Patents by Inventor Casey Edward Emtman

Casey Edward Emtman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11745354
    Abstract: A supplementary metrology position coordinates determination (SMPD) system is used with a robot. “Robot accuracy” (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of its movable arm configuration) is based on robot position sensors included in the robot. The SMPD system includes an imaging configuration and an XY scale and an alignment sensor for sensing alignment/misalignment therebetween, and an image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale with known alignment/misalignment, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: September 5, 2023
    Assignee: Mitutoyo Corporation
    Inventors: Kim Atherton, Casey Edward Emtman, Michael Nahum
  • Patent number: 11328409
    Abstract: A metrology system includes an optical assembly portion; an adjustment mechanism configured to change a distance and an angular orientation between the optical assembly portion and a workpiece surface; and a processor configured to control the adjustment mechanism to move the optical assembly portion to position a workpiece surface within a focal Z autofocus range; capture an image stack of the workpiece surface wherein each image of the image stack corresponds to a different autofocus height; determine an autofocus height for at least three locations of the workpiece surface; control the adjustment mechanism based on the autofocus heights to rotate the optical assembly portion relative to the workpiece surface to nominally align the optical axis of the optical assembly portion with a surface normal of the workpiece surface and adjust a distance between the optical assembly portion and the workpiece surface; and execute a defined operation on the workpiece surface.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: May 10, 2022
    Assignee: Mitutoyo Corporation
    Inventor: Casey Edward Emtman
  • Publication number: 20220101511
    Abstract: A metrology system includes an optical assembly portion; an adjustment mechanism configured to change a distance and an angular orientation between the optical assembly portion and a workpiece surface; and a processor configured to control the adjustment mechanism to move the optical assembly portion to position a workpiece surface within a focal Z autofocus range; capture an image stack of the workpiece surface wherein each image of the image stack corresponds to a different autofocus height; determine an autofocus height for at least three locations of the workpiece surface; control the adjustment mechanism based on the autofocus heights to rotate the optical assembly portion relative to the workpiece surface to nominally align the optical axis of the optical assembly portion with a surface normal of the workpiece surface and adjust a distance between the optical assembly portion and the workpiece surface; and execute a defined operation on the workpiece surface.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Inventor: Casey Edward Emtman
  • Publication number: 20210162601
    Abstract: A supplementary metrology position coordinates determination (SMPD) system is used with a robot. “Robot accuracy” (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of its movable arm configuration) is based on robot position sensors included in the robot. The SMPD system includes an imaging configuration and an XY scale and an alignment sensor for sensing alignment/misalignment therebetween, and an image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the movable arm configuration and the other is coupled to a stationary element (e.g., a frame above the robot). The imaging configuration acquires an image of the XY scale with known alignment/misalignment, which is utilized to determine metrology position coordinates that are indicative of the end tool position, with an accuracy level that is better than the robot accuracy.
    Type: Application
    Filed: February 16, 2021
    Publication date: June 3, 2021
    Inventors: Kim Atherton, Casey Edward Emtman, Michael Nahum
  • Patent number: 10913156
    Abstract: An end tool metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The system includes the end tool, an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the end tool and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: February 9, 2021
    Assignee: Mitutoyo Corporation
    Inventors: Michael Nahum, Casey Edward Emtman
  • Publication number: 20200094407
    Abstract: An end tool metrology position coordinates determination system is provided for use with a robot. A first accuracy level defined as a robot accuracy (e.g., for controlling and sensing an end tool position of an end tool that is mounted proximate to a distal end of a movable arm configuration of the robot) is based on using position sensors (e.g., encoders) included in the robot. The system includes the end tool, an imaging configuration, XY scale, image triggering portion and processing portion. One of the XY scale or imaging configuration is coupled to the end tool and the other is coupled to a stationary element (e.g., a frame located above the robot). The imaging configuration acquires an image of the XY scale, which is utilized to determine a relative position that is indicative of the end tool position, with an accuracy level that is better than the robot accuracy.
    Type: Application
    Filed: September 24, 2018
    Publication date: March 26, 2020
    Inventors: Michael Nahum, Casey Edward Emtman
  • Patent number: 10178321
    Abstract: A method for providing an extended depth of field (EDOF) image includes: Periodically modulating an imaging system focus position at a high frequency; using an image exposure comprising discrete image exposure increments acquired at discrete focus positions during an image integration time comprising a plurality of modulation periods of the focus position; and using strobe operations having controlled timings configured to define a set of evenly spaced focus positions for the image exposure increments. The timings are configured so that adjacent focus positions in the set are acquired at times that are separated by at least one reversal of the direction of change of the focus position during its periodic modulation. This solves practical timing problems that may otherwise prevent obtaining closely spaced discrete image exposure increments during high frequency focus modulation. Deconvolution operations may be used to improve clarity in the resulting EDOF image.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: January 8, 2019
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Robert Kamil Bryll
  • Patent number: 9689715
    Abstract: A light source array used in illumination portions for optical encoders comprising an illumination portion, a scale grating extending along a measuring direction and receiving light from the illumination portion, and a detector configuration. The light source array comprises individual sources arranged in a grid pattern and coinciding with two transverse sets of parallel grid pattern lines that have two different grid line pitches between their parallel lines. Different instances of the light source array may be mounted with different rotational orientations about an axis normal to the grid pattern, for use in different illumination portions adapted for use with respective scale gratings having different grating pitches along the measuring axis direction. By using the different respective rotational orientations, the individual sources are aligned along respective illumination source lines that are spaced apart by different respective illumination source line pitches along the measuring axis direction.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: June 27, 2017
    Assignee: Mitutoyo Corporation
    Inventors: Brynn Kristen Hickman MacCoy, Casey Edward Emtman, Daniel John Kapner
  • Patent number: 9640043
    Abstract: A remote display device for displaying real time measurement values is configured to operate as a device in a metrology personal area network (“MPAN”) which also includes a dimensional metrology user interface device and one or more dimensional metrology measurement devices (e.g., calipers, etc.). In various implementations, the remote display device is configured to be operable in either a first mode (e.g., a slave mode) or a second mode (e.g., an independent mode). In a slave mode, the remote display device is responsive to control instructions that are received from the dimensional metrology user interface device to configure a display of real time measurement values from one or more of the measurement devices. In an independent mode, the remote display device is configurable to display real time measurement values from one or more of the measurement devices without receiving control instructions from the dimensional metrology user interface device.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: May 2, 2017
    Assignee: Mitutoyo Corporation
    Inventors: Matthew Raymond Dockrey, Casey Edward Emtman, Eric T. Noble, Darren Wayne Robinson
  • Patent number: 9612099
    Abstract: A compliant thumb wheel assembly coupled to a caliper jaw that moves along a caliper scale member along a measuring axis direction in a caliper comprises a thumb wheel, a compliant element, and a thumb wheel mounting portion rigidly coupled to the caliper jaw. The compliant element is configured to locate the thumb wheel in an operational arrangement for driving the caliper jaw while at the same time transmitting forces between the thumb wheel and the thumb wheel mounting portion by elastic deformation. When a force is applied to the thumb wheel along the measuring axis direction, the compliant element flexes such that the thumb wheel displaces along the measuring axis direction relative to the thumb wheel mounting portion and the caliper jaw, and generates a measuring force that depends on that relative displacement and which is applied to the caliper jaw along the measuring axis direction.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: April 4, 2017
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Michael Edward Goldsworthy
  • Publication number: 20170078549
    Abstract: A method for providing an extended depth of field (EDOF) image includes: Periodically modulating an imaging system focus position at a high frequency; using an image exposure comprising discrete image exposure increments acquired at discrete focus positions during an image integration time comprising a plurality of modulation periods of the focus position; and using strobe operations having controlled timings configured to define a set of evenly spaced focus positions for the image exposure increments. The timings are configured so that adjacent focus positions in the set are acquired at times that are separated by at least one reversal of the direction of change of the focus position during its periodic modulation. This solves practical timing problems that may otherwise prevent obtaining closely spaced discrete image exposure increments during high frequency focus modulation. Deconvolution operations may be used to improve clarity in the resulting EDOF image.
    Type: Application
    Filed: November 23, 2016
    Publication date: March 16, 2017
    Inventors: Casey Edward Emtman, Robert Kamil Bryll
  • Patent number: 9562793
    Abstract: An illumination portion for an optical encoder is disclosed. The optical encoder comprises the illumination portion, a scale grating extending along a measuring axis direction and arranged to receive light from the illumination portion, and a detector configuration arranged to receive light from the scale grating. The illumination portion comprises an addressable light source array. The addressable light source array comprises individual sources arranged along the measuring axis direction. The addressable light source array is configured to provide at least a first addressable set and a second addressable set of the individual sources.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: February 7, 2017
    Assignee: Mitutoyo Corporation
    Inventors: Brynn Kristen Hickman MacCoy, Casey Edward Emtman
  • Publication number: 20160341576
    Abstract: A light source array used in illumination portions for optical encoders comprising an illumination portion, a scale grating extending along a measuring direction and receiving light from the illumination portion, and a detector configuration. The light source array comprises individual sources arranged in a grid pattern and coinciding with two transverse sets of parallel grid pattern lines that have two different grid line pitches between their parallel lines. Different instances of the light source array may be mounted with different rotational orientations about an axis normal to the grid pattern, for use in different illumination portions adapted for use with respective scale gratings having different grating pitches along the measuring axis direction. By using the different respective rotational orientations, the individual sources are aligned along respective illumination source lines that are spaced apart by different respective illumination source line pitches along the measuring axis direction.
    Type: Application
    Filed: May 19, 2015
    Publication date: November 24, 2016
    Inventors: Brynn Kristen Hickman MacCoy, Casey Edward Emtman, Daniel John Kapner
  • Publication number: 20160265893
    Abstract: A compliant thumb wheel assembly coupled to a caliper jaw that moves along a caliper scale member along a measuring axis direction in a caliper comprises a thumb wheel, a compliant element, and a thumb wheel mounting portion rigidly coupled to the caliper jaw. The compliant element is configured to locate the thumb wheel in an operational arrangement for driving the caliper jaw while at the same time transmitting forces between the thumb wheel and the thumb wheel mounting portion by elastic deformation. When a force is applied to the thumb wheel along the measuring axis direction, the compliant element flexes such that the thumb wheel displaces along the measuring axis direction relative to the thumb wheel mounting portion and the caliper jaw, and generates a measuring force that depends on that relative displacement and which is applied to the caliper jaw along the measuring axis direction.
    Type: Application
    Filed: March 10, 2015
    Publication date: September 15, 2016
    Inventors: Casey Edward Emtman, Michael Edward Goldsworthy
  • Patent number: 9377282
    Abstract: A method for validating a workpiece measurement in a hand-held spatial dimension measurement metrology tool comprises vibrating a portion of the metrology hand tool using the vibration excitation element; sensing a vibration signature using the vibration sensor configuration; identifying a valid contact state between the metrology hand tool and the workpiece based on a vibration signature criterion; identifying a valid seating state based on a measurement stability criterion applied to a set of dimensional measurements of the metrology hand tool; and indicating that a dimensional measurement is valid for a dimensional measurement that is obtained when the valid contact state and the valid seating state occur simultaneously.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: June 28, 2016
    Assignee: Mitutoyo Corporation
    Inventors: Matthew Raymond Dockrey, Casey Edward Emtman
  • Publication number: 20160138945
    Abstract: An illumination portion for an optical encoder is disclosed. The optical encoder comprises the illumination portion, a scale grating extending along a measuring axis direction and arranged to receive light from the illumination portion, and a detector configuration arranged to receive light from the scale grating. The illumination portion comprises an addressable light source array. The addressable light source array comprises individual sources arranged along the measuring axis direction. The addressable light source array is configured to provide at least a first addressable set and a second addressable set of the individual sources.
    Type: Application
    Filed: November 17, 2014
    Publication date: May 19, 2016
    Inventors: Brynn Kristen Hickman MacCoy, Casey Edward Emtman
  • Publication number: 20150178484
    Abstract: A programming environment for a metrology system comprises a remote accessory managing portion that connects to a remote device (e.g., a user's smart phone or tablet) that is not normally associated with the metrology system. The remote accessory managing portion may comprise an accessory communication portion configured to communicate with a remote device, an accessory authorization portion configured to authorize the remote device for connection to the programming environment, and an accessory data management portion configured to receive and store a set of reference information data from the authorized remote device. The remote accessory managing portion is configured such that when an authorized remote device sends the set of reference information data to the accessory data management portion, it is automatically associated with a current part program instruction representation indicated in at least one of the program editing environment and a user interface of the remote device.
    Type: Application
    Filed: December 20, 2013
    Publication date: June 25, 2015
    Inventors: John W. McNamara, Casey Edward Emtman
  • Publication number: 20150059480
    Abstract: A method for validating a workpiece measurement in a hand-held spatial dimension measurement metrology tool comprises vibrating a portion of the metrology hand tool using the vibration excitation element; sensing a vibration signature using the vibration sensor configuration; identifying a valid contact state between the metrology hand tool and the workpiece based on a vibration signature criterion; identifying a valid seating state based on a measurement stability criterion applied to a set of dimensional measurements of the metrology hand tool; and indicating that a dimensional measurement is valid for a dimensional measurement that is obtained when the valid contact state and the valid seating state occur simultaneously.
    Type: Application
    Filed: September 3, 2013
    Publication date: March 5, 2015
    Applicant: Mitutoyo Corporation
    Inventors: Matthew Raymond Dockrey, Casey Edward Emtman
  • Patent number: 8739428
    Abstract: A micrometer, including a constant force drive spring actuator configuration, is disclosed which comprises a frame, an anvil, a spindle, a linear displacement sensor that senses a displacement of the spindle, and an actuator including a button which is configured to move the spindle toward or away from the anvil. The spindle drive is attached to a constant force spring actuator comprising at least one constant force spring coil extending toward the spindle and attached between the spindle and the frame such that the sum of their forces drives the spindle toward the anvil with an approximately constant force. In some embodiments, the constant force spring actuator comprises at least two parallel constant force spring coils, extending in parallel toward the spindle. The constant force spring may be made more compact, exert a greater force, and have an extended life relative to known configurations.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: June 3, 2014
    Assignee: Mitutoyo Corporation
    Inventor: Casey Edward Emtman
  • Publication number: 20140007446
    Abstract: A micrometer, including a constant force drive spring actuator configuration, is disclosed which comprises a frame, an anvil, a spindle, a linear displacement sensor that senses a displacement of the spindle, and an actuator including a button which is configured to move the spindle toward or away from the anvil. The spindle drive is attached to a constant force spring actuator comprising at least one constant force spring coil extending toward the spindle and attached between the spindle and the frame such that the sum of their forces drives the spindle toward the anvil with an approximately constant force. In some embodiments, the constant force spring actuator comprises at least two parallel constant force spring coils, extending in parallel toward the spindle. The constant force spring may be made more compact, exert a greater force, and have an extended life relative to known configurations.
    Type: Application
    Filed: July 3, 2012
    Publication date: January 9, 2014
    Inventor: Casey Edward Emtman