Patents by Inventor Casey Edward Emtman

Casey Edward Emtman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8456637
    Abstract: A dual beam assembly is provided for attachment to a chromatic confocal point sensor optical pen. The optical pen provides a single source beam having a measurement range R in the absence of the dual beam assembly. The dual beam assembly includes a first reflective element that is positioned in the source beam and divides it into a first measurement beam and a second measurement beam. The dual beam assembly outputs the first and second measurement beams along first and second measurement axes to different workpiece regions and returns workpiece measurement light arising from the first and second measurement beams back to the optical pen. A second reflective element may be included and configured to deflect the second measurement beam along a desired direction. An offset may be provided between the measuring ranges of the first and second measurement beams.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: June 4, 2013
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Yong Xie
  • Patent number: 8194251
    Abstract: A system and method provide a dual beam chromatic point sensor (CPS) system operable to simultaneously measure two surface regions. In one embodiment, a single beam CPS optical pen may have a dual beam assembly attached. First and second measurement beams of the system may be positioned on respective first and second surface regions, and both reflect light through a confocal aperture of the dual beam CPS. At least one set of measurements is determined, comprising a first and second measurement arising from the first and second measurement beams, respectively. At least the first surface region may be moved to acquire sets of measurements at various positions. Each measurement may be determined with extremely fine resolution (e.g., at least as fine as 10 nm). The system and method satisfy applications that require such resolution and accuracy without the use of an interferometer or other costly and complex elements.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: June 5, 2012
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Yong Xie
  • Patent number: 8142050
    Abstract: A phosphor point source element comprises a substrate and light emitting phosphor particles arranged on the substrate to provide a circular operational track having a tightly packed particle arrangement adjacent to a flat operational surface of an operational track region. The operational track region is rotated while illuminated at a point to provide a high intensity point source. The tightly packed particle arrangement may be achieved by spinning the phosphor particles in a cavity to compress the phosphor on the substrate at the periphery of the cavity, or by other mechanical compression. The tightly packed phosphor arrangement may either be compressed against a forming element that bounds the cavity, or machined, to provide a flat operational surface. An adhesive binding agent that permeates the phosphor particles may be cured to fix the tightly packed arrangement. A window element may support and/or protect the operational surface, in some embodiments.
    Type: Grant
    Filed: November 10, 2010
    Date of Patent: March 27, 2012
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Paul Gerard Gladnick, Scott Allen Harsila
  • Publication number: 20120050722
    Abstract: A dual beam assembly is provided for attachment to a chromatic confocal point sensor optical pen. The optical pen provides a single source beam having a measurement range R in the absence of the dual beam assembly. The dual beam assembly includes a first reflective element that is positioned in the source beam and divides it into a first measurement beam and a second measurement beam. The dual beam assembly outputs the first and second measurement beams along first and second measurement axes to different workpiece regions and returns workpiece measurement light arising from the first and second measurement beams back to the optical pen. A second reflective element may be included and configured to deflect the second measurement beam along a desired direction. An offset may be provided between the measuring ranges of the first and second measurement beams.
    Type: Application
    Filed: August 26, 2010
    Publication date: March 1, 2012
    Applicant: MITUTOYO CORPORATION
    Inventors: Casey Edward Emtman, Yong Xie
  • Publication number: 20120050723
    Abstract: A system and method provide a dual beam chromatic point sensor (CPS) system operable to simultaneously measure two surface regions. In one embodiment, a single beam CPS optical pen may have a dual beam assembly attached. First and second measurement beams of the system may be positioned on respective first and second surface regions, and both reflect light through a confocal aperture of the dual beam CPS. At least one set of measurements is determined, comprising a first and second measurement arising from the first and second measurement beams, respectively. At least the first surface region may be moved to acquire sets of measurements at various positions. Each measurement may be determined with extremely fine resolution (e.g., at least as fine as 10 nm). The system and method satisfy applications that require such resolution and accuracy without the use of an interferometer or other costly and complex elements.
    Type: Application
    Filed: November 15, 2010
    Publication date: March 1, 2012
    Applicant: MITUTOYO CORPORATION
    Inventors: Casey Edward Emtman, Yong Xie
  • Publication number: 20110317396
    Abstract: A phosphor point source element comprises a substrate and light emitting phosphor particles arranged on the substrate to provide a circular operational track having a tightly packed particle arrangement adjacent to a flat operational surface of an operational track region. The operational track region is rotated while illuminated at a point to provide a high intensity point source. The tightly packed particle arrangement may be achieved by spinning the phosphor particles in a cavity to compress the phosphor on the substrate at the periphery of the cavity, or by other mechanical compression. The tightly packed phosphor arrangement may either be compressed against a forming element that bounds the cavity, or machined, to provide a flat operational surface. An adhesive binding agent that permeates the phosphor particles may be cured to fix the tightly packed arrangement. A window element may support and/or protect the operational surface, in some embodiments.
    Type: Application
    Filed: November 10, 2010
    Publication date: December 29, 2011
    Applicant: MITUTOYO CORPORATION
    Inventors: Casey Edward Emtman, Paul Gerard Gladnick, Scott Allen Harsila
  • Publication number: 20110317171
    Abstract: A phosphor point source element comprises a disk substrate and light emitting phosphor particles arranged on the substrate to provide a circular operational track having a desirable tightly packed particle arrangement adjacent to a flat operational surface of an operational track region. The operational track region is rotated while illuminated to provide a high intensity point source of radiation. The tightly packed particle arrangement may be achieved by spinning the phosphor particles in a cavity between a fabrication plate and the substrate, to compress the phosphor against the fabrication plate at the periphery of the cavity, or by mechanically compressing the phosphor. An adhesive binding agent may permeate the phosphor particles and be cured to maintain the tightly packed arrangement. A window element may support and/or protect the operational surface, in some embodiments.
    Type: Application
    Filed: June 24, 2010
    Publication date: December 29, 2011
    Applicant: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Paul Gladnick, Scott Allen Harsila
  • Patent number: 7515280
    Abstract: A displacement measurement device has a detector area which is larger than the area of the beam spot reflected from the measurement surface. The detector area is made larger than the size of the beam spot on the detector area, in order to accommodate shifts in the location of the beam spot due to changes in the precise locations of the components of the displacement measurement device. The subset of pixels in the detector area having advantageous correlation characteristics, is then selected to perform the correlation calculation, thereby reducing data processing time requirements.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: April 7, 2009
    Assignee: Mitutoyo Corporation
    Inventors: Casey Edward Emtman, Andrew Michael Patzwald, Benjamin Keith Jones