Patents by Inventor Chan Yun

Chan Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150144155
    Abstract: A method for removing photoresist, an oxidation layer, or both from a semiconductor substrate is disclosed. The method includes placing a substrate in a processing chamber, the processing chamber separate from a plasma chamber for generating a non-oxidizing plasma to be used in treating the substrate; generating a first non-oxidizing plasma from a first reactant gas and a first carrier gas in the plasma chamber, wherein the first non-oxidizing plasma comprises from about 10% to about 40% of the first reactant gas, wherein the first reactant gas has a flow rate of from about 100 standard cubic centimeters per minute to about 15,000 standard cubic centimeters per minute, and wherein the first carrier gas has a flow rate of from about 500 standard cubic centimeters per minute to about 20,000 standard cubic centimeters per minute; and treating the substrate by exposing the substrate to the first non-oxidizing plasma in the processing chamber.
    Type: Application
    Filed: July 16, 2013
    Publication date: May 28, 2015
    Inventors: Li Diao, Robert George Elliston, David Gilbert, Chan-Yun Lee, James Paris, HaiAu PhanVu, Tom Tillery, Vijay Matthew Vaniapura
  • Publication number: 20150116183
    Abstract: A self-configurable resonance antenna includes a main antenna for transmitting and receiving radio waves of a plurality of mutually different frequency bands, a coupling element having at least two radiating patches with different effective electrical lengths for configuring the impedance of the self-configurable resonance antenna, and a matching circuit disposed between the main antenna and the coupling element. The matching circuit has a filter, a RF detector, a switching logic and a RF switch, the RF switch switching between at least the two radiating patches with different effective electrical lengths for adjusting the main antenna operating in different frequency bands.
    Type: Application
    Filed: October 27, 2014
    Publication date: April 30, 2015
    Applicant: AAC TECHNOLOGIES PTE. LTD
    Inventors: Roger Tay, Ng Guan Hong, Bong Jun San, Tan Yew Choon, Chan Yun Ghit, Karen Goh Hui Leng
  • Publication number: 20150041959
    Abstract: A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, a stabilizer, the stabilizer including methyl acetoacetate, ethyl-2-ethylacetoacetate, nonanol, decanol, undecanol, dodecanol, acetic acid, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, or mixtures thereof, and a solvent, wherein the solvent includes acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, ? butyrolactone, methyl isobutyl ketone, or mixtures thereof, the solvent is present in an amount of about 70 to about 99.
    Type: Application
    Filed: October 24, 2014
    Publication date: February 12, 2015
    Inventors: Sang Ran KOH, Sang Kyun KIM, Sang Hak LIM, Mi Young KIM, Hui Chan YUN, Do Hyeon KIM, Dong Seon UH, Jong Seob KIM
  • Patent number: 8916329
    Abstract: A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R? is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4?x?4, 0?y?3.6, and 4×10?4?z?1, and n is from about 3 to about 500.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: December 23, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Sang Kyun Kim, Sang Hak Lim, Mi Young Kim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
  • Publication number: 20140346391
    Abstract: Provided is a rinse solution for a hydrogenated polysiloxazane thin film including an additive selected from an alcohol-based solvent, an ester-based solvent, a silanol-based solvent, an alkoxysilane-based solvent, an alkylsilazane-based solvent, and a combination thereof in an amount of 0.01 wt % to 7 wt % based on the total amount of the rinse solution.
    Type: Application
    Filed: October 31, 2012
    Publication date: November 27, 2014
    Inventors: Bong-Hwan Kim, Taek-Soo Kwak, Jin-Hee Bae, Hui-Chan Yun, Sang-Hak Lim, Sang-Kyun Kim, Jin-Wook Lee
  • Publication number: 20140210609
    Abstract: A helmet apparatus for automated vehicle heading alert includes a carrier detachable from headwear of a driver, a plurality of light emitting elements, a gyroscopic device, a signal processing and decision-making (SPDM) processor, and a power device. The light emitting elements are installed on the carrier and include left and right light emitting elements. The gyroscopic device is installed on the carrier and includes a gyroscope for detecting an operation of a vehicle and outputting gyroscope signals corresponding to the operation. The SPDM processor receives the gyroscope signals to form operation signals, processes the operation signals, performs a discriminant decision-making procedure, generates consecutively discriminant signals corresponding to the operation signals, and drives accordingly at least one of the light emitting elements to turn on, turn off, or flashing.
    Type: Application
    Filed: January 23, 2014
    Publication date: July 31, 2014
    Applicant: National Taipei University
    Inventor: Chan-Yun Yang
  • Patent number: 8766411
    Abstract: A filler for filling a gap includes a compound represented by the following Chemical Formula 1. SiaNbOcHd.??[Chemical Formula 1] In Chemical Formula 1, a, b, c, and d represent relative amounts of Si, N, 0, and H, respectively, in the compound, 1.96<a<2.68, 1.78<b<3.21, 0?c<0.19, and 4<d<10.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: July 1, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Eun-Su Park, Bong-Hwan Kim, Sang-Hak Lim, Taek-Soo Kwak, Jin-Hee Bae, Hui-Chan Yun, Sang-Kyun Kim, Jin-Wook Lee
  • Patent number: 8758981
    Abstract: A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: June 24, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Mi-Young Kim, Sang-Kyun Kim, Hyeon-Mo Cho, Chang-Soo Woo, Sang-Ran Koh, Hui-Chan Yun, Woo-Jin Lee, Jong-Seob Kim
  • Patent number: 8524851
    Abstract: A silicon-based hardmask composition, including an organosilane polymer represented by Formula 1: {(SiO1.5—Y—SiO1.5)x(R3SiO1.5)y(XSiO1.5)z}(OH)e(OR6)f??(1).
    Type: Grant
    Filed: July 12, 2010
    Date of Patent: September 3, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Sang Kyun Kim, Hyeon Mo Cho, Sang Ran Koh, Mi Young Kim, Hui Chan Yun, Yong Jin Chung, Jong Seob Kim
  • Publication number: 20130017662
    Abstract: A filler for filling a gap includes a compound represented by the following Chemical Formula 1. [Chemical Formula 1] SiaNbOcHd. In Chemical Formula 1, a, b, c, and d represent relative amounts of Si, N, O, and H, respectively, in the compound, 1.96<a<2.68, 1.78<b<3.21, 0?c<0.19, and 4<d<10.
    Type: Application
    Filed: July 13, 2012
    Publication date: January 17, 2013
    Inventors: Eun-Su PARK, Bong-Hwan Kim, Sang-Hak Lim, Taek-Soo Kwak, Jin-Hee Bae, Hui-Chan Yun, Sang-Kyun Kim, Jin-Wook Lee
  • Publication number: 20120282776
    Abstract: A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)(SiO2)y(XSiO1.5)z}(OH)e(OR1)f.
    Type: Application
    Filed: July 2, 2012
    Publication date: November 8, 2012
    Inventors: Mi-Young KIM, Sang-Kyun KIM, Hyeon-Mo CHO, Chang-Soo WOO, Sang-Ran KOH, Hui-Chan YUN, Woo-Jin LEE, Jong-Seob KIM
  • Publication number: 20120270143
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Hui-Chan YUN, Sang-Kyun KIM, Hyeon-Mo CHO, Mi-Young KIM, Sang-Ran KOH, Yong-Jin CHUNG, Jong-Seob KIM
  • Publication number: 20120267766
    Abstract: A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1,
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Mi-Young KIM, Sang-Kyun KIM, Hyeon-Mo CHO, Sang-Ran KOH, Hui-Chan YUN, Yong-Jin CHUNG, Jong-Seob KIM
  • Patent number: 8273519
    Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y??(A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Mi Young Kim, Sang Kyun Kim, Sang Hak Lim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
  • Publication number: 20120177829
    Abstract: A composition for forming silica-based insulation layer includes a hydrogenated polysiloxazane including a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2, and having a chlorine concentration of about 1 ppm or less:
    Type: Application
    Filed: December 29, 2011
    Publication date: July 12, 2012
    Inventors: Sang-Hak LIM, Bong-Hwan Kim, Jung-Kang Oh, Taek-Soo Kwak, Jin-Hee Bae, Hui-Chan Yun, Dong-II Han, Sang-Kyun Kim, Jin-Wook Lee
  • Publication number: 20120164382
    Abstract: A composition for forming a silica layer, a method of manufacturing the composition, a silica layer prepared using the composition, and a method of manufacturing the silica layer, the composition including hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof, wherein a concentration of a sum of hydrogenated polysilazane and hydrogenated polysiloxazane having a weight average molecular weight, reduced to polystyrene, of greater than or equal to about 50,000 is about 0.1 wt % or less, based on a total amount of the hydrogenated polysilazane and hydrogenated polysiloxazane.
    Type: Application
    Filed: December 20, 2011
    Publication date: June 28, 2012
    Inventors: Hui-Chan YUN, Taek-Soo Kwak, Bong-Hwan Kim, Jin-Hee Bae, Jung-Kang Oh, Sang-Hak Lim, Dong-Il Han, Sang-Kyun Kim, Jin-Wook Lee
  • Patent number: 8084502
    Abstract: A use method of agmatine or a pharmaceutically allowable salt thereof, and a pharmaceutical composition comprising the same are disclosed. The method and pharmaceutical composition of the present invention can effectively cure or prevent eye diseases preferably including glaucoma, retinopathy, and optic neuropathy associated with apoptosis in retinal ganglion cells (RGCs), particularly hypoxia-induced or tumor necrosis factor-? (TNF-?)-induced apoptosis.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: December 27, 2011
    Inventors: Gong Je Seong, Chan Yun Kim, Jong Eun Lee, Samin Hong
  • Patent number: 8058711
    Abstract: A filler for filling a gap includes a hydrogenated polysiloxazane having an oxygen content of about 0.2 to about 3 wt %. A chemical structure of the hydrogenated polysiloxazane includes first, second, and third moieties represented by the following respective Chemical Formulas 1-3: The third moiety is on a terminal end of the hydrogenated polysiloxazane, and an amount of the third moiety is about 15 to about 35% based on a total amount of Si—H bonds in the hydrogenated polysiloxazane.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: November 15, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Sang-Hak Lim, Hui-Chan Yun, Dong-Il Han, Taek-Soo Kwak, Jin-Hee Bae, Jung-Kang Oh, Sang-Kyun Kim, Jong-Seob Kim
  • Publication number: 20110241175
    Abstract: A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, and a stabilizer, the stabilizer including one of acetic anhydride, methyl acetoacetate, propionic anhydride, ethyl-2-ethylacetoacetate, butyric anhydride, ethyl-2-ethylacetoacetate, valeric anhydride, 2-methylbutyric anhydride, nonanol, decanol, undecanol, dodecanol, propylene glycol propyl ether, propylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, hexamethyltrisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, and mixtures thereof.
    Type: Application
    Filed: June 15, 2011
    Publication date: October 6, 2011
    Inventors: Sang Ran KOH, Sang Kyun KIM, Sang Hak LIM, Mi Young KIM, Hui Chan YUN, Do Hyeon KIM, Dong Seon UH, Jong Seob KIM
  • Publication number: 20110129981
    Abstract: A filler for filling a gap includes a hydrogenated polysiloxazane having an oxygen content of about 0.2 to about 3 wt %.
    Type: Application
    Filed: November 30, 2010
    Publication date: June 2, 2011
    Inventors: Sang-Hak LIM, Hui-Chan Yun, Dong-Il Han, Taek-Soo Kwak, Jin-Hee Bae, Jung-Kang Oh, Sang-Kyun Kim, Jong-Seob Kim