Abstract: Methods and systems for generating an identifier include detecting emissions from a phosphor pattern with a sensor grid comprising one or more sensors when the phosphor pattern is stimulated with radiation. An output signal of each sensor in the sensor grid is compared to a threshold value to generate respective identifier bits. An identifier is generated from the identifier bits.

Abstract: Methods and systems for generating an identifier includes testing an operational characteristic for each device in an array of pairs of devices. Each pair of devices includes a first device and a second device. The first device of each pair has a higher inter-device uniformity for the operational characteristic than the second device of the pair. The operational characteristic between the first device and the second device is compared for each pair of devices to generate a respective identifier bit for each pair of devices. An identifier is generated from the identifier bits.

Abstract: A ring oscillator system for characterizing substrate strain including, a substrate including a through-substrate-via, at least two ring oscillators, wherein a first ring oscillator is closer to the through-substrate-via than a second ring oscillator, and a logic difference circuit that is configured to receive an input from at least the first ring oscillator and the second ring oscillator, and detect a difference between the signal frequency of the first ring oscillator and the signal frequency of the second ring oscillator.

Abstract: Embodiments are directed to an electromagnetic memory device having a memory cell and an encapsulation layer formed over the memory cell. The memory cell may include a magnetic tunnel junction (MTJ), and the encapsulation layer may be formed from a layer of hydrogenated amorphous silicon. Amorphous silicon improves the coercivity of the MTJ but by itself is conductive. Adding hydrogen to amorphous silicon passivates dangling bonds of the amorphous silicon, thereby reducing the ability of the resulting hydrogenated amorphous silicon layer to provide a parasitic current path to the MTJ. The hydrogenated amorphous silicon layer may be formed using a plasma-enhanced chemical vapor deposition, which can be tuned to enable a hydrogen level of approximately 10 to approximately 20 percent. By keeping subsequent processing operations at or below about 400 Celsius, the resulting layer of hydrogenated amorphous silicon can maintain its hydrogen level of approximately 10 to 20 percent.

Abstract: Embodiments are directed to an electromagnetic memory device having a memory cell and an encapsulation layer formed over the memory cell. The memory cell may include a magnetic tunnel junction (MTJ), and the encapsulation layer may be formed from a layer of hydrogenated amorphous silicon. Amorphous silicon improves the coercivity of the MTJ but by itself is conductive. Adding hydrogen to amorphous silicon passivates dangling bonds of the amorphous silicon, thereby reducing the ability of the resulting hydrogenated amorphous silicon layer to provide a parasitic current path to the MTJ. The hydrogenated amorphous silicon layer may be formed using a plasma-enhanced chemical vapor deposition, which can be tuned to enable a hydrogen level of approximately 10 to approximately 20 percent. By keeping subsequent processing operations at or below about 400 Celsius, the resulting layer of hydrogenated amorphous silicon can maintain its hydrogen level of approximately 10 to 20 percent.

Abstract: A method of fabricating a memory device is provided that may begin with forming a layered gate stack atop a semiconductor substrate and patterning a metal electrode layer stopping on the high-k gate dielectric layer of the layered gate stack to provide a first metal gate electrode and a second metal gate electrode on the semiconductor substrate. In a next process sequence, at least one spacer is formed on the first metal gate electrode atop a portion of the high-k gate dielectric layer, wherein a remaining portion of the high-k gate dielectric is exposed. The remaining portion of the high-k gate dielectric layer is etched to provide a first high-k gate dielectric having a portion that extends beyond a sidewall of the first metal gate electrode and a second high-k gate dielectric having an edge that is aligned to a sidewall of the second metal gate electrode.

Abstract: A method of fabricating a memory device is provided that may begin with forming a layered gate stack atop a semiconductor substrate and patterning a metal electrode layer stopping on the high-k gate dielectric layer of the layered gate stack to provide a first metal gate electrode and a second metal gate electrode on the semiconductor substrate. In a next process sequence, at least one spacer is formed on the first metal gate electrode atop a portion of the high-k gate dielectric layer, wherein a remaining portion of the high-k gate dielectric is exposed. The remaining portion of the high-k gate dielectric layer is etched to provide a first high-k gate dielectric having a portion that extends beyond a sidewall of the first metal gate electrode and a second high-k gate dielectric having an edge that is aligned to a sidewall of the second metal gate electrode.

Abstract: The embodiments of the invention provide an apparatus, method, etc. for a non volatile memory RAD-hard (NVM-rh) system. More specifically, an IC permanent non-volatile storage element comprises an integrated semiconductor stable reference component, wherein the component is resistant to external radiation. The storage element further comprises e-fuse structures in the component and a sensing circuit coupled to the e-fuse structures. The sensing circuit is adapted to update an external device at a specified time interval to reduce incidence of soft errors and errors due to power failure. Moreover, the sensing circuit is adapted to cease updating the external device to program the e-fuse structures; and, continue updating the external device after programming the e-fuse structures.

Abstract: The present invention provides an electrical fuse structure for achieving a post-programming resistance distribution with higher resistance values and to enhance the reliability of electrical fuse programming. A partly doped electrical fuse structure with undoped semiconductor material in the cathode combined with P-doped semiconductor material in the fuselink and anode is disclosed and the data supporting the superior performance of the disclosed electrical fuse is shown.

Abstract: The embodiments of the invention provide an apparatus, method, etc. for a non volatile memory RAD-hard (NVM-rh) system. More specifically, an IC permanent non-volatile storage element comprises an integrated semiconductor stable reference component, wherein the component is resistant to external radiation. The storage element further comprises e-fuse structures in the component and a sensing circuit coupled to the e-fuse structures. The sensing circuit is adapted to update an external device at a specified time interval to reduce incidence of soft errors and errors due to power failure. Moreover, the sensing circuit is adapted to cease updating the external device to program the e-fuse structures; and, continue updating the external device after programming the e-fuse structures.

Abstract: An identification circuit for establishing and sensing the state of a fusible element used in on chip identification of the chip's type comprising: a circuit establishing control signals for turning the identification circuit on and off; dual paths energized by the control signals generated by the level setting circuit to energize one path through the fusible element to provide a state level and the other path through a reference path which provides a reference voltage level which is distinguishable from both the blown and unblown states of the fusible element; a differential sensing circuit for comparing the reference voltage level to the state level to provide a signal indicating the state of the fusible element; and protection circuitry to protect the circuit during an operation in which the state of the fusible element is set.

Abstract: An identification circuit for establishing and sensing the state of a fusible element used in on chip identification of the chip's type comprising: a circuit establishing control signals for turning the identification circuit on and off; dual paths energized by the control signals generated by the level setting circuit to energize one path through the fusible element to provide a state level and the other path through a reference path which provides a reference voltage level which is distinguishable from both the blown and unblown states of the fusible element; a differential sensing circuit for comparing the reference voltage level to the state level to provide a signal indicating the state of the fusible element; and protection circuitry to protect the circuit during an operation in which the state of the fusible element is set.