Abstract: A transparent article is described herein that includes: a glass-ceramic substrate comprising first and second primary surfaces opposing one another and a crystallinity of at least 40% by weight; and an optical film structure disposed on the first primary surface. The optical film structure comprises a plurality of alternating high refractive index (RI) and low RI layers and a scratch-resistant layer. The article also exhibits an average photopic transmittance of greater than 80% and a maximum hardness of greater than 10 GPa, as measured by a Berkovich Hardness Test over an indentation depth range from about 100 nm to about 500 nm. The glass-ceramic substrate comprises an elastic modulus of greater than 85 GPa and a fracture toughness of greater than 0.8 MPa·?m. Further, the optical film structure exhibits a residual compressive stress of ? 700 MPa and an elastic modulus of ?140 GPa.

Abstract: A system is described herein for film deposition includes a drum; a motor configured to rotate the drum in a direction of rotation; a target including a target material; and a holder attached to the drum. The holder is configured to accommodate a substrate and to expose the substrate to free particles of the target material sputtered from the target, and the holder has an asymmetric shape.

Abstract: A transparent article is described herein that includes: a glass-ceramic substrate comprising first and second primary surfaces opposing one another and a crystallinity of at least 40% by weight; and an optical film structure disposed on the first primary surface. The optical film structure comprises a plurality of alternating high refractive index (RI) and low RI layers and a scratch-resistant layer. The article also exhibits an average photopic transmittance of greater than 80% and a maximum hardness of greater than 10 GPa, as measured by a Berkovich Hardness Test over an indentation depth range from about 100 nm to about 500 nm. The glass-ceramic substrate comprises an elastic modulus of greater than 85 GPa and a fracture toughness of greater than 0.8 MPa·?m. Further, the optical film structure exhibits a residual compressive stress of ?700 MPa and an elastic modulus of ?140 GPa.

Abstract: An optical element including an optically transparent lens which defines a curved surface having a steepness given by an R/# of from about 0.5 to about 1.0. A film is positioned on the curved surface. The film includes an index layer. A composite layer is positioned on the curved surface having a refractive index greater than the index layer. The composite layer includes HfO2 and Al2O3. The composite layer has a mole fraction X of HfO2, wherein X is from about 0.05 to about 0.95 and a mole fraction of Al2O3 in the composite layer is 1?X.

Abstract: An optical element including an optically transparent lens which defines a curved surface having a steepness given by an R/# of from about 0.5 to about 1.0. A film is positioned on the curved surface. The film includes an index layer. A composite layer is positioned on the curved surface having a refractive index greater than the index layer. The composite layer includes HfO2 and Al2O3. The composite layer has a mole fraction X of HfO2, wherein X is from about 0.05 to about 0.95 and a mole fraction of Al2O3 in the composite layer is 1?X.

Abstract: An optical film structure that includes: an optical film comprising a physical thickness from about 50 nm to about 3000 nm, and a silicon-containing nitride or a silicon-containing oxynitride. The optical film exhibits a maximum hardness of greater than 18 GPa, as measured by a Berkovich Indenter Hardness Test over an indentation depth range from about 100 nm to about 500 nm on a hardness stack comprising a test optical film with a physical thickness of about 2 microns disposed on an inorganic oxide test substrate, the test optical film having the same composition as the optical film. Further, the optical film exhibits an optical extinction coefficient (k) of less than 1×10?2 at a wavelength of 400 nm and a refractive index (n) of greater than 1.8 at a wavelength of 550 nm.

Abstract: According to one or more embodiments disclosed herein, a coated article may include a substrate and an optical coating. The optical coating may be disposed on a major surface of the substrate and may form an air-side surface. The optical coating may include an optical stack, an adhesion coating, and an easy-to-clean coating. The adhesion coating may comprise an alumina layer and a silica layer. The present disclosure is also directed to methods for depositing optical coatings on substrates and to consumer electronic products which include the coated articles.

Abstract: An optical element including an optically transparent lens which defines a curved surface having a steepness given by an R/# of from about 0.5 to about 1.0. A film is positioned on the curved surface. The film includes an index layer. A composite layer is positioned on the curved surface having a refractive index greater than the index layer. The composite layer includes HfO2 and Al2O3. The composite layer has a mole fraction X of HfO2, wherein X is from about 0.05 to about 0.95 and a mole fraction of Al2O3 in the composite layer is 1-X.

Abstract: According to one or more embodiments disclosed herein, a coated article may include a substrate and an optical coating. The optical coating may be disposed on a major surface of the substrate and may form an air-side surface. The optical coating may include an optical stack, an adhesion coating, and an easy-to-clean coating. The adhesion coating may comprise an alumina layer and a silica layer. The present disclosure is also directed to methods for depositing optical coatings on substrates and to consumer electronic products which include the coated articles.

Abstract: A thermochromic window, the sunlight transmittance of which is adjustable depending on temperature, and a method of fabricating the same. The thermochromic window includes a substrate, a plurality of nanodots formed on the substrate, and a thermochromic thin film coating the substrate and the nanodots. The thermochromic thin film is made of a thermochromic material. The thickness of the thermochromic thin film disposed on the substrate is smaller than the thickness of the thermochromic thin film disposed on the nanodots.

Abstract: Disclosed is a polyamide resin composition, which includes a polyamide resin and 5˜100 parts by weight of a polypropylene resin, 10˜135 parts by weight of glass fiber, and 0.1˜8 parts by weight of a phenolic heat-resistance agent, based on 100 parts by weight of the polyamide resin, and which also has low ion release, few changes in properties even when being exposed to external environment of high or low temperature, and high productivity, thus making it easy to serve as a material for a humidifier for a fuel cell membrane for vehicles.

Abstract: A thermochromic window that can effectively insulate heat when warming is conducted in winter. The thermochromic window that includes a substrate, a thermochromic thin film formed on the substrate, and a transparent conductive film formed on at least one surface of the upper surface and the undersurface of the thermochromic thin film. The emissivity of the transparent conductive film is lower than the emissivity of the thermochromic thin film.

Abstract: A thermochromic window, the sunlight transmittance of which is adjustable depending on temperature, and a method of fabricating the same. The thermochromic window includes a substrate, a plurality of nanodots formed on the substrate, and a thermochromic thin film coating the substrate and the nanodots. The thermochromic thin film is made of a thermochromic material. The thickness of the thermochromic thin film disposed on the substrate is smaller than the thickness of the thermochromic thin film disposed on the nanodots.

Abstract: Disclosed is a polyamide resin composition for a wheel cover, which has an excellent balance between rigidity and toughness, improved low temperature impact property, excellent heat resistance, and improved strength of the surface of the composition and the weld. In particular, the polyamide resin composition comprises a polyamide 6 resin, an ethylene-based copolymer, a styrene-based copolymer, a maleic anhydride grafted styrene, an imide-based copolymer, nano-minerals, and a phenolic heat-resistant material.

Abstract: A thermochromic window that can effectively insulate heat when warming is conducted in winter. The thermochromic window that includes a substrate, a thermochromic thin film formed on the substrate, and a transparent conductive film formed on at least one surface of the upper surface and the undersurface of the thermochromic thin film. The emissivity of the transparent conductive film is lower than the emissivity of the thermochromic thin film.

Abstract: A chemical mechanical polishing (CMP) slurry and a chemical mechanical polishing (CMP) apparatus and method reduce defects, such as scratches, while maintaining a high polishing rate of a target film to be polished through a CMP process. The CMP slurry includes a ceria-based abrasive having a concentration of 0.001-10 percent by weight and a silica-based abrasive having a concentration of 1-24 percent by weight.

Abstract: The present invention relates to a compressor (5) and a refrigerator with the same, and more particularly, to a power saving type compressor which can prevent unnecessary consumption of a current for the compressor to have high energy efficiency, and a refrigerator with the same and a method for controlling the same, wherein the power saving type compressor includes a main winding and a sub-winding respectively having a main terminal (R) and a sub-terminal(s) main winding and a sub-winding being connected with a common terminal to each other, and a PTC switching unit between a PTC unit connected to the sub-terminal for increasing a starting torque in operation of the compressor and the main terminal, for making selective switching on/off of a power input to the PTC unit.

Abstract: A chemical mechanical polishing (CMP) slurry and a chemical mechanical polishing (CMP) apparatus and method reduce defects, such as scratches, while maintaining a high polishing rate of a target film to be polished through a CMP process. The CMP slurry includes a ceria-based abrasive having a concentration of 0.001-10 percent by weight and a silica-based abrasive having a concentration of 1-24 percent by weight.

Abstract: The disclosure relates to a method for manufacturing a semiconductor device by performing a planarization process including a first CMP process using a slurry including 0.05˜0.5 wt % CeO2 or MnO2 as an abrasive and a second CMP process using a slurry including SiO2 as the other abrasive regardless of order of the processes.

Abstract: Disclosed is apparatus and method for fabricating semiconductor devices, in particular comprising a wafer chuck for holding a semiconductor wafer on which a predetermined thin layer is deposited; a processing chamber for injecting etching gas toward the wafer to form a predetermined pattern; and a clamp or a shadow ring provided on an edge of the wafer being held by the wafer chuck and preventing the edge from being etched, and thereby forming a protective step around the edge. Therefore, during a subsequent CMP process, the pattern adjacent to the edge of the wafer can be prevented from being over-polished, and reliability as well as productivity of the semiconductor devices can be improved.