Patents by Inventor Chan Hyo Park

Chan Hyo Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100069520
    Abstract: A block copolymer of a polyimide and a polyamic acid is disclosed. Further disclosed are a method for producing the block copolymer and a positive type photosensitive composition comprising the block copolymer. The solubility of the photosensitive composition in an alkaline aqueous solution is controlled to achieve high resolution of a pattern. Further disclosed are a protective film of a semiconductor device and an ITO insulating film of an organic light emitting diode (OLED), which are formed using the block copolymer. The protective film and the ITO insulating film are very stable over time.
    Type: Application
    Filed: July 8, 2009
    Publication date: March 18, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Sang-Woo Kim, Dong-Hyun Oh, Hye-In Shin, Hye-Ran Seong, Chan-Hyo Park, Kyung-Jun Kim
  • Publication number: 20100055401
    Abstract: A method of efficiently manufacturing a film having micro-patterns and an optical film manufactured using the same are used for various optical purposes. The method includes forming a first micro-pattern on one face of the film, and forming a second micro-pattern, which has a geometry equal to that of the first micro-pattern, on the other face of the film by a photo-lithography method using the first micro-pattern formed on one face of the film as a photomask.
    Type: Application
    Filed: March 28, 2008
    Publication date: March 4, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Hyun Seok Choi, Yeon Keun Lee, Chan Hyo Park, Bo Yun Choi, Kwang Joo Lee
  • Publication number: 20080283210
    Abstract: A method for manufacturing a cylinder head system for a vehicle includes manufacturing a first main mold having an exhaust manifold mold and a first water jacket mold; manufacturing a second main mold having a second water jacket mold; and assembling the first main mold to the second main mold. The exhaust manifold mold is configured to form an exhaust manifold, the first water jacket mold is configured to form a first water jacket for cooling the exhaust manifold, and the second water jacket mold is configured to form a second water jacket for cooling a cylinder block.
    Type: Application
    Filed: November 20, 2007
    Publication date: November 20, 2008
    Inventors: Jong Bae Kim, Jae Kee Lee, Jin Yul Jung, Chan Hyo Park, Jin Hwa Kim
  • Publication number: 20080141971
    Abstract: Exhaust passages are integrally formed in at least a projection portion protruded from a side portion of a cylinder head.
    Type: Application
    Filed: December 5, 2007
    Publication date: June 19, 2008
    Inventors: Chan Hyo Park, Si Hun Lee, Wootae Kim, Ingee Suh, Jong Bae Kim, Jae Kee Lee
  • Publication number: 20020137818
    Abstract: Disclosed is an ink composition for solder resist that includes, as a binder polymer, a styrene-maleic anhydride copolymer of which the maleic anhydride group is partly esterified with a lower alcohol, the ink composition forming a solder resist film excellent in flexibility and hence soldering heat resistance as well as adherence.
    Type: Application
    Filed: January 10, 2002
    Publication date: September 26, 2002
    Inventors: Sang-Hyun Yu, Chan-Hyo Park, Jong-Min Park, Ho-Jin Park