Abstract: The invention includes a method of depositing a noble metal. A substrate is provided. The substrate has a first region and a second region. The first and second regions are exposed to a mixture comprising a precursor of a noble metal and an oxidant. During the exposure, a layer containing the noble metal is selectively deposited onto the first region relative to the second region. In particular applications, the first region can comprise borophosphosilicate glass, and the second region can comprise either aluminum oxide or doped non-oxidized silicon. The invention also includes capacitor constructions and methods of forming capacitor constructions.

Abstract: The invention includes a method of depositing a noble metal. A substrate is provided. The substrate has a first region and a second region. The first and second regions are exposed to a mixture comprising a precursor of a noble metal and an oxidant. During the exposure, a layer containing the noble metal is selectively deposited onto the first region relative to the second region. In particular applications, the first region can comprise borophosphosilicate glass, and the second region can comprise either aluminum oxide or doped non-oxidized silicon. The invention also includes capacitor constructions and methods of forming capacitor constructions.

Abstract: The invention includes a method of depositing a noble metal. A substrate is provided. The substrate has a first region and a second region. The first and second regions are exposed to a mixture comprising a precursor of a noble metal and an oxidant. During the exposure, a layer containing the noble metal is selectively deposited onto the first region relative to the second region. In particular applications, the first region can comprise borophosphosilicate glass, and the second region can comprise either aluminum oxide or doped non-oxidized silicon. The invention also includes capacitor constructions and methods of forming capacitor constructions.

Abstract: A method is described for forming a corrosion resistant electrical component comprising exposing an electrical component to a first atmosphere containing silicon ions to coat the electrical component with a polysilicon film; and exposing the polysilicon coated component to a second atmosphere containing carbon ions generated from a gaseous mixture comprising a carbon source gas to encapsulate the polysilicon coated electrical component with a diamond-like carbon coating, the carbon source gas having a carbon to hydrogen atom ratio of between about 1:1 and 1:2.

Abstract: The present invention provides a fuser member having a substrate and an outermost layer of a fluorinated diamond like carbon wherein the fluorine content of the surface of said layer is between about 20 and 65 atomic percent based on the total amount of fluorine, carbon and oxygen in said surface. The fuser member is characterized in that the outermost layer provides for excellent release of the toner.