Abstract: A method of inspecting a surface of an object includes providing a laser beam irradiated in a first direction substantially parallel to the surface of the object, adjusting a diameter of the annular laser beam, reflecting the annular laser beam toward the surface of the object in a second direction substantially perpendicular to the first direction, in a primary reflection, and reflecting the primarily reflected laser toward an inspection region of the object, in a secondary reflection. An incident angle of the annular laser beam with respect to the surface of the object may be determined by the diameter of the annular laser beam.

Abstract: Provided are a data processing apparatus and a substrate inspection method. The data processing apparatus includes a first sensing unit which generates first data about a target, a second sensing unit which generates second data about the target, a splitter unit which receives and synchronizes the first data and the second data and outputs m pieces of copied data by copying the synchronized data, and a processing unit which receives and processes any one of the m pieces of copied data, wherein the second data has a time difference with the first data, and m is a natural number of two or more.

Abstract: An automatic focus control apparatus includes a light detector, which receives light reflected by a surface of a wafer and generates a light reception signal based on the received signal, a controller, which generates a driving signal, the driving signal being one of a first signal and a second signal, the driving signal indicating whether to perform automatic focus control based on the light reception signal, a focus error corrector, which generates a focus error correction signal based on the driving signal, and a stage driver, which displaces a wafer stage supporting the wafer by adjusting the z-axis position of the wafer stage based on the focus error correcting signal if the driving signal is the first signal, and maintains the z-axis position of the wafer stage based on the focus error correction signal if the driving signal is the second signal.

Abstract: A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.

Abstract: A rod lens for a lighting apparatus and a lighting apparatus including the rod lens are disclosed. The rod lens having a rectangular rod structure extends lengthwise and includes a first end and a second end opposing each other. The first end is a light incident surface and formed of one continuous surface. The second end is a light exit surface and formed of a plurality of separated surfaces.

Abstract: Provided are a light source device and a semiconductor manufacturing apparatus including the same. The light source device includes a light-emitting lamp. The light source device includes a laser generator configured to generate and direct a laser beam to the light-emitting lamp. The light source device includes a recycling optical element configured to redirect the laser beam to the light-emitting lamp. The recycling optical element includes a first recycling optical modulator configured to change the phase of the laser beam.

Abstract: A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.

Abstract: Provided are a plasma light source capable of solving a problem occurring when an arc discharge lamp is used and an inspection apparatus capable of providing uniform and high-brightness plasma light. The plasma light source includes a pulse laser generator configured to generate a pulse laser beam, a continuous wave (CW) laser generator configured to generate an infrared ray (IR) CW laser beam, a first dichroic mirror configured to transmit or reflect the pulse laser beam and reflect or transmit the IR CW laser beam, a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and discharge plasma light generated by the plasma, and a second dichroic mirror configured to transmit the pulse laser beam and the IR CW laser beam and reflect the plasma light.

Abstract: An optical inspecting apparatus includes a first light source, a beam splitter, a first lens, a first light detector, and pinhole plates. The first light source emits a first light beam. The beam splitter transmits or reflects the first light beam. The first lens provides the first light beam to transmit through a transparent substrate of a photomask and forms a first focusing spot on a first surface of the transparent substrate or a top surface of a photomask pattern formed on the transparent substrate. The first light detector detects a first reflection light beam generated by reflecting the first light beam from the first surface of the transparent substrate or the top surface of the photomask pattern. The pinhole plates are disposed in front of the first light detector to filter noise in the reflection light beam.

Abstract: A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.

Abstract: A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.

Abstract: A method of inspecting a surface of an object includes providing a laser beam irradiated in a first direction substantially parallel to the surface of the object, adjusting a diameter of the annular laser beam, reflecting the annular laser beam toward the surface of the object in a second direction substantially perpendicular to the first direction, in a primary reflection, and reflecting the primarily reflected laser toward an inspection region of the object, in a secondary reflection. An incident angle of the annular laser beam with respect to the surface of the object may be determined by the diameter of the annular laser beam.

Abstract: An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.

Abstract: An optical transformation module includes a light generator generating a parallel light beam to be incident onto a surface of an inspection object and changing a wavelength of the parallel light beam, and a rotating grating positioned on a path of the parallel light beam and rotatable by a predetermined rotation angle such that the parallel light beam is transformed according to the wavelength of the parallel light beam and the rotation angle of the rotating grating to have a desired incidence angle and a desired incidence position onto the surface of the inspection object.

Abstract: A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.

Abstract: According to example embodiments, an optical measurement apparatus may include: a station configured to support a measurement target; an image acquisition unit configured to acquire a one-dimensional (1D) line image of the measurement target; a driver configured to move the station and the image acquisition unit; and a controller. The controller may be configured to control the driver and the image acquisition unit to acquire a plurality of 1D line images of the measurement target while varying a distance between the image acquisition unit and the measurement target to generate a two-dimensional (2D) scan image from combining the plurality of 1D line images; and to detect a pattern of the measurement target based on comparing a plurality of 2D reference images and the 2D scan image. The optical measurement apparatus may measure critical dimensions of non-repeating ultrafine patterns at high speed.

Abstract: An objective lens assembly includes a catadioptric group, a first refractive lens axially aligned with the catadioptric group, and a focusing lens axially aligned with and between the catadioptric group and the first refractive lens. The focusing lens is an aspheric lens.

Abstract: A rod lens for a lighting apparatus and a lighting apparatus including the rod lens are disclosed. The rod lens having a rectangular rod structure extends lengthwise and includes a first end and a second end opposing each other. The first end is a light incident surface and formed of one continuous surface. The second end is a light exit surface and formed of a plurality of separated surfaces.

Abstract: A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.

Abstract: A focusing device for an optical microscope may include a light emitting unit configured to emit laser light having a specific wavelength, a wedge mirror configured to enable the emitted laser light to be incident on a plurality of locations of a surface of a specimen, first and second light receiving units configured to detect an amount of laser light reflected from the surface of the specimen, a spatial filter configured to eliminate out-of-focus light from light beams reflected from the surface of the specimen and to detect an amount of in-focus light, and a control unit configured to generate a control signal used to carry out focus adjustment of the optical microscope using a plurality of light-amount information detected by the first and second light receiving units and the spatial filter.