Abstract: An apparatus for monitoring gas flow in a semiconductor manufacturing equipment, includes an exhaust line, a flow amount measuring unit, and a controller unit having a first input electrically connected to the flow amount measuring unit and a second input having a predetermined reference value, the controller unit having the capability of comparing data in the first input to the predetermined reference value in the second input and generate a signal when the data in the first input exceed the predetermined reference value. The apparatus of the present invention may be incorporated into a gas delivery system employed in semiconductor manufacturing to detect gas leaks.

Abstract: A large diameter wafer conveying system includes a vacuum supplier and a valve unit for ON/OFF controlling a vacuum supplied from the vacuum supplier. A wafer holder stably absorbs and holds a wafer by using the vacuum supplied from the vacuum supplier through the valve unit. A residual vacuum clearer automatically clears a portion of the vacuum which remains after the valve unit is turned OFF to completely remove the vacuum.