Abstract: The present invention discloses an amorphous material comprising nickel oxide doped with tantalum that is an anodically coloring electrochromic material. The material of the present invention is prepared in the form of an electrode (200) having a thin film (202) of an electrochromic material of the present invention residing on a transparent conductive film (203). The material of the present invention is also incorporated into an electrochromic device (100) as a thin film (102) in conjunction with a cathodically coloring prior art electrochromic material layer (104) such that the devices contain both anodically coloring (102) and cathodically coloring (104) layers. The materials of the electrochromic layers in these devices exhibit broadband optical complimentary behavior, ionic species complimentary behavior, and coloration efficiency complimentary behavior in their operation.

Abstract: An anodic double layer gasochromic sensor structure for optical detection of hydrogen in improved response time and with improved optical absorption real time constants, comprising: a glass substrate; a tungsten-doped nickel oxide layer coated on the glass substrate; and a palladium layer coated on the tungsten-doped nickel oxide layer.

Abstract: An anodic double layer gasochromic sensor structure for optical detection of hydrogen in improved response time and with improved optical absorption real time constants, comprising: a glass substrate; a tungsten-doped nickel oxide layer coated on the glass substrate; and a palladium layer coated on the tungsten-doped nickel oxide layer.

Abstract: A sensor structure for chemochromic optical detection of hydrogen gas over a wide response range, that exhibits stability during repeated coloring/bleaching cycles upon exposure and removal of hydrogen gas, comprising; a glass substrate (20): a vanadium oxide layer (21) coated on the glass substrate; and a palladium layer (22) coated on the vanadium oxide layer.

Abstract: An ultra-fast response, high sensitivity structure for optical detection of low concentrations of hydrogen gas, comprising: a substrate; a water-doped WO3 layer coated on the substrate; and a palladium layer coated on the water-doped WO3 layer.

Abstract: A reverse configuration, lithium thin film battery (300) having a buried lithium anode layer (305) and process for making the same. The present invention is formed from a precursor composite structure (200) made by depositing electrolyte layer (204) onto substrate (201), followed by sequential depositions of cathode layer (203) and current collector (202) on the electrolyte layer. The precursor is subjected to an activation step, wherein a buried lithium anode layer (305) is formed via electroplating a lithium anode layer at the interface of substrate (201) and electrolyte film (204). The electroplating is accomplished by applying a current between anode current collector (201) and cathode current collector (202).

Abstract: Thin-film vanadium oxide layer that is suitable for use as a cathode in a lithium ion battery or other electronic applications, such as ion insertion layers in electrochromic devices as well as other uses, is deposited by a plasma-enhanced chemical vapor deposition at room temperature at rates as high as 11 Å/sec. from a vanadium-containing precursor reacted with oxygen and hydrogen. The vanadium oxide-based cathode produced by a lower temperature process and at a high deposition rate, exhibits a high discharge capacity, a high energy density, and a negligible capacity fade fiom its second cycle to at least 2,900 cycles, thus providing enhanced cyclic stability and an improved component for rechargeable lithium-ion batteries and other electronic devices.

Abstract: The invention provides a method of protecting an ion insertion material from the degradative effects of a liquid or gel-type electrolyte material by disposing a protective, solid ion conducting, electrically insulating, layer between the ion insertion layer and the liquid or gel-type electrolyte material. The invention further provides liquid or gel-type electrochemical cells having improved durability having a pair of electrodes, a pair of ion insertion layers sandwiched between the pair of electrodes, a pair of solid ion conducting layers sandwiched between the ion insertion layers, and a liquid or gel-type electrolyte material disposed between the solid ion conducting layers, where the solid ion conducting layer minimizes or prevents degradation of the faces of the ion insertion materials facing the liquid or gel-type electrolyte material. Electrochemical cells of this invention having increased durability include secondary lithium batteries and electrochromic devices.

Abstract: The invention provides a method of protecting an ion insertion material from the degradative effects of a liquid or gel-type electrolyte material by disposing a protective, solid ion conducting, electrically insulating, layer between the ion insertion layer and the liquid or gel-type electrolyte material. The invention further provides liquid or gel-type electrochemical cells having improved durability having a pair of electrodes, a pair of ion insertion layers sandwiched between the pair of electrodes, a pair of solid ion conducting layers sandwiched between the ion insertion layers, and a liquid or gel-type electrolyte material disposed between the solid ion conducting layers, where the solid ion conducting layer minimizes or prevents degradation of the faces of the ion insertion materials facing the liquid or gel-type electrolyte material. Electrochemical cells of this invention having increased durability include secondary lithium batteries and electrochromic devices.

Abstract: A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

Abstract: The present invention relates to the composition of a solid lithium-ion electrolyte based on the Li.sub.2 O--CeO.sub.2 --SiO.sub.2 system having good transparent characteristics and high ion conductivity suitable for uses in lithium batteries, electrochromic devices and other electrochemical applications.

Abstract: A method for charging a sample of either a permanent or reversible getter material with a high concentration of hydrogen while maintaining a base pressure below 10.sup.-4 torr at room temperature involves placing the sample of hydrogen getter material in a chamber, activating the sample of hydrogen getter material, overcharging the sample of getter material through conventional charging techniques to a high concentration of hydrogen, and then subjecting the sample of getter material to a low temperature vacuum bake-out process. Application of the method results in a reversible hydrogen getter which is highly charged to maximum capacities of hydrogen and which concurrently exhibits minimum hydrogen vapor pressures at room temperatures.

Abstract: The present invention relates to the composition of a solid lithium-ion electrolyte based on the Li.sub.2 O--CeO.sub.2 --SiO.sub.2 system having good transparent characteristics and high ion conductivity suitable for uses in lithium batteries, electrochromic devices and other electrochemical applications.

Abstract: A fiber-optic device for sensing the presence of a gas in an environment is provided. The device comprises a light source for directing a light beam to a layer system having a first surface and a second surface opposite the first surface. The first surface is exposable to the light beam and the second surface is exposable to the environment. A first light portion encounters and reflects from the first surface at an angle of incidence free from optical wave guide resonance phenomenon and the second light portion encounters and reflects from the first surface at an angle of incidence enabling an optical wave guide resonance phenomenon. The layer system is selected to reversibly react with the gas to be detected. The reaction between the gas and the material changes the material's optical properties and the wavelength at which the optical wave guide resonance occurs.

Abstract: A method for simultaneously cutting and welding ultra-thin foils having a thickness of less than 0.002 inches wherein two ultra-thin films are stacked and clamped together. A pulsed laser such as of the Neodymium: YAG type is provided and the beam of the laser is directed onto the stacked films to cut a channel through the films. The laser is moved relative to the stacked foils to cut the stacked foils at successive locations and to form a plurality of connected weld beads to form a continuous weld.

Abstract: A method of welding an ultra-thin foil to the edge of a thicker sheet to form a vacuum insulation panel comprising the steps of providing an ultra-thin foil having a thickness less than 0.002, providing a top plate having an edge and a bottom plate having an edge, clamping the foil to the edge of the plate wherein the clamps act as heat sinks to distribute heat through the foil, providing a laser, moving the laser relative to the foil and the plate edges to form overlapping weld beads to weld the foil to the plate edges while simultaneously cutting the foil along the weld line formed by the overlapping beads.

Abstract: A method of welding and sealing the edges of two juxtaposed glass sheets together to seal a vacuum space between the sheets comprises the steps of positioning a radiation absorbant material, such as FeO, VO.sub.2, or NiO, between the radiation transmissive glass sheets adjacent the edges and then irradiating the absorbant material, preferably with a laser beam, through at least one of the glass sheets. Heat produced by the absorbed radiation in the absorbant material melts glass in the portions of both glass sheets that are adjacent the absorbant material, and the melted glass from both sheets flows together to create the weld when the melted glass cools and hardens. The absorbant material can be dissolved and diffused into the melted glass to the extent that it no longer absorbs enough energy to keep the glass melted, thus, with appropriate proportioning of absorbant material to source energy power and welding heat needed, the process can be made self-stopping.

Abstract: A variable transmittance optical component includes an electrochromic material and a photovoltaic device-type thin film solar cell deposited in a tandem type, monolithic single coating over the component. A bleed resistor of a predetermined value is connected in series across the electrochromic material and photovoltaic device controlling the activation and deactivation of the electrochromic material. The electrical conductivity between the electrochromic material and the photovoltaic device is enhanced by interposing a transparent electrically conductive layer.

Abstract: An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.

Abstract: A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.