properties.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: December 22, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Min-Jin Ko, Ki-Youl Lee, Bum-Gyu Choi, Myung-Sun Moon, Dae-Ho Kang, Jeong-Man Son
  • Publication number: 20080293879
    Abstract: The present invention relates to a coating composition for a dielectric insulating film comprising a) an organosiloxane polymer, b) first metal ions selected from the group consisting of Rb ions, Cs ions, and a mixture thereof, and c) an organic solvent, in which the first metal ions are comprised at 1 to 200 ppm based on the weight of the composition, a dielectric insulating film prepared therefrom, and an electric or electronic device comprising the same. A dielectric insulating film prepared from the coating composition of the present invention has an improved dielectric constant and superior mechanical strength and electric properties.
    Type: Application
    Filed: August 1, 2008
    Publication date: November 27, 2008
    Inventors: Min-Jin Ko, Ki-Youl Lee, Bum-Gyu Choi, Myung-Sun Moon, Dae-Ho Kang, Jeong-Man Son
  • Publication number: 20080161523
    Abstract: Disclosed is a novel radially multi-branched polymer. The radially multi-branched polymer includes a central molecule to which side-branches are bonded in at least three positions and has an average molecular weight of 500 to 100,000, the side-branch being selected from the group consisting of a polyalkylene oxide, a polyacrylate, a polyester, a polyamide and derivatives thereof. The radially multi-branched polymer is used for manufacturing a low dielectric insulating film to provide a low dielectric insulating film having easily controllable micropores.
    Type: Application
    Filed: September 28, 2007
    Publication date: July 3, 2008
    Inventors: Jae Ho Cheong, Gwi Gwon Kang, Min Jin Ko, Jung Won Kang, Myung Sun Moon, Byung Ro Kim, Bum Gyu Choi, Dae Ho Kang, Jeong Man Son
  • Publication number: 20080145677
    Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.
    Type: Application
    Filed: January 25, 2008
    Publication date: June 19, 2008
    Inventors: Myung-Sun Moon, Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Bum-Gyu Choi, Byung-Ro Kim, Gwi-Gwon Kang, Young-Duk Kim, Sang-Min Park
  • Publication number: 20080090926
    Abstract: The present invention relates to a coating composition for a film with low refractive index and a film prepared therefrom, and more precisely, a coating composition with low refractive index which contains dispersed porous organic/inorganic hybrid nano-particles or a colloid containing the dispersed nano-particles, a photocurable compound having unsaturated functional groups, photoinitiator or photosensitizer, or an organic siloxane thermosetting compound, and a solvent and a film prepared therefrom. According to the present invention, porous particles have been formed by using a structural regulator in a silane compound at a specific size, in order to be fitted for a film with low refractive index, and then the structural regulator has been eliminated by a simple process beforeforming the film, resulting in preparation of a film with extremely low refractive index at a low temperature of up to 120° C.
    Type: Application
    Filed: December 7, 2006
    Publication date: April 17, 2008
    Inventors: Jung-Won Kang, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Jeong-Man Son, Dae-Ho Kang
  • Patent number: 7345351
    Abstract: The present invention relates to a coating composition for insulating film production, a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same, and more particularly to a coating composition for insulating film production having a low dielectric constant and that is capable of producing an insulating film with superior mechanical strength (elasticity), a preparation method of a low dielectric insulating film using the same, a low dielectric insulating film for a semiconductor device prepared therefrom, and a semiconductor device comprising the same. The coating composition of the present invention comprises an organic siloxane resin having a small molecular weight, and water, and significantly improves low dielectricity and mechanical strength of an insulating film.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: March 18, 2008
    Assignee: LG Chem, Ltd.
    Inventors: Myung-Sun Moon, Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Bum-Gyu Choi, Byung-Ro Kim, Gwi-Gwon Kang, Young-Duk Kim, Sang-Min Park
  • Patent number: 7297722
    Abstract: Described is a radially multi-branched polymer represented by the following formula (I): ABi (I), which includes a central molecule (A) to which side-branches (B) are bonded in at least three positions (i?3). Also described are methods for preparing a multi-branched polymer as well as a porous insulating film including a multi-branched polymer.
    Type: Grant
    Filed: October 8, 2004
    Date of Patent: November 20, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Jae Ho Cheong, Gwi Gwon Kang, Min Jin Ko, Jung Won Kang, Myung Sun Moon, Byung Ro Kim, Bum Gyu Choi, Dae Ho Kang, Jeong Man Son
  • Publication number: 20070243363
    Abstract: Disclosed is a resin composition which comprises a catalyst precursor for electroless plating to form an electromagnetic wave shielding layer. The resin composition comprises an organic polymer resin, a polyfunctional monomer having an ethylenically unsaturated bond, a photoinitiator, a silver organic complex precursor as a catalyst precursor, and an organic solvent. Further disclosed are methods for forming metal patterns using the resin composition and metal patterns formed by the methods. The methods comprise forming a pattern, reducing the pattern, and electroless plating the reduced pattern. A patterned layer of the catalyst formed using the resin composition is highly adhesive, a loss of the catalyst during a wet process is substantially prevented, and an increase in plating rate leads to the formation of a uniform, fine metal pattern after electroless plating. Electromagnetic wave shielding materials comprising the metal pattern can be used in the formation of films for shielding electromagnetic waves.
    Type: Application
    Filed: April 13, 2007
    Publication date: October 18, 2007
    Applicant: LG CHEM, LTD.
    Inventors: Min Kyoun Kim, Min Jin Ko, Bum Gyu Choi, Sang Chul Lee, Jeong Im Roh