Abstract: A process for the manufacture of semi-plastic pharmaceutical unit doses using a rotary moulding machine and semi-plastic pharmaceutical dosage units obtained by this process.

Abstract: The invention relates to a pharmaceutical composition for modulation of T cell and B cell responses by antigen- or allergen-specific immunotherapy in combination with peripheral tolerance-inducing phagocytosis, made of one or more preparations and comprising one or more matrices suitable for locally restricted sustained release of a physiologically effective dose of at least one antigen or allergen, liposomes tailored for effective phagocytosis, one or more immune modulators of phagocytosis, and one or more immune modulators suitable for enhancing the suppressive function of regulatory T cells at the site of antigen or allergen presentation.

Abstract: The invention presents an equalizing device, a corresponding method and an optical signal with a frame structure for enabling the method. The equalizing device includes a first 2×2 MIMO equalizer configured to perform a first equalization on the digital signal, supported by a 2×2 MIMO channel estimation of the channel based on the digital signal. Further, the device includes a second 2×2 MIMO equalizer, arranged after the first equalizer and configured to perform a second equalization on the digital signal, supported by a State of Polarization (SOP) estimation of the optical signal based on the digital signal.

Abstract: The present invention relates to cell-free larval preparations of Heligmosomoides polygyrus bakeri (Hpb) helminths, wherein said larval preparation is obtainable from cells of the L3-developmental stage larva of said Hpb helminths, wherein said larval preparation is capable of modulating the innate mammalian immune system as well as methods of making and uses thereof.

Abstract: The present invention relates to a method for evaluating a statistically distributed measured value in the examination of an element for a photolithography process, comprising the following steps: (a) using a plurality of parameters in a trained machine learning model, wherein the parameters characterize a state of a measurement environment in a time period assigned to a measurement of the measured value; and (b) executing the trained machine learning model in order to evaluate the measured value.

Abstract: A process for the manufacture of semi-plastic pharmaceutical unit doses using a rotary moulding machine and semi-plastic pharmaceutical dosage units obtained by this process.

Abstract: The present invention relates to a method and an apparatus for determining at least one unknown effect of defects of an element of a photolithography process. The method comprises the steps of: (a) providing a model of machine learning for a relationship between an image, design data associated with the image and at least one effect of the defects of the element of the photolithography process arising from the image; (b) training the model of machine learning using a multiplicity of images used for training purposes, design data associated with the images used for training purposes and corresponding effects of the defects; and (c) determining the at least one unknown effect of the defects by applying the trained model to a measured image and the design data associated with the measured image.

Abstract: Methods and apparatuses for determining a quality of a mask of a photolithography apparatus are provided, which comprise a parallel calculation, using a plurality of computing devices, of a reference aerial image on the basis of a design of the mask and optical properties of the photolithography apparatus on a plurality of computing devices.

Abstract: The present invention relates to a method for superimposing at least two images of a photolithographic mask, wherein the method comprises the following steps: (a) determining at least one first difference of at least one first image relative to design data of the photolithographic mask; (b) determining at least one second difference of at least one second image relative to design data of the photolithographic mask, or relative to the at least one first image; and (c) superimposing the at least one first image and the at least one second image taking account of the at least one first difference and the at least one second difference.

Abstract: A method for correcting the distortion of a first imaging optical unit of a first measurement system is provided, wherein the first imaging optical unit has a first measurement accuracy and the method comprises the steps of: a) providing a first sample with first marks, b) measuring the positions of the first marks by use of a second measurement system comprising a second imaging optical unit, which has a second measurement accuracy that is better than the first measurement accuracy, c) establishing on the basis of the positions measured in step b) and predetermined intended positions of the first marks position errors of the first marks on the first sample produced during the manufacture of the first sample, d) measuring the positions of the first marks by use of the first measurement system, e) establishing the measurement error of the first imaging optical unit when determining the position of each first mark on the basis of the positions measured in step d), the position errors established in step c) a

Abstract: The present invention relates to an apparatus for analyzing an element of a photolithography process, said apparatus comprising: (a) a first measuring apparatus for recording first data of the element; and (b) means for transforming the first data into second, non-measured data, which correspond to measurement data of a measurement of the element with a second measuring apparatus; (c) wherein the means comprise a transformation model, which has been trained using a multiplicity of first data used for training purposes and second data corresponding therewith, which are linked to the second measuring apparatus.

Abstract: A process for the manufacture of semi-plastic pharmaceutical unit doses using a rotary moulding machine and semi-plastic pharmaceutical dosage units obtained by this process.

Abstract: The present invention relates to a method of diagnosing eczema and/or psoriasis, wherein said method differentiates between eczema and psoriasis, and comprises determining the expression of at least two markers in a sample taken from an individual, wherein said at least two markers are selected from CCL27, NOS2, IL36G, KLK13, SOST, NPTX1, PLA2G4D, GDA, IL36A, TGM1, CLEC4G, IL13, TCN1, TMPRSS11D and RHCG, provided that said at least two markers consist of or comprise (a) CCL27 and NOS2; (b) CCL27 and KLK13; (c) IL36G and KLK13; (d) CCL27 and IL36G; (e) NOS2 and IL36G; (f) NOS2 and KLK13; (g) SOST; or (h) NPTX1; and assessing on the basis of the expression of said at least two markers whether the individual is afflicted with eczema and/or psoriasis.

Abstract: The invention relates to a method and a device for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous simulation and using a Kirchhoff simulation, wherein the method comprises the following steps: assigning each structure of said plurality of structures either to a first category or to a second category, calculating a plurality of first partial spectra for structures of the first category with implementation of rigorous simulations, calculating a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation, generating a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum, and generating the reference image with implementation of an optical forward propagation of said hybrid spec

Abstract: The invention relates to a pharmaceutical composition for the modulation of T cell and B cell responses made of one or more preparations and comprising a therapeutically effective dose of at least one inhibitor of TNFR1-mediated functions and of at least one antigen or allergen.

Abstract: A soft chewable pharmaceutical product for delivery of a pharmaceutically acceptable active ingredient to an animal comprising pamoic acid or a pharmaceutically acceptable salt and a process for the manufacture of such soft chewable pharmaceutical product.

Abstract: A soft chewable pharmaceutical product for delivery of a pharmaceutically acceptable active ingredient to an animal comprising pamoic acid or a pharmaceutically acceptable salt and a process for the manufacture of such soft chewable pharmaceutical product.

Abstract: The invention relates to a pharmaceutical composition made of one or more preparation and comprising a therapeutically effective dose of at least one recombinant human C3-derivative and at least one antigen für vaccination.

Abstract: The invention relates to a pharmaceutical composition comprising Tofacitinib or a pharmaceutically acceptable salt thereof, and at least one antigen, allergen or autoallergen for use in medicine. Also encompassed is the use of said composition as a tolerogenic vaccine in the treatment or prevention of an immune disease. The invention further relates to Tofacitinib or a pharmaceutically acceptable salt thereof for use in tolerogenic vaccination. Another aspect of the invention is the use of Tofacitinib or a pharmaceutically acceptable salt thereof in the treatment or prevention of allergic rhinitis and/or autoimmune disease. Further the invention refers to a kit of parts comprising Tofacitinib or a pharmaceutically acceptable salt thereof, and at least one antigen or allergen.

Abstract: A method for correcting the distortion of a first imaging optical unit of a first measurement system is provided, wherein the first imaging optical unit has a first measurement accuracy and the method comprises the steps of: a) providing a first sample with first marks, b) measuring the positions of the first marks by use of a second measurement system comprising a second imaging optical unit, which has a second measurement accuracy that is better than the first measurement accuracy, c) establishing on the basis of the positions measured in step b) and predetermined intended positions of the first marks position errors of the first marks on the first sample produced during the manufacture of the first sample, d) measuring the positions of the first marks by use of the first measurement system, e) establishing the measurement error of the first imaging optical unit when determining the position of each first mark on the basis of the positions measured in step d), the position errors established in step c) a