Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (A1) or formula (A2): Zr12O8(OH)14(RCO2)18 ??Formula (A1); or Hf6O4(OH)6(RCO2)10 ??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: Aqueous emulsions are disclosed of a gel or gel paste containing a silicone elastomer from the reaction an organohydrogensiloxane having at least two SiH containing cyclosiloxane rings in its molecule and a compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: A process for preparing a vesicle composition based upon mixing an organopolysiloxane having at least one hydrophilic substituent group, a water miscible solvent, and water is disclosed. The vesicle compositions produced by the method are useful in various personal, household, and health care applications.

Abstract: Personal care or healthcare compositions are disclosed comprising a hydrophobic silicone organic elastomer gel blend having viscosity of at least 50 Pa-s. The hydrophobic silicone organic elastomer gel blend contains a silicone organic elastomer and a carrier fluid. The gel blend may be prepared by shearing a silicone organic elastomer or silicone organic elastomer gel with the carrier fluid.

Abstract: Siloxane resins containing both polyoxyalkylene M siloxy units and alkyl functional M and T siloxy units and aqueous compositions thereof are disclosed. The aqueous compositions contain dispersed particles stabilized by the siloxane resin, and are useful for the entrapment and delivery of various personal, household, and medical care actives.

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: Aqueous emulsions are disclosed of a gel or gel paste containing a silicone elastomer from the reaction an organohydrogensiloxane having at least two SiH containing cyclosiloxane rings in its molecule and a compound having at least two aliphatic unsaturated groups in its molecule.

Abstract: Gel compositions are disclosed containing a silicone organic elastomer from the reaction of an organohydrogen-siloxane having at least two SiH containing cyclosiloxane rings in its molecule, a compound or mixture of compounds having at least two aliphatic unsaturated groups in its molecule, and a hydrosilylation catalyst. The silicone elastomer reaction product may itself be a gelled composition, or optionally may be contained in a carrier fluid to form a gel. The gel compositions may further contain a personal or healthcare active.

Abstract: A process for preparing a vesicle composition based upon mixing an organopolysiloxane having at least one hydrophilic substituent group, a water miscible solvent, and water is disclosed. The vesicle compositions produced by the method are useful in various personal, household, and health care applications.

Abstract: Processes are disclosed for preparing silicone vesicle compositions and emulsions containing silicone vesicles, the compositions prepared therefrom, and formulated personal and healthcare products containing the silicone vesicles and emulsions compositions.

Abstract: Siloxane resins containing both polyoxyalkylene M siloxy units and alkyl functional M and T siloxy units and aqueous compositions thereof are disclosed. The aqueous compositions contain dispersed particles stabilized by the siloxane resin, and are useful for the entrapment and delivery of various personal, household, and medical care actives.

Abstract: A method of wafer repairing comprises identifying locations and patterns of defective regions in a semiconductor wafer; communicating the locations and patterns of defective regions to a direct-writing tool; forming a photoresist layer on the semiconductor wafer; locally exposing the photoresist layer within the defective regions using an energy beam; developing the photoresist layer on the semiconductor wafer; and wafer-processing the semiconductor wafer under the photoresist layer after exposing and developing.

Abstract: A method of processing a semiconductor wafer can be used prior to an immersion lithography process. The method includes providing a layer of organic photoresist onto a surface of the semiconductor wafer and removing a portion of the photoresist from an outer edge of the wafer using an edge-bead removal process. The outer edge of the wafer is then cleaned using one or more processes, including a mechanical scrubber/cleaner, mega-sonic power, de-ionized water and/or chemical solution.

Abstract: A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.

Abstract: Disclosed are a system and method for designing a mask layout. In one example, the method includes representing the mask layout using a plurality of pixels, each having a mask transmittance coefficient. A control parameter is initialized and a representative of the mask layout is generated. The method determines acceptance of the representative of the mask layout by a cost function and a Boltzmann factor, where the cost function is related to the mask layout and a target substrate pattern, and the Boltzmann factor is related to the cost function and the control parameter. The methods repeats the steps of generating the representative and determining acceptance until the mask layout is stabilized. The control parameter is decreased according to an annealing schedule. The generating, determining, repeating, and decreasing steps are reiterated until the mask layout is optimized.

Abstract: Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.

Abstract: An immersion lithography system includes an immersion fluid holder for containing an immersion fluid. The system further includes a stage for positioning a resist-coated semiconductor wafer in the immersion fluid holder and a lens proximate to the immersion fluid holder and positionable for projecting an image through the immersion fluid and onto the resist-coated semiconductor wafer. The immersion fluid holder includes a coating configured to reduce contaminate adhesion from contaminates in the immersion fluid.